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Title: Method of fabricating a scalable nanoporous membrane filter

A method of fabricating a nanoporous membrane filter having a uniform array of nanopores etch-formed in a thin film structure (e.g. (100)-oriented single crystal silicon) having a predetermined thickness, by (a) using interferometric lithography to create an etch pattern comprising a plurality array of unit patterns having a predetermined width/diameter, (b) using the etch pattern to etch frustum-shaped cavities or pits in the thin film structure such that the dimension of the frustum floors of the cavities are substantially equal to a desired pore size based on the predetermined thickness of the thin film structure and the predetermined width/diameter of the unit patterns, and (c) removing the frustum floors at a boundary plane of the thin film structure to expose, open, and thereby create the nanopores substantially having the desired pore size.
Authors:
; ;
Publication Date:
OSTI Identifier:
1092759
Report Number(s):
8,512,588
12/856,527
DOE Contract Number:
AC52-07NA27344
Resource Type:
Patent
Research Org:
LLNL (Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States))
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE