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Title: Silicon-based visible and near-infrared optoelectric devices

Patent ·
OSTI ID:1109472
;

In one aspect, the present invention provides a silicon photodetector having a surface layer that is doped with sulfur inclusions with an average concentration in a range of about 0.5 atom percent to about 1.5 atom percent. The surface layer forms a diode junction with an underlying portion of the substrate. A plurality of electrical contacts allow application of a reverse bias voltage to the junction in order to facilitate generation of an electrical signal, e.g., a photocurrent, in response to irradiation of the surface layer. The photodetector exhibits a responsivity great than about 1 A/W for incident wavelengths in a range of about 250 nm to about 1050 nm, and a responsivity greater than about 0.1 A/W for longer wavelenths, e.g., up to about 3.5 microns.

Research Organization:
Harvard College, Cambridge, MA, USA
Sponsoring Organization:
USDOE
DOE Contract Number:
FC36-016011051
Assignee:
President and Fellows of Harvard College (Cambridge, MA)
Patent Number(s):
8,604,580
Application Number:
13/267,618
OSTI ID:
1109472
Country of Publication:
United States
Language:
English

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