Title: Coupling buried etalon layers to an engraved metasurface for durable and large-aperture meta-optics

Abstract

Many optical applications that could potentially benefit from the design flexibility provided by the metasurface approach are being prohibited by the limited scalability of the fabrication and the robustness of the end-result structures when using a resonant meta-elements-based approach. In this study, an alternative demonstrated approach with superior scalability and robustness is substrate-engraved metasurfaces, based on medium mixing homogenization, yet it suffers from very limited optical response. Here we propose advancing this approach by coupling the metasurface with buried etalon layers, leading to enhancement in the optical response. A transfer matrix analysis is used to study the parameter space, predicting that the patterned reflectance values range of a beam shaper could be raised from only 4% to 30% when the metasurface is engraved in silica, and even up to 66% when engraved into higher-index oxides. Using the method proposed here, the phase difference range across the metasurface could be increased by 0.4 radians beyond the range achievable by a metasurface engraved in silica and could reach even higher values when embedded in higher-index materials. Full-wave numerical simulations are used to demonstrate a cylindrical metareflector and a metalens, further validating the analysis.

Authors:

Feigenbaum, Eyal  ^[1];

• Search DOE PAGES for author "Feigenbaum, Eyal"
• Search DOE PAGES for ORCID "0000-0001-8101-5105"

Ray, Nathan J.  ^[1];

• Search DOE PAGES for author "Ray, Nathan J."
• Search DOE PAGES for ORCID "0000-0003-2724-4972"

Yoo, Jae-Hyuck  ^[1];

• Search DOE PAGES for author "Yoo, Jae-Hyuck"
• Search DOE PAGES for ORCID "0000-0002-7270-1688"

Nguyen, Hoang T. ^[1]; Elhadj, Selim ^[1]

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+ Show Author Affiliations

1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

Publication Date:

Mon Sep 14 00:00:00 EDT 2020

Research Org.:

Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

Sponsoring Org.:

USDOE National Nuclear Security Administration (NNSA); USDOE Laboratory Directed Research and Development (LDRD) Program

OSTI Identifier:

1765788

Alternate Identifier(s):

OSTI ID: 1659541

Report Number(s):

LLNL-JRNL-808360
Journal ID: ISSN 1559-128X; 1014107

Grant/Contract Number:  

AC52-07NA27344; 18-ERD-005

Resource Type:

Accepted Manuscript

Journal Name:

Applied Optics

Additional Journal Information:

Journal Volume: 59; Journal Issue: 27; Journal ID: ISSN 1559-128X

Publisher:

Optical Society of America

Country of Publication:

United States

Language:

English

Subject:

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