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Title: Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering

Abstract

Titanium nitride (TiN) has recently emerged as an attractive alternative material for plasmonics. However, the typical high-temperature deposition of plasmonic TiN using either sputtering or atomic layer deposition has greatly limited its potential applications and prevented its integration into existing CMOS device architectures. Here, we demonstrate highly plasmonic TiN thin films and nanostructures by a room-temperature, low-power, and bias-free reactive sputtering process. We investigate the optical properties of the TiN films and their dependence on the sputtering conditions and substrate materials. We find that our TiN possesses one of the largest negative values of the real part of the dielectric function as compared to all other plasmonic TiN films reported to date. Two-dimensional periodic arrays of TiN nanodisks are then fabricated, from which we validate that strong plasmonic resonances are supported. Our room-temperature deposition process can allow for fabricating complex plasmonic TiN nanostructures and be integrated into the fabrication of existing CMOS-based photonic devices to enhance their performance and functionalities.

Authors:
 [1];  [2];  [3]; ORCiD logo [4];  [2];  [2]; ORCiD logo [4]; ORCiD logo [5]; ORCiD logo [5]
+ Show Author Affiliations
  1. Los Alamos National Lab. (LANL), Los Alamos, NM (United States). Center for Integrated Nanotechnologies (CINT); National Taiwan Normal Univ., Taipei (Taiwan)
  2. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States). Center for Integrated Nanotechnologies
  3. National Chiao Tung Univ., Tainan (Taiwan). Inst. of Photonic System
  4. Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
  5. Los Alamos National Lab. (LANL), Los Alamos, NM (United States). Center for Integrated Nanotechnologies (CINT)
Publication Date:
Research Org.:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
Sponsoring Org.:
USDOE Laboratory Directed Research and Development (LDRD) Program; USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division; USDOE National Nuclear Security Administration (NNSA); Ministry of Science and Technology of Taiwan (MOST)
OSTI Identifier:
1597357
Report Number(s):
LA-UR-19-29707
Journal ID: ISSN 2045-2322
Grant/Contract Number:  
89233218CNA000001; AC52-06NA25396; MOST-106-2221-E-009-122-MY3
Resource Type:
Accepted Manuscript
Journal Name:
Scientific Reports
Additional Journal Information:
Journal Volume: 9; Journal Issue: 1; Journal ID: ISSN 2045-2322
Publisher:
Nature Publishing Group
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; Energy Sciences; Material Science; Nanophotonics and plasmonics; Optical materials and structures

Citation Formats

Chang, Chun-Chieh, Nogan, John, Yang, Zu-Po, de Melo Kort-Kamp, Wilton Junior, Ross, Willard, Luk, Ting S., Dalvit, Diego Alejandro Roberto, Azad, Abul Kalam, and Chen, Houtong. Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering. United States: N. p., 2019. Web. doi:10.1038/s41598-019-51236-3.
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Chang, Chun-Chieh, Nogan, John, Yang, Zu-Po, de Melo Kort-Kamp, Wilton Junior, Ross, Willard, Luk, Ting S., Dalvit, Diego Alejandro Roberto, Azad, Abul Kalam, & Chen, Houtong. Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering. United States. https://doi.org/10.1038/s41598-019-51236-3
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Chang, Chun-Chieh, Nogan, John, Yang, Zu-Po, de Melo Kort-Kamp, Wilton Junior, Ross, Willard, Luk, Ting S., Dalvit, Diego Alejandro Roberto, Azad, Abul Kalam, and Chen, Houtong. Fri . "Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering". United States. https://doi.org/10.1038/s41598-019-51236-3. https://www.osti.gov/servlets/purl/1597357.
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@article{osti_1597357,
title = {Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering},
author = {Chang, Chun-Chieh and Nogan, John and Yang, Zu-Po and de Melo Kort-Kamp, Wilton Junior and Ross, Willard and Luk, Ting S. and Dalvit, Diego Alejandro Roberto and Azad, Abul Kalam and Chen, Houtong},
abstractNote = {Titanium nitride (TiN) has recently emerged as an attractive alternative material for plasmonics. However, the typical high-temperature deposition of plasmonic TiN using either sputtering or atomic layer deposition has greatly limited its potential applications and prevented its integration into existing CMOS device architectures. Here, we demonstrate highly plasmonic TiN thin films and nanostructures by a room-temperature, low-power, and bias-free reactive sputtering process. We investigate the optical properties of the TiN films and their dependence on the sputtering conditions and substrate materials. We find that our TiN possesses one of the largest negative values of the real part of the dielectric function as compared to all other plasmonic TiN films reported to date. Two-dimensional periodic arrays of TiN nanodisks are then fabricated, from which we validate that strong plasmonic resonances are supported. Our room-temperature deposition process can allow for fabricating complex plasmonic TiN nanostructures and be integrated into the fabrication of existing CMOS-based photonic devices to enhance their performance and functionalities.},
doi = {10.1038/s41598-019-51236-3},
journal = {Scientific Reports},
number = 1,
volume = 9,
place = {United States},
year = {Fri Oct 25 00:00:00 EDT 2019},
month = {Fri Oct 25 00:00:00 EDT 2019}
}
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https://doi.org/10.1038/s41598-019-51236-3
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Searching for better plasmonic materials
journal, March 2010

