Primary intrinsic defects and their charge transition levels in β–Ga2O3
Abstract
A steady-state photocapacitance (SSPC) setup directly connected to the beamline of a MeV ion implanter is utilized to study primary intrinsic defects in generated by He implantation at cryogenic temperatures (120 K). At low temperatures, the migration of defects is suppressed, and hence the generation of primary intrinsic defects is expected to prevail. SSPC measurements reveal defect-related optical transitions in halide vapor-phase epitaxy (HVPE) -grown thin films with onset energies at 1.3 1.7 1.9 2.6 3.7 and 4.2 eV . and were observed in as-received HVPE-grown thin films, whereby is only sporadically observed. The introduction rates for as well as indicate an origin related to primary intrinsic defects. Notably, and are only observed after He implantation at cryogenic temperatures. Hybrid-functional calculations were performed to estimate the optical absorption cross-section spectra for the gallium and oxygen interstitials as well as the corresponding vacancies ( and , respectively), and compared with the measured onsets for optical absorption found by SSPC measurements. Indeed, we propose to be associated with and/or , while is suggested to be related to and/or . Additionally, several further charge-state transition levels associated with and may contribute to and . We further studied the kinetics of the defects created with He implantation by exposing the sample to room temperature. The kinetics observed for and further support the proposed assignments of the corresponding defect signatures.
- Authors:
-
- Univ. of Oslo (Norway)
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Publication Date:
- Research Org.:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE National Nuclear Security Administration (NNSA)
- OSTI Identifier:
- 1668483
- Report Number(s):
- LLNL-JRNL-812190
Journal ID: ISSN 2475-9953; 1000612; TRN: US2203796
- Grant/Contract Number:
- AC52-07NA27344
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Physical Review Materials
- Additional Journal Information:
- Journal Volume: 4; Journal Issue: 7; Journal ID: ISSN 2475-9953
- Publisher:
- American Physical Society (APS)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; Defects; first-principles calculations; interstitials; irradiation effects; point defects; vacancies; semiconductors; single crystal materials; wide band gap systems
Citation Formats
Zimmermann, C., Rønning, V., Kalmann Frodason, Y., Bobal, V., Vines, L., and Varley, J. B. Primary intrinsic defects and their charge transition levels in β–Ga2O3. United States: N. p., 2020.
Web. doi:10.1103/physrevmaterials.4.074605.
Zimmermann, C., Rønning, V., Kalmann Frodason, Y., Bobal, V., Vines, L., & Varley, J. B. Primary intrinsic defects and their charge transition levels in β–Ga2O3. United States. https://doi.org/10.1103/physrevmaterials.4.074605
Zimmermann, C., Rønning, V., Kalmann Frodason, Y., Bobal, V., Vines, L., and Varley, J. B. Fri .
"Primary intrinsic defects and their charge transition levels in β–Ga2O3". United States. https://doi.org/10.1103/physrevmaterials.4.074605. https://www.osti.gov/servlets/purl/1668483.
@article{osti_1668483,
title = {Primary intrinsic defects and their charge transition levels in β–Ga2O3},
author = {Zimmermann, C. and Rønning, V. and Kalmann Frodason, Y. and Bobal, V. and Vines, L. and Varley, J. B.},
abstractNote = {A steady-state photocapacitance (SSPC) setup directly connected to the beamline of a MeV ion implanter is utilized to study primary intrinsic defects in β–Ga2O3 generated by He implantation at cryogenic temperatures (120 K). At low temperatures, the migration of defects is suppressed, and hence the generation of primary intrinsic defects is expected to prevail. SSPC measurements reveal defect-related optical transitions in halide vapor-phase epitaxy (HVPE) -grown β–Ga2O3 thin films with onset energies at 1.3 (T1), 1.7 (T2), 1.9 (T3), 2.6 (T4), 3.7 (T5), and 4.2 eV (T6). T2, T4, T5, and T6 were observed in as-received HVPE-grown β–Ga2O3 thin films, whereby T2 is only sporadically observed. The introduction rates for T3, T4, as well as T6 indicate an origin related to primary intrinsic defects. Notably, T1 and T3 are only observed after He implantation at cryogenic temperatures. Hybrid-functional calculations were performed to estimate the optical absorption cross-section spectra for the gallium (Gai) and oxygen (Oi) interstitials as well as the corresponding vacancies (VGa and VO, respectively), and compared with the measured onsets for optical absorption found by SSPC measurements. Indeed, we propose T3 to be associated with Gai(+/+2) and/or VGaI(-3/-2), while T4 is suggested to be related to VOK(0/+) (K=I, II, III) and/or VGaII(-3/-2). Additionally, several further charge-state transition levels associated with VGaI and VGaII may contribute to T4 and T6. We further studied the kinetics of the defects created with He implantation by exposing the sample to room temperature. The kinetics observed for T3 and T4 further support the proposed assignments of the corresponding defect signatures.},
doi = {10.1103/physrevmaterials.4.074605},
journal = {Physical Review Materials},
number = 7,
volume = 4,
place = {United States},
year = {Fri Jul 24 00:00:00 EDT 2020},
month = {Fri Jul 24 00:00:00 EDT 2020}
}
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