Ultra-high aspect ratio pores milled in diamond via laser, ion and electron beam mediated processes
Abstract
Microfabrication techniques are critical for the rapid prototyping and development of applications for cutting edge materials. Recently diamond has gained considerable interest for quantum photonic, biosensing, inertial confinement fusion and magnetometer applications. In this article, ultra-high aspect ratio milling of diamond micropores by photon, ion and electron based methods is reported. A multiphoton absorption laser ablation approach is revealed to rapidly produce sub-10 μm diameter micropores in diamond with an aspect ratio of 14:1 and a tapered profile at the surface interface. Chemically active, oxygen focused ion beam milling produces high-aspect ratio pores in diamond with an aspect ratio of 65:1 and minimal tapering over the length of the pore, overcoming the physical interaction volume limitations imposed in conventional gallium based focused ion beam milling and laser ablation methods. Oxygen-mediated electron beam induced etching is revealed to negate the limitations imposed by physical sputtering mechanisms utilized in focused ion beam milling via the direct initiation of chemical reactions at the receding surface, producing aspect ratios on the order of 200:1. Numerical simulations reveal the physical basis for the superior aspect-ratio pore milling of the oxygen focused ion beam milling and electron beam induced etching methods. Our results demonstrate direct-write methodsmore »
- Authors:
-
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Univ. of Technology, Sydney (Australia). School of Mathematical and Physical Sciences
- Oregon Physics, Beaverton, OR (United States)
- General Atomics, San Diego, CA (United States)
- Publication Date:
- Research Org.:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE National Nuclear Security Administration (NNSA)
- OSTI Identifier:
- 1617287
- Alternate Identifier(s):
- OSTI ID: 1703739
- Report Number(s):
- LLNL-JRNL-796981
Journal ID: ISSN 0925-9635; 997684
- Grant/Contract Number:
- AC52-07NA27344
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Diamond and Related Materials
- Additional Journal Information:
- Journal Volume: 105; Journal Issue: C; Journal ID: ISSN 0925-9635
- Publisher:
- Elsevier
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; Diamond; Micropore; Laser ablation; Focused ion beam milling; Electron beam induced etching
Citation Formats
Martin, A. A., Bishop, J., Burnett, W., Alfonso, N., Kong, C., Forsman, A., Carlson, L., Rice, N. G., Stadermann, M, Toth, M., and Bunn, T. L. Ultra-high aspect ratio pores milled in diamond via laser, ion and electron beam mediated processes. United States: N. p., 2020.
Web. doi:10.1016/j.diamond.2020.107806.
Martin, A. A., Bishop, J., Burnett, W., Alfonso, N., Kong, C., Forsman, A., Carlson, L., Rice, N. G., Stadermann, M, Toth, M., & Bunn, T. L. Ultra-high aspect ratio pores milled in diamond via laser, ion and electron beam mediated processes. United States. https://doi.org/10.1016/j.diamond.2020.107806
Martin, A. A., Bishop, J., Burnett, W., Alfonso, N., Kong, C., Forsman, A., Carlson, L., Rice, N. G., Stadermann, M, Toth, M., and Bunn, T. L. Tue .
"Ultra-high aspect ratio pores milled in diamond via laser, ion and electron beam mediated processes". United States. https://doi.org/10.1016/j.diamond.2020.107806. https://www.osti.gov/servlets/purl/1617287.
@article{osti_1617287,
title = {Ultra-high aspect ratio pores milled in diamond via laser, ion and electron beam mediated processes},
author = {Martin, A. A. and Bishop, J. and Burnett, W. and Alfonso, N. and Kong, C. and Forsman, A. and Carlson, L. and Rice, N. G. and Stadermann, M and Toth, M. and Bunn, T. L.},
abstractNote = {Microfabrication techniques are critical for the rapid prototyping and development of applications for cutting edge materials. Recently diamond has gained considerable interest for quantum photonic, biosensing, inertial confinement fusion and magnetometer applications. In this article, ultra-high aspect ratio milling of diamond micropores by photon, ion and electron based methods is reported. A multiphoton absorption laser ablation approach is revealed to rapidly produce sub-10 μm diameter micropores in diamond with an aspect ratio of 14:1 and a tapered profile at the surface interface. Chemically active, oxygen focused ion beam milling produces high-aspect ratio pores in diamond with an aspect ratio of 65:1 and minimal tapering over the length of the pore, overcoming the physical interaction volume limitations imposed in conventional gallium based focused ion beam milling and laser ablation methods. Oxygen-mediated electron beam induced etching is revealed to negate the limitations imposed by physical sputtering mechanisms utilized in focused ion beam milling via the direct initiation of chemical reactions at the receding surface, producing aspect ratios on the order of 200:1. Numerical simulations reveal the physical basis for the superior aspect-ratio pore milling of the oxygen focused ion beam milling and electron beam induced etching methods. Our results demonstrate direct-write methods for the fabrication of ultra-high aspect micropores in diamond and provide insight into the underlying mechanisms of these physical processes. The three methods demonstrated here can be interchanged for applications based on the desired characteristic aspect ratio and process throughput.},
doi = {10.1016/j.diamond.2020.107806},
journal = {Diamond and Related Materials},
number = C,
volume = 105,
place = {United States},
year = {Tue Mar 17 00:00:00 EDT 2020},
month = {Tue Mar 17 00:00:00 EDT 2020}
}
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