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Title: Apparatus and method for deterministic control of surface figure during full aperture polishing

A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture and the workpiece have centers disposed at substantially the same radial distance from a center of the lap. The aperture is disposed along a first radial direction from the center of the lap, and the workpiece is disposed along a second radial direction from the center of the lap. The first and second radial directions may be opposite directions.
Authors:
; ;
Publication Date:
OSTI Identifier:
1108608
Report Number(s):
8,588,956
12/695,986
DOE Contract Number:
AC52-07NA27344
Resource Type:
Patent
Research Org:
LLNL (Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States))
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING