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Title: Projection Optics for Extreme Ultraviolet Lithography (EUVL) Microfield Exposure Tools (METs) with a Numerical Aperture of 0.5

Authors:
;
Publication Date:
OSTI Identifier:
1088484
Report Number(s):
LLNL-PROC-641036
DOE Contract Number:
W-7405-ENG-48
Resource Type:
Conference
Resource Relation:
Conference: Presented at: Extreme Ultraviolet (EUV) Lithography IV, part of SPIE Advanced Lithography, San Jose, CA, United States, Feb 24 - Feb 28, 2013
Research Org:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUMM MECHANICS, GENERAL PHYSICS