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Title: Silanization of Low-Temperature-Plasma Synthesized Silicon Quantum Dots for Production of a Tunable, Stable, Colloidal Solution

Abstract

We present a method for grafting silanes onto low-temperature-plasma synthesized silicon quantum dots. The resulting solution of dots is characterized with Fourier transform infrared spectroscopy and transmission electron microscopy, and determined to be a colloidal suspension. The silane is attached at a single point on the quantum dot surface to avoid cross-linking and multilayer formation, and photoluminescence spectroscopy shows the colloidal suspension of dots is stable for over two months in air. The hydroxyl-terminated surfaces required for silanization are created by wet chemical etch, which can be used to tune the luminescence of the silicon dots in the green- to red-wavelength range. We find, however, that the wet etch cannot move the emission into the blue-wavelength range and discuss this observation in terms of the nature of etching process and origin of the emission. In addition, we discuss the photoluminescence quantum yield in the context of other passivation and synthetic techniques.

Authors:
; ; ; ; ; ; ;
Publication Date:
Research Org.:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
Sponsoring Org.:
USDOE Office of Energy Efficiency and Renewable Energy (EERE), Renewable Power Office. Solar Energy Technologies Office
OSTI Identifier:
1038317
Report Number(s):
NREL/JA-5200-54180
Journal ID: ISSN 1932-7447; TRN: US201208%%418
DOE Contract Number:  
AC36-08GO28308
Resource Type:
Journal Article
Journal Name:
Journal of Physical Chemistry. C
Additional Journal Information:
Journal Volume: 116; Journal Issue: 6; Journal ID: ISSN 1932-7447
Country of Publication:
United States
Language:
English
Subject:
14 SOLAR ENERGY; 37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; 77 NANOSCIENCE AND NANOTECHNOLOGY; AIR; CROSS-LINKING; ETCHING; LUMINESCENCE; ORIGIN; PASSIVATION; PHOTOLUMINESCENCE; PRODUCTION; QUANTUM DOTS; SILANES; SILICON; SPECTROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; solar energy; photovoltaics; quantum dots

Citation Formats

Anderson, I E, Shircliff, R A, Macauley, C, Smith, D K, Lee, B G, Agrawal, S, Stradins, P, and Collins, R T. Silanization of Low-Temperature-Plasma Synthesized Silicon Quantum Dots for Production of a Tunable, Stable, Colloidal Solution. United States: N. p., 2012. Web. doi:10.1021/jp211569a.
Anderson, I E, Shircliff, R A, Macauley, C, Smith, D K, Lee, B G, Agrawal, S, Stradins, P, & Collins, R T. Silanization of Low-Temperature-Plasma Synthesized Silicon Quantum Dots for Production of a Tunable, Stable, Colloidal Solution. United States. https://doi.org/10.1021/jp211569a
Anderson, I E, Shircliff, R A, Macauley, C, Smith, D K, Lee, B G, Agrawal, S, Stradins, P, and Collins, R T. 2012. "Silanization of Low-Temperature-Plasma Synthesized Silicon Quantum Dots for Production of a Tunable, Stable, Colloidal Solution". United States. https://doi.org/10.1021/jp211569a.
@article{osti_1038317,
title = {Silanization of Low-Temperature-Plasma Synthesized Silicon Quantum Dots for Production of a Tunable, Stable, Colloidal Solution},
author = {Anderson, I E and Shircliff, R A and Macauley, C and Smith, D K and Lee, B G and Agrawal, S and Stradins, P and Collins, R T},
abstractNote = {We present a method for grafting silanes onto low-temperature-plasma synthesized silicon quantum dots. The resulting solution of dots is characterized with Fourier transform infrared spectroscopy and transmission electron microscopy, and determined to be a colloidal suspension. The silane is attached at a single point on the quantum dot surface to avoid cross-linking and multilayer formation, and photoluminescence spectroscopy shows the colloidal suspension of dots is stable for over two months in air. The hydroxyl-terminated surfaces required for silanization are created by wet chemical etch, which can be used to tune the luminescence of the silicon dots in the green- to red-wavelength range. We find, however, that the wet etch cannot move the emission into the blue-wavelength range and discuss this observation in terms of the nature of etching process and origin of the emission. In addition, we discuss the photoluminescence quantum yield in the context of other passivation and synthetic techniques.},
doi = {10.1021/jp211569a},
url = {https://www.osti.gov/biblio/1038317}, journal = {Journal of Physical Chemistry. C},
issn = {1932-7447},
number = 6,
volume = 116,
place = {United States},
year = {Thu Feb 16 00:00:00 EST 2012},
month = {Thu Feb 16 00:00:00 EST 2012}
}