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Title: Intrinsic Photoconductivity of few-layered ZrS2 Phototransistors via Multiterminal Measurements

Abstract

We report intrinsic photoconductivity studies on one of the least examined layered compounds, ZrS2.Few-atomic layer ZrS2 field-effect transistors were fabricated on the Si/SiO2 substrate and photoconductivity measurements were performed using both two- and four-terminal configurations under the illumination of 532 nm laser source. We measured photocurrent as a function of the incident optical power at several source-drain (bias) voltages. We observe a significantly large photoconductivity when measured in the multiterminal (four-terminal) configuration compared to that in the two-terminal configuration. For an incident optical power of 90 nW, the estimated photosensitivity and the external quantum efficiency (EQE) measured in two-terminal configuration are 0.5 A/W and 120%, respectively, under a bias voltage of 650 mV. Under the same conditions, the four-terminal measurements result in much higher values for both the photoresponsivity (R) and EQE to 6 A/W and 1400%, respectively. This significant improvement in photoresponsivity and EQE   in the four-terminal configuration may have been influenced by the reduction of contact resistance at the metal-semiconductor interface, which greatly impacts the carrier mobility of low conducting materials. This suggests that photoconductivity measurements performed through the two-terminal configuration in previous studies on ZrS2 and other 2D materials have severely underestimated the true intrinsic properties of transition metal dichalcogenidesmore » and their remarkable potential for optoelectronic applications.« less

Authors:
 [1];  [2];  [3];  [1];  [1];  [4];  [4];  [4];  [4];  [2];  [1];  [5]
  1. Jackson State Univ., Jackson, MS (United States)
  2. Florida State Univ., Tallahassee, FL (United States). National High Magnetic Field Lab. (MagLab)
  3. Kunming Univ. of Science and Technology (China)
  4. Argonne National Lab. (ANL), Argonne, IL (United States). Center for Nanoscale Materials
  5. Jackson State Univ., Jackson, MS (United States); Florida State Univ., Tallahassee, FL (United States). National High Magnetic Field Lab. (MagLab)
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division
OSTI Identifier:
1630310
Grant/Contract Number:  
AC02-06CH11357
Resource Type:
Accepted Manuscript
Journal Name:
Semiconductor Science and Information Devices
Additional Journal Information:
Journal Volume: 1; Journal Issue: 2; Journal ID: ISSN 2661-3212
Publisher:
Bilingual Publishing Co.
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; Field-effect transistors; Phototransistor; Quantum efficiency; Responsivity; Zirconium sulphide

Citation Formats

Tanthirige, Rukshan M., Garcia, Carlos, Ghosh, Saikat, Jackson II, Frederick, Nash, Jawnaye, Rosenmann, Daniel, Divan, Ralu, Stan, Liliana, Sumant, Anirudha V., McGill, Stephen A., Ray, Paresh C., and Pradhan, Nihar R. Intrinsic Photoconductivity of few-layered ZrS2 Phototransistors via Multiterminal Measurements. United States: N. p., 2020. Web. doi:10.30564/ssid.v1i2.1526.
Tanthirige, Rukshan M., Garcia, Carlos, Ghosh, Saikat, Jackson II, Frederick, Nash, Jawnaye, Rosenmann, Daniel, Divan, Ralu, Stan, Liliana, Sumant, Anirudha V., McGill, Stephen A., Ray, Paresh C., & Pradhan, Nihar R. Intrinsic Photoconductivity of few-layered ZrS2 Phototransistors via Multiterminal Measurements. United States. https://doi.org/10.30564/ssid.v1i2.1526
Tanthirige, Rukshan M., Garcia, Carlos, Ghosh, Saikat, Jackson II, Frederick, Nash, Jawnaye, Rosenmann, Daniel, Divan, Ralu, Stan, Liliana, Sumant, Anirudha V., McGill, Stephen A., Ray, Paresh C., and Pradhan, Nihar R. Sun . "Intrinsic Photoconductivity of few-layered ZrS2 Phototransistors via Multiterminal Measurements". United States. https://doi.org/10.30564/ssid.v1i2.1526. https://www.osti.gov/servlets/purl/1630310.
@article{osti_1630310,
title = {Intrinsic Photoconductivity of few-layered ZrS2 Phototransistors via Multiterminal Measurements},
author = {Tanthirige, Rukshan M. and Garcia, Carlos and Ghosh, Saikat and Jackson II, Frederick and Nash, Jawnaye and Rosenmann, Daniel and Divan, Ralu and Stan, Liliana and Sumant, Anirudha V. and McGill, Stephen A. and Ray, Paresh C. and Pradhan, Nihar R.},
abstractNote = {We report intrinsic photoconductivity studies on one of the least examined layered compounds, ZrS2.Few-atomic layer ZrS2 field-effect transistors were fabricated on the Si/SiO2 substrate and photoconductivity measurements were performed using both two- and four-terminal configurations under the illumination of 532 nm laser source. We measured photocurrent as a function of the incident optical power at several source-drain (bias) voltages. We observe a significantly large photoconductivity when measured in the multiterminal (four-terminal) configuration compared to that in the two-terminal configuration. For an incident optical power of 90 nW, the estimated photosensitivity and the external quantum efficiency (EQE) measured in two-terminal configuration are 0.5 A/W and 120%, respectively, under a bias voltage of 650 mV. Under the same conditions, the four-terminal measurements result in much higher values for both the photoresponsivity (R) and EQE to 6 A/W and 1400%, respectively. This significant improvement in photoresponsivity and EQE   in the four-terminal configuration may have been influenced by the reduction of contact resistance at the metal-semiconductor interface, which greatly impacts the carrier mobility of low conducting materials. This suggests that photoconductivity measurements performed through the two-terminal configuration in previous studies on ZrS2 and other 2D materials have severely underestimated the true intrinsic properties of transition metal dichalcogenides and their remarkable potential for optoelectronic applications.},
doi = {10.30564/ssid.v1i2.1526},
journal = {Semiconductor Science and Information Devices},
number = 2,
volume = 1,
place = {United States},
year = {Sun Mar 08 00:00:00 EST 2020},
month = {Sun Mar 08 00:00:00 EST 2020}
}

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Figures / Tables:

Figure 1 Figure 1: (a) Thickness dependent Raman spectrum of ZrS2 crystals on Si/SiO2 substrate. The Raman modes A1g and Eg are labeled. (b)-(d) are the optical micrograph images of exfoliated ZrS2 crystals showing single layer to few atomic layers of flakes

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Figures/Tables have been extracted from DOE-funded journal article accepted manuscripts.