Direct to Digital Holography for Semiconductor Wafer Defect Detection and Review

Conference · Mon Jul 01 00:00:00 EDT 2002

OSTI ID:1003667

Thomas, C. E. ^[1]; Bahm, Tracy M. ^[1]; Baylor, Larry  ^[2]; Bingham, Philip R. ^[1]; Burns, Steven W. ^[1]; Chidley, Matthew D. ^[2]; Dai, Xiaolong ^[1]; Delahanty, Robert J. ^[1]; Doti, Christopher J. ^[1]; El-Khashab, Ayman ^[1]; Fisher, Robert L. ^[1]; Gilbert, Judd M. ^[1]; Cui, Hongtao ^[2]; Goddard Jr, James  ^[2]; Hanson, Gregory ^[2]; Hickson, Joel D. ^[1]; Hunt, Martin A. ^[1]; Hylton, Kathy  ^[2]; John, George C. ^[1]; Jones, Michael L. ^[1] ; McDonald, Kenneth R. ^[1]; Mayo, Michael W. ^[1]; McMackin, Ian ^[1]; Patek, David ^[2]; Price, John H. ^[1]; Rasmussen, David A. ^[2]; Schaefer, Louis J. ^[1]; Scheidt, Thomas R. ^[1]; Schulze, Mark A. ^[1]; Schumaker, Philip D. ^[1]; Shen, Bichuan ^[1]; Smith, Randall G. ^[1]; Su, Allen N. ^[1]; Tobin Jr, Kenneth  ^[2]; Usry, William R. ^[1]; Voelkl, Edgar ^[1]; Weber, Karsten S. ^[1]; Jones, Paul G. ^[1]; Owen, Robert W. ^[1]

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1. nLine Corporation, Austin, TX
2. ORNL

A method for recording true holograms (not holographic interferometry) directly to a digital video medium in a single image has been invented. This technology makes the amplitude and phase for every pixel of the target object wave available. Since phase is proportional to wavelength, this makes high-resolution metrology an implicit part of the holographic recording. Measurements of phase can be made to one hundredth or even one thousandth of a wavelength, so the technology is attractive for finding defects on semiconductor wafers, where feature sizes are now smaller than the wavelength of even deep ultra-violet light.

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 1003667
• Resource Relation: Conference: Design, Process, Inegration, and Characterization for Microelectronics, 2002 - Santa Clara, California, United States of America - 3/6/2002 12:00:00 AM-3/7/2002 12:00:00 AM
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
SEMICONDUCTOR MATERIALS
DEFECTS
DETECTION
HOLOGRAPHY
SENSITIVITY
Digital Holography