Quantifying the Efficiency of Plasmonic Materials for Near-Field Enhancement and Photothermal Conversion
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  • Lalisse, Adrien; Tessier, Gilles; Plain, Jérome
  • The Journal of Physical Chemistry C, Vol. 119, Issue 45
  • DOI: 10.1021/acs.jpcc.5b09294

Nonlinear Refractory Plasmonics with Titanium Nitride Nanoantennas
journal, August 2016

Titanium Oxynitride Thin Films with Tunable Double Epsilon-Near-Zero Behavior for Nanophotonic Applications
journal, August 2017

  • Braic, Laurentiu; Vasilantonakis, Nikolaos; Mihai, Andrei
  • ACS Applied Materials & Interfaces, Vol. 9, Issue 35
  • DOI: 10.1021/acsami.7b07660

Quantifying Figures of Merit for Localized Surface Plasmon Resonance Applications: A Materials Survey
journal, January 2019

Local Heating with Lithographically Fabricated Plasmonic Titanium Nitride Nanoparticles
journal, November 2013

  • Guler, Urcan; Ndukaife, Justus C.; Naik, Gururaj V.
  • Nano Letters, Vol. 13, Issue 12
  • DOI: 10.1021/nl4033457

Plasmon-induced hot carrier science and technology
journal, January 2015

  • Brongersma, Mark L.; Halas, Naomi J.; Nordlander, Peter
  • Nature Nanotechnology, Vol. 10, Issue 1
  • DOI: 10.1038/nnano.2014.311

Optical, electronic, and transport properties of nanocrystalline titanium nitride thin films
journal, November 2001

  • Patsalas, P.; Logothetidis, S.
  • Journal of Applied Physics, Vol. 90, Issue 9
  • DOI: 10.1063/1.1403677

In situ spectroscopic ellipsometry to monitor the process of TiN x thin films deposited by reactive sputtering
journal, February 1995

  • Logothetidis, S.; Alexandrou, I.; Papadopoulos, A.
  • Journal of Applied Physics, Vol. 77, Issue 3
  • DOI: 10.1063/1.358963

Optical properties of TiN films deposited by direct current reactive sputtering
journal, February 2000

  • Adachi, Sadao; Takahashi, Mitsutoshi
  • Journal of Applied Physics, Vol. 87, Issue 3
  • DOI: 10.1063/1.372006

Broadband enhancement of local density of states using silicon-compatible hyperbolic metamaterials
journal, June 2015

  • Wang, Yu; Sugimoto, Hiroshi; Inampudi, Sandeep
  • Applied Physics Letters, Vol. 106, Issue 24
  • DOI: 10.1063/1.4922874

Fully CMOS-compatible titanium nitride nanoantennas
journal, February 2016

  • Briggs, Justin A.; Naik, Gururaj V.; Petach, Trevor A.
  • Applied Physics Letters, Vol. 108, Issue 5
  • DOI: 10.1063/1.4941413

Plasma assisted physical vapor deposition processes: A review
journal, May 1985

  • Bunshah, R. F.; Deshpandey, C. V.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 3, Issue 3
  • DOI: 10.1116/1.572993

Optical and electrical properties of reactively sputtered TiN, ZrN, and HfN thin films
conference, September 1994

  • Edlou, Samad M.; Simons, John C.; Al-Jumaily, Ghanim A.
  • SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, SPIE Proceedings
  • DOI: 10.1117/12.185781

Optical Properties and Plasmonic Performance of Titanium Nitride
journal, May 2015

  • Patsalas, Panos; Kalfagiannis, Nikolaos; Kassavetis, Spyros
  • Materials, Vol. 8, Issue 6
  • DOI: 10.3390/ma8063128

Temperature-dependent optical properties of plasmonic titanium nitride thin films
preprint, January 2017

Plasmonic properties of refractory titanium nitride
text, January 2017

Controlling the plasmonic properties of ultrathin TiN films at the atomic level
preprint, January 2017

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