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Title: Inductively Coupled Plasma Etching of InP with Cl2/H2/Ar Plasma.

Abstract not provided.
Authors:
; ; ;
Publication Date:
OSTI Identifier:
1116450
Report Number(s):
SAND2012-8371C
480455
DOE Contract Number:
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: Proposed for presentation at the Electrochemical Society Meeting held October 7-12, 2012 in Honolulu, HI.
Research Org:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org:
USDOE National Nuclear Security Administration (NNSA)
Country of Publication:
United States
Language:
English