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Title: High-resolution planar electron beam induced current in bulk diodes using high-energy electrons

Abstract

Understanding the impact of high-energy electron radiation on device characteristics remains critical for the expanding use of semiconductor electronics in space-borne applications and other radiation harsh environments. Here in this paper, we report on in situ measurements of high-energy electron radiation effects on the hole diffusion length in low threading dislocation density homoepitaxial bulk n-GaN Schottky diodes using electron beam induced current (EBIC) in high-voltage scanning electron microscopy mode. Despite the large interaction volume in this system, quantitative EBIC imaging is possible due to the sustained collimation of the incident electron beam. This approach enables direct measurement of electron radiation effects without having to thin the specimen. Using a combination of experimental EBIC measurements and Monte Carlo simulations of electron trajectories, we determine a hole diffusion length of 264 ± 11 nm for n-GaN. Irradiation with 200 kV electron beam with an accumulated dose of 24 × 1016 electrons cm-2 led to an approximate 35% decrease in the minority carrier diffusion length.

Authors:
ORCiD logo [1];  [2]; ORCiD logo [2]; ORCiD logo [3];  [1]
  1. Univ. of Maryland, College Park, MD (United States)
  2. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
  3. Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Sandia National Laboratories, SNL California
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES); USDOE Advanced Research Projects Agency - Energy (ARPA-E); National Science Foundation (NSF); National Institute of Standards and Technology (NIST)
OSTI Identifier:
1810363
Alternate Identifier(s):
OSTI ID: 1806243
Report Number(s):
SAND-2021-8154J
Journal ID: ISSN 0003-6951; 697214; TRN: US2213029
Grant/Contract Number:  
AC04-94AL85000; SC0001160; NA0003525; 70NANB15H218; DESC0001160; 16/CJ000/10/04
Resource Type:
Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 119; Journal Issue: 1; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
72 PHYSICS OF ELEMENTARY PARTICLES AND FIELDS

Citation Formats

Warecki, Zoey, Allerman, Andrew A., Armstrong, Andrew M., Talin, A. Alec, and Cumings, John. High-resolution planar electron beam induced current in bulk diodes using high-energy electrons. United States: N. p., 2021. Web. doi:10.1063/5.0051352.
Warecki, Zoey, Allerman, Andrew A., Armstrong, Andrew M., Talin, A. Alec, & Cumings, John. High-resolution planar electron beam induced current in bulk diodes using high-energy electrons. United States. https://doi.org/10.1063/5.0051352
Warecki, Zoey, Allerman, Andrew A., Armstrong, Andrew M., Talin, A. Alec, and Cumings, John. Wed . "High-resolution planar electron beam induced current in bulk diodes using high-energy electrons". United States. https://doi.org/10.1063/5.0051352. https://www.osti.gov/servlets/purl/1810363.
@article{osti_1810363,
title = {High-resolution planar electron beam induced current in bulk diodes using high-energy electrons},
author = {Warecki, Zoey and Allerman, Andrew A. and Armstrong, Andrew M. and Talin, A. Alec and Cumings, John},
abstractNote = {Understanding the impact of high-energy electron radiation on device characteristics remains critical for the expanding use of semiconductor electronics in space-borne applications and other radiation harsh environments. Here in this paper, we report on in situ measurements of high-energy electron radiation effects on the hole diffusion length in low threading dislocation density homoepitaxial bulk n-GaN Schottky diodes using electron beam induced current (EBIC) in high-voltage scanning electron microscopy mode. Despite the large interaction volume in this system, quantitative EBIC imaging is possible due to the sustained collimation of the incident electron beam. This approach enables direct measurement of electron radiation effects without having to thin the specimen. Using a combination of experimental EBIC measurements and Monte Carlo simulations of electron trajectories, we determine a hole diffusion length of 264 ± 11 nm for n-GaN. Irradiation with 200 kV electron beam with an accumulated dose of 24 × 1016 electrons cm-2 led to an approximate 35% decrease in the minority carrier diffusion length.},
doi = {10.1063/5.0051352},
journal = {Applied Physics Letters},
number = 1,
volume = 119,
place = {United States},
year = {Wed Jul 07 00:00:00 EDT 2021},
month = {Wed Jul 07 00:00:00 EDT 2021}
}

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