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Title: Exploiting Photo-induced Reactions in Polymer Blends to Create Hierarchically Ordered, Defect-free Materials

Computer simulations reveal how photo-induced chemical reactions can be exploited to create long-range order in binary and ternary polymeric materials. The process is initiated by shining a spatially more »uniform light over a photosensitive AB binary blend, which undergoes both a reversible chemical reaction and phase separation. We then introduce a well-collimated, higher-intensity light source. Rastering this secondary light over the sample locally increases the reaction rate and causes formation of defect-free, spatially periodic structures. These binary structures resemble either the lamellar or hexagonal phases of microphase-separated di-block copolymers. We measure the regularity of the ordered structures as a function of the relative reaction rates for different values of the rastering speed and determine the optimal conditions for creating defect-free structures in the binary systems. We then add a non-reactive homo-polymer C, which is immiscible with both A and B. We show that this component migrates to regions that are illuminated by the secondary, higher-intensity light, allowing us to effectively write a pattern of C onto the AB film. Rastering over the ternary blend with this collimated light now leads to hierarchically ordered patterns of A, B, and C. The findings point to a facile, non-intrusive process for manufacturing high-quality polymeric devices in a low-cost, efficient manner.« less
Title: Exploiting Photo-induced Reactions in Polymer Blends to Create Hierarchically Ordered, Defect-free Materials
Authors:
Publication Date: 2008-11-05
OSTI Identifier: 987279
DOE Contract Number: ACO2-06CH11357
Other Number(s): Other: 20081105-145758-1
Resource Type: Multimedia
Specific Type: Multimedia Presentation
Resource Relation: Conference: APS Colloquium Series, Advanced Photon Source (APS) at Argonne National Laboratory, Argonne, Illinois (United States), presented on Novemberl 05, 2008
Research Org: ANL-APS (Argonne National Laboratory-Advanced Photon Source (United States))
Sponsoring Org: USDOE Office of Science (SC)
Subject: 36 MATERIALS SCIENCE
Publisher: Advanced Photon Source (APS) Colloquium Series Video Collection
Country of Publication: United States
Language: English
Run Time: 0:47:02
System Entry Date: 2016-01-27