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Title: Stable wafer-carrier system

Patent ·
OSTI ID:1107612

One embodiment of the present invention provides a wafer-carrier system used in a deposition chamber for carrying wafers. The wafer-carrier system includes a base susceptor and a top susceptor nested inside the base susceptor with its wafer-mounting side facing the base susceptor's wafer-mounting side, thereby forming a substantially enclosed narrow channel. The base susceptor provides an upward support to the top susceptor.

Research Organization:
Silevo, Inc. (Fremont, CA)
Sponsoring Organization:
USDOE
DOE Contract Number:
EE0000589
Assignee:
Silevo, Inc. (Fremont, CA)
Patent Number(s):
8,562,745
Application Number:
12/963,445
OSTI ID:
1107612
Country of Publication:
United States
Language:
English

References (4)

Epitaxial growth furnace patent July 2001
Method for heat-treating a semiconductor body patent March 1997
Chemical vapor deposition reactor patent June 1989
Film forming apparatus patent August 1989