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Title: Manufacturing method of photonic crystal

A manufacturing method of a photonic crystal is provided. In the method, a high-refractive-index material is conformally deposited on an exposed portion of a periodic template composed of a low-refractive-index material by an atomic layer deposition process so that a difference in refractive indices or dielectric constants between the template and adjacent air becomes greater, which makes it possible to form a three-dimensional photonic crystal having a superior photonic bandgap. Herein, the three-dimensional structure may be prepared by a layer-by-layer method.
Authors:
; ; ; ; ; ;
Publication Date:
OSTI Identifier:
1082693
Report Number(s):
8,361,545
12/227,594
DOE Contract Number:
AC02-07CH11358
Resource Type:
Patent
Research Org:
AMES (Ames Laboratory (AMES), Ames, IA (United States))
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE