Photo-Curable Polymer Blend Dielectrics for Advancing Organic Field-Effect Transistor Applications
Journal Article
·
· Advanced Materials
OSTI ID:1041765
A solution method of photo-curable and -patternable polymer gate dielectrics was introduced by using blend solutions of poly(4-dimethylsilyl styrene) (PDMSS) and poly(melamine-co-formaldehyde) acrylate (PMFA). The fabrication was optimized to produce a smooth hydrophobic gate dielectric with good insulating and solvent-resistant properties. On the optimized PDMSS/PMFA blend gate dielectric, pentacene could grow into highly ordered structure, showing high electric performances for the resulting OFETs, as well as PTCDI-C13 and TES-ADT.
- Research Organization:
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Sponsoring Organization:
- USDOE SC OFFICE OF SCIENCE (SC)
- DOE Contract Number:
- DE-AC02-98CH10886
- OSTI ID:
- 1041765
- Report Number(s):
- BNL-97443-2012-JA; TRN: US201212%%177
- Journal Information:
- Advanced Materials, Vol. 22, Issue 43
- Country of Publication:
- United States
- Language:
- English
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