Size limits of magnetic-domain engineering in continuous in-plane exchange-bias prototype films
Abstract
Background: The application of superparamagnetic particles as biomolecular transporters in microfluidic systems for lab-on-a-chip applications crucially depends on the ability to control their motion. One approach for magnetic-particle motion control is the superposition of static magnetic stray field landscapes (MFLs) with dynamically varying external fields. These MFLs may emerge from magnetic domains engineered both in shape and in their local anisotropies. Motion control of smaller beads does necessarily need smaller magnetic patterns, i.e., MFLs varying on smaller lateral scales. The achievable size limit of engineered magnetic domains depends on the magnetic patterning method and on the magnetic anisotropies of the material system. Smallest patterns are expected to be in the range of the domain wall width of the particular material system. To explore these limits a patterning technology is needed with a spatial resolution significantly smaller than the domain wall width. Results: We demonstrate the application of a helium ion microscope with a beam diameter of 8 nm as a mask-less method for local domain patterning of magnetic thin-film systems. For a prototypical in-plane exchange-bias system the domain wall width has been investigated as a function of the angle between unidirectional anisotropy and domain wall. By shrinking the domain sizemore »
- Authors:
-
- Univ. of Kessel (Germany). Inst. of Physics and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT)
- Univ. of Bielefeld (Germany). Physics of supramolecular Systems and Surfaces. Faculty of Physics
- Univ. of Kessel (Germany). Inst. of Physics and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT); Deutsches Elektronen-Synchrotron (DESY), Hamburg (Germany)
- Peter Grünberg Inst. “Electronic Properties”, Jülich (Germany)
- Peter Grünberg Inst. “Electronic Properties”, Jülich (Germany); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
- Univ. of Bielefeld (Germany). Thin Films and Physics of Nanostructures. Faculty of Physics
- Publication Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC)
- OSTI Identifier:
- 1628622
- Grant/Contract Number:
- AC02-05CH11231
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Beilstein Journal of Nanotechnology
- Additional Journal Information:
- Journal Volume: 9; Journal ID: ISSN 2190-4286
- Publisher:
- Beilstein Institute
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 77 NANOSCIENCE AND NANOTECHNOLOGY; science & technology - other topics; materials science; physics; exchange bias; helium ion microscopy; ion bombardment induced magnetic patterning; magnetic domains; magnetic nanostructures
Citation Formats
Gaul, Alexander, Emmrich, Daniel, Ueltzhöffer, Timo, Huckfeldt, Henning, Doğanay, Hatice, Hackl, Johanna, Khan, Muhammad Imtiaz, Gottlob, Daniel M., Hartmann, Gregor, Beyer, André, Holzinger, Dennis, Nemšák, Slavomír, Schneider, Claus M., Gölzhäuser, Armin, Reiss, Günter, and Ehresmann, Arno. Size limits of magnetic-domain engineering in continuous in-plane exchange-bias prototype films. United States: N. p., 2018.
Web. doi:10.3762/bjnano.9.276.
Gaul, Alexander, Emmrich, Daniel, Ueltzhöffer, Timo, Huckfeldt, Henning, Doğanay, Hatice, Hackl, Johanna, Khan, Muhammad Imtiaz, Gottlob, Daniel M., Hartmann, Gregor, Beyer, André, Holzinger, Dennis, Nemšák, Slavomír, Schneider, Claus M., Gölzhäuser, Armin, Reiss, Günter, & Ehresmann, Arno. Size limits of magnetic-domain engineering in continuous in-plane exchange-bias prototype films. United States. https://doi.org/10.3762/bjnano.9.276
Gaul, Alexander, Emmrich, Daniel, Ueltzhöffer, Timo, Huckfeldt, Henning, Doğanay, Hatice, Hackl, Johanna, Khan, Muhammad Imtiaz, Gottlob, Daniel M., Hartmann, Gregor, Beyer, André, Holzinger, Dennis, Nemšák, Slavomír, Schneider, Claus M., Gölzhäuser, Armin, Reiss, Günter, and Ehresmann, Arno. Mon .
"Size limits of magnetic-domain engineering in continuous in-plane exchange-bias prototype films". United States. https://doi.org/10.3762/bjnano.9.276. https://www.osti.gov/servlets/purl/1628622.
@article{osti_1628622,
title = {Size limits of magnetic-domain engineering in continuous in-plane exchange-bias prototype films},
author = {Gaul, Alexander and Emmrich, Daniel and Ueltzhöffer, Timo and Huckfeldt, Henning and Doğanay, Hatice and Hackl, Johanna and Khan, Muhammad Imtiaz and Gottlob, Daniel M. and Hartmann, Gregor and Beyer, André and Holzinger, Dennis and Nemšák, Slavomír and Schneider, Claus M. and Gölzhäuser, Armin and Reiss, Günter and Ehresmann, Arno},
abstractNote = {Background: The application of superparamagnetic particles as biomolecular transporters in microfluidic systems for lab-on-a-chip applications crucially depends on the ability to control their motion. One approach for magnetic-particle motion control is the superposition of static magnetic stray field landscapes (MFLs) with dynamically varying external fields. These MFLs may emerge from magnetic domains engineered both in shape and in their local anisotropies. Motion control of smaller beads does necessarily need smaller magnetic patterns, i.e., MFLs varying on smaller lateral scales. The achievable size limit of engineered magnetic domains depends on the magnetic patterning method and on the magnetic anisotropies of the material system. Smallest patterns are expected to be in the range of the domain wall width of the particular material system. To explore these limits a patterning technology is needed with a spatial resolution significantly smaller than the domain wall width. Results: We demonstrate the application of a helium ion microscope with a beam diameter of 8 nm as a mask-less method for local domain patterning of magnetic thin-film systems. For a prototypical in-plane exchange-bias system the domain wall width has been investigated as a function of the angle between unidirectional anisotropy and domain wall. By shrinking the domain size of periodic domain stripes, we analyzed the influence of domain wall overlap on the domain stability. Finally, by changing the geometry of artificial two-dimensional domains, the influence of domain wall overlap and domain wall geometry on the ultimate domain size in the chosen system was analyzed. Conclusion: The application of a helium ion microscope for magnetic patterning has been shown. It allowed for exploring the fundamental limits of domain engineering in an in-plane exchange-bias thin film as a prototypical system. For two-dimensional domains the limit depends on the domain geometry. The relative orientation between domain wall and anisotropy axes is a crucial parameter and therefore influences the achievable minimum domain size dramatically.},
doi = {10.3762/bjnano.9.276},
journal = {Beilstein Journal of Nanotechnology},
number = ,
volume = 9,
place = {United States},
year = {Mon Dec 03 00:00:00 EST 2018},
month = {Mon Dec 03 00:00:00 EST 2018}
}
Figures / Tables:
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Control of magnetic anisotropy and magnetic patterning of perpendicular Co∕Pt multilayers by laser irradiation
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Tailored domain wall charges by individually set in-plane magnetic domains for magnetic field landscape design
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Works referencing / citing this record:
Magnetic Materials and Systems: Domain Structure Visualization and Other Characterization Techniques for the Application in the Materials Science and Biomedicine
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