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Title: Defects in C d 3 A s 2 epilayers via molecular beam epitaxy and strategies for reducing them

Abstract

Molecular beam epitaxy offers an exciting avenue for investigating the behavior of the topological semimetal Cd3As2, by providing routes for doping, alloying, strain engineering, and heterostructure formation. To date, however, minimal exploration has been devoted to the impact of defects that are incorporated into epilayers due to constraints imposed by the substrate and narrow growth window. Here, we use a combination of lattice-matched ZnxCd1-xTe buffer layers, miscut substrates, and broadband illumination to study how dislocations, twins, and point defects influence the electron mobility of Cd3As2. In conclusion, a combination of defect suppression approaches produces Cd3As2 epilayers with electron mobilities upwards of 15000 cm2/Vs at room temperature.

Authors:
ORCiD logo [1]; ORCiD logo [2]; ORCiD logo [3];  [3];  [1]
  1. National Renewable Energy Lab. (NREL), Golden, CO (United States)
  2. National Renewable Energy Lab. (NREL), Golden, CO (United States); Jeonbuk National Univ., Jeonju (Republic of Korea)
  3. Univ. of California, Santa Barbara, CA (United States)
Publication Date:
Research Org.:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
Sponsoring Org.:
USDOE National Renewable Energy Laboratory (NREL), Laboratory Directed Research and Development (LDRD) Program
OSTI Identifier:
1580029
Report Number(s):
NREL/JA-5K00-74891
Journal ID: ISSN 2475-9953; PRMHAR; TRN: US2102246
Grant/Contract Number:  
AC36-08GO28308
Resource Type:
Accepted Manuscript
Journal Name:
Physical Review Materials
Additional Journal Information:
Journal Volume: 3; Journal Issue: 12; Journal ID: ISSN 2475-9953
Publisher:
American Physical Society (APS)
Country of Publication:
United States
Language:
English
Subject:
14 SOLAR ENERGY; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; defects; molecular beam epitaxy; scanning electron microscopy; x-ray diