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Title: Reflectivity and PDE of VUV4 Hamamatsu SiPMs in liquid xenon

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Publication Date:
Research Org.:
SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States); Univ. of Alabama, Tuscaloosa, AL (United States); Brookhaven National Laboratory (BNL), Upton, NY (United States); Stanford Univ., CA (United States); Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Nuclear Physics (NP); Nvidia Corporation; National Science Foundation (NSF); Natural Sciences and Engineering Research Council of Canada (NSERC); Canada Foundation for Innovation (CFI); Fonds de recherche du Québec – Nature et technologies (FRQNT); National Research Council Canada (NRC); McDonald Institute (CFREF); Institute for Basic Science (IBS); Russian Foundation for Basic Research (RFBR); Chinese Academy of Sciences (CAS); National Natural Science Foundation of China (NSFC); USDOE National Nuclear Security Administration (NNSA)
Contributing Org.:
nEXO Collaboration; nEXO collaboration
OSTI Identifier:
1617159
Alternate Identifier(s):
OSTI ID: 1632393; OSTI ID: 1660466; OSTI ID: 1810644; OSTI ID: 1830771
Report Number(s):
BNL-215996-2020-JAAM; LLNL-JRNL-822165
Journal ID: ISSN 1748-0221; TRN: US2106731
Grant/Contract Number:  
AC02-76SF00515; SC0019261; SC0017970; AC52-07NA27344; FG02-01ER41166
Resource Type:
Accepted Manuscript
Journal Name:
Journal of Instrumentation
Additional Journal Information:
Journal Volume: 15; Journal Issue: 01; Journal ID: ISSN 1748-0221
Publisher:
Institute of Physics (IOP)
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION; noble liquid detectors; scintillation; photon detectors; SiPMs; engineering; instrumentation related to nuclear science and technology; nuclear physics; radiation physics; 73 NUCLEAR PHYSICS AND RADIATION PHYSICS; Neutrino-less double beta decay; Silicon Photomultipliers

Citation Formats

Nakarmi, P., Ostrovskiy, I., Soma, A. K., Retière, F., Kharusi, S. Al, Alfaris, M., Anton, G., Arnquist, I. J., Badhrees, I., Barbeau, P. S., Beck, D., Belov, V., Bhatta, T., Blatchford, J., Breur, P. A., Brodsky, J. P., Brown, E., Brunner, T., Mamahit, S. Byrne, Caden, E., Cao, G. F., Cao, L., Chambers, C., Chana, B., Charlebois, S. A., Chiu, M., Cleveland, B., Coon, M., Craycraft, A., Dalmasson, J., Daniels, T., Darroch, L., Croix, A. De St., Mesrobian-Kabakian, A. Der, DeVoe, R., Vacri, M. L. Di, Dilling, J., Ding, Y. Y., Dolinski, M. J., Doria, L., Dragone, A., Echevers, J., Edaltafar, F., Elbeltagi, M., Fabris, L., Fairbank, D., Fairbank, W., Farine, J., Ferrara, S., Feyzbakhsh, S., Fontaine, R., Fucarino, A., Gallina, G., Gautam, P., Giacomini, G., Goeldi, D., Gornea, R., Gratta, G., Hansen, E. V., Heffner, M., Hoppe, E. W., Hößl, J., House, A., Hughes, M., Iverson, A., Jamil, A., Jewell, M. J., Jiang, X. S., Karelin, A., Kaufman, L. J., Koffas, T., Krücken, R., Kuchenkov, A., Kumar, K. S., Lan, Y., Larson, A., Leach, K. G., Lenardo, B. G., Leonard, D. S., Li, G., Li, S., Li, Z., Licciardi, C., Lv, P., MacLellan, R., Massacret, N., McElroy, T., Medina-Peregrina, M., Michel, T., Mong, B., Moore, D. C., Murray, K., Natzke, C. R., Newby, R. J., Ning, Z., Njoya, O., Nolet, F., Nusair, O., Odgers, K., Odian, A., Oriunno, M., Orrell, J. L., Ortega, G. S., Overman, C. T., Parent, S., Piepke, A., Pocar, A., Pratte, J. -F., Radeka, V., Raguzin, E., Rescia, S., Richman, M., Robinson, A., Rossignol, T., Rowson, P. C., Roy, N., Runge, J., Saldanha, R., Sangiorgio, S., VIII, K. Skarpaas, St-Hilaire, G., Stekhanov, V., Stiegler, T., Sun, X. L., Tarka, M., Todd, J., Totev, T. I., Tsang, R., Tsang, T., Vachon, F., Veeraraghavan, V., Viel, S., Visser, G., Vivo-Vilches, C., Vuilleumier, J. -L., Wagenpfeil, M., Wager, T., Walent, M., Wang, Q., Ward, M., Watkins, J., Weber, M., Wei, W., Wen, L. J., Wichoski, U., Wu, S. X., Wu, W. H., Wu, X., Xia, Q., Yang, H., Yang, L., Zeldovich, O., Zhao, J., Zhou, Y., and Ziegler, T. Reflectivity and PDE of VUV4 Hamamatsu SiPMs in liquid xenon. United States: N. p., 2020. Web. doi:10.1088/1748-0221/15/01/p01019.
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Nakarmi, P., Ostrovskiy, I., Soma, A. K., Retière, F., Kharusi, S. Al, Alfaris, M., Anton, G., Arnquist, I. J., Badhrees, I., Barbeau, P. S., Beck, D., Belov, V., Bhatta, T., Blatchford, J., Breur, P. A., Brodsky, J. P., Brown, E., Brunner, T., Mamahit, S. Byrne, Caden, E., Cao, G. F., Cao, L., Chambers, C., Chana, B., Charlebois, S. A., Chiu, M., Cleveland, B., Coon, M., Craycraft, A., Dalmasson, J., Daniels, T., Darroch, L., Croix, A. De St., Mesrobian-Kabakian, A. Der, DeVoe, R., Vacri, M. L. Di, Dilling, J., Ding, Y. Y., Dolinski, M. J., Doria, L., Dragone, A., Echevers, J., Edaltafar, F., Elbeltagi, M., Fabris, L., Fairbank, D., Fairbank, W., Farine, J., Ferrara, S., Feyzbakhsh, S., Fontaine, R., Fucarino, A., Gallina, G., Gautam, P., Giacomini, G., Goeldi, D., Gornea, R., Gratta, G., Hansen, E. V., Heffner, M., Hoppe, E. W., Hößl, J., House, A., Hughes, M., Iverson, A., Jamil, A., Jewell, M. J., Jiang, X. S., Karelin, A., Kaufman, L. J., Koffas, T., Krücken, R., Kuchenkov, A., Kumar, K. S., Lan, Y., Larson, A., Leach, K. G., Lenardo, B. G., Leonard, D. S., Li, G., Li, S., Li, Z., Licciardi, C., Lv, P., MacLellan, R., Massacret, N., McElroy, T., Medina-Peregrina, M., Michel, T., Mong, B., Moore, D. C., Murray, K., Natzke, C. R., Newby, R. J., Ning, Z., Njoya, O., Nolet, F., Nusair, O., Odgers, K., Odian, A., Oriunno, M., Orrell, J. L., Ortega, G. S., Overman, C. T., Parent, S., Piepke, A., Pocar, A., Pratte, J. -F., Radeka, V., Raguzin, E., Rescia, S., Richman, M., Robinson, A., Rossignol, T., Rowson, P. C., Roy, N., Runge, J., Saldanha, R., Sangiorgio, S., VIII, K. Skarpaas, St-Hilaire, G., Stekhanov, V., Stiegler, T., Sun, X. L., Tarka, M., Todd, J., Totev, T. I., Tsang, R., Tsang, T., Vachon, F., Veeraraghavan, V., Viel, S., Visser, G., Vivo-Vilches, C., Vuilleumier, J. -L., Wagenpfeil, M., Wager, T., Walent, M., Wang, Q., Ward, M., Watkins, J., Weber, M., Wei, W., Wen, L. J., Wichoski, U., Wu, S. X., Wu, W. H., Wu, X., Xia, Q., Yang, H., Yang, L., Zeldovich, O., Zhao, J., Zhou, Y., & Ziegler, T. Reflectivity and PDE of VUV4 Hamamatsu SiPMs in liquid xenon. United States. https://doi.org/10.1088/1748-0221/15/01/p01019
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Nakarmi, P., Ostrovskiy, I., Soma, A. K., Retière, F., Kharusi, S. Al, Alfaris, M., Anton, G., Arnquist, I. J., Badhrees, I., Barbeau, P. S., Beck, D., Belov, V., Bhatta, T., Blatchford, J., Breur, P. A., Brodsky, J. P., Brown, E., Brunner, T., Mamahit, S. Byrne, Caden, E., Cao, G. F., Cao, L., Chambers, C., Chana, B., Charlebois, S. A., Chiu, M., Cleveland, B., Coon, M., Craycraft, A., Dalmasson, J., Daniels, T., Darroch, L., Croix, A. De St., Mesrobian-Kabakian, A. Der, DeVoe, R., Vacri, M. L. Di, Dilling, J., Ding, Y. Y., Dolinski, M. J., Doria, L., Dragone, A., Echevers, J., Edaltafar, F., Elbeltagi, M., Fabris, L., Fairbank, D., Fairbank, W., Farine, J., Ferrara, S., Feyzbakhsh, S., Fontaine, R., Fucarino, A., Gallina, G., Gautam, P., Giacomini, G., Goeldi, D., Gornea, R., Gratta, G., Hansen, E. V., Heffner, M., Hoppe, E. W., Hößl, J., House, A., Hughes, M., Iverson, A., Jamil, A., Jewell, M. J., Jiang, X. S., Karelin, A., Kaufman, L. J., Koffas, T., Krücken, R., Kuchenkov, A., Kumar, K. S., Lan, Y., Larson, A., Leach, K. G., Lenardo, B. G., Leonard, D. S., Li, G., Li, S., Li, Z., Licciardi, C., Lv, P., MacLellan, R., Massacret, N., McElroy, T., Medina-Peregrina, M., Michel, T., Mong, B., Moore, D. C., Murray, K., Natzke, C. R., Newby, R. J., Ning, Z., Njoya, O., Nolet, F., Nusair, O., Odgers, K., Odian, A., Oriunno, M., Orrell, J. L., Ortega, G. S., Overman, C. T., Parent, S., Piepke, A., Pocar, A., Pratte, J. -F., Radeka, V., Raguzin, E., Rescia, S., Richman, M., Robinson, A., Rossignol, T., Rowson, P. C., Roy, N., Runge, J., Saldanha, R., Sangiorgio, S., VIII, K. Skarpaas, St-Hilaire, G., Stekhanov, V., Stiegler, T., Sun, X. L., Tarka, M., Todd, J., Totev, T. I., Tsang, R., Tsang, T., Vachon, F., Veeraraghavan, V., Viel, S., Visser, G., Vivo-Vilches, C., Vuilleumier, J. -L., Wagenpfeil, M., Wager, T., Walent, M., Wang, Q., Ward, M., Watkins, J., Weber, M., Wei, W., Wen, L. J., Wichoski, U., Wu, S. X., Wu, W. H., Wu, X., Xia, Q., Yang, H., Yang, L., Zeldovich, O., Zhao, J., Zhou, Y., and Ziegler, T. Fri . "Reflectivity and PDE of VUV4 Hamamatsu SiPMs in liquid xenon". United States. https://doi.org/10.1088/1748-0221/15/01/p01019. https://www.osti.gov/servlets/purl/1617159.
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@article{osti_1617159,
title = {Reflectivity and PDE of VUV4 Hamamatsu SiPMs in liquid xenon},
author = {Nakarmi, P. and Ostrovskiy, I. and Soma, A. K. and Retière, F. and Kharusi, S. Al and Alfaris, M. and Anton, G. and Arnquist, I. J. and Badhrees, I. and Barbeau, P. S. and Beck, D. and Belov, V. and Bhatta, T. and Blatchford, J. and Breur, P. A. and Brodsky, J. P. and Brown, E. and Brunner, T. and Mamahit, S. Byrne and Caden, E. and Cao, G. F. and Cao, L. and Chambers, C. and Chana, B. and Charlebois, S. A. and Chiu, M. and Cleveland, B. and Coon, M. and Craycraft, A. and Dalmasson, J. and Daniels, T. and Darroch, L. and Croix, A. De St. and Mesrobian-Kabakian, A. Der and DeVoe, R. and Vacri, M. L. Di and Dilling, J. and Ding, Y. Y. and Dolinski, M. J. and Doria, L. and Dragone, A. and Echevers, J. and Edaltafar, F. and Elbeltagi, M. and Fabris, L. and Fairbank, D. and Fairbank, W. and Farine, J. and Ferrara, S. and Feyzbakhsh, S. and Fontaine, R. and Fucarino, A. and Gallina, G. and Gautam, P. and Giacomini, G. and Goeldi, D. and Gornea, R. and Gratta, G. and Hansen, E. V. and Heffner, M. and Hoppe, E. W. and Hößl, J. and House, A. and Hughes, M. and Iverson, A. and Jamil, A. and Jewell, M. J. and Jiang, X. S. and Karelin, A. and Kaufman, L. J. and Koffas, T. and Krücken, R. and Kuchenkov, A. and Kumar, K. S. and Lan, Y. and Larson, A. and Leach, K. G. and Lenardo, B. G. and Leonard, D. S. and Li, G. and Li, S. and Li, Z. and Licciardi, C. and Lv, P. and MacLellan, R. and Massacret, N. and McElroy, T. and Medina-Peregrina, M. and Michel, T. and Mong, B. and Moore, D. C. and Murray, K. and Natzke, C. R. and Newby, R. J. and Ning, Z. and Njoya, O. and Nolet, F. and Nusair, O. and Odgers, K. and Odian, A. and Oriunno, M. and Orrell, J. L. and Ortega, G. S. and Overman, C. T. and Parent, S. and Piepke, A. and Pocar, A. and Pratte, J. -F. and Radeka, V. and Raguzin, E. and Rescia, S. and Richman, M. and Robinson, A. and Rossignol, T. and Rowson, P. C. and Roy, N. and Runge, J. and Saldanha, R. and Sangiorgio, S. and VIII, K. Skarpaas and St-Hilaire, G. and Stekhanov, V. and Stiegler, T. and Sun, X. L. and Tarka, M. and Todd, J. and Totev, T. I. and Tsang, R. and Tsang, T. and Vachon, F. and Veeraraghavan, V. and Viel, S. and Visser, G. and Vivo-Vilches, C. and Vuilleumier, J. -L. and Wagenpfeil, M. and Wager, T. and Walent, M. and Wang, Q. and Ward, M. and Watkins, J. and Weber, M. and Wei, W. and Wen, L. J. and Wichoski, U. and Wu, S. X. and Wu, W. H. and Wu, X. and Xia, Q. and Yang, H. and Yang, L. and Zeldovich, O. and Zhao, J. and Zhou, Y. and Ziegler, T.},
abstractNote = {},
doi = {10.1088/1748-0221/15/01/p01019},
journal = {Journal of Instrumentation},
number = 01,
volume = 15,
place = {United States},
year = {Fri Jan 17 00:00:00 EST 2020},
month = {Fri Jan 17 00:00:00 EST 2020}
}
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