Projection Optics for Extreme Ultraviolet Lithography (EUVL) Microfield Exposure Tools (METs) with a Numerical Aperture of 0.5
Conference
·
OSTI ID:1088484
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 1088484
- Report Number(s):
- LLNL-PROC-641036
- Resource Relation:
- Conference: Presented at: Extreme Ultraviolet (EUV) Lithography IV, part of SPIE Advanced Lithography, San Jose, CA, United States, Feb 24 - Feb 28, 2013
- Country of Publication:
- United States
- Language:
- English
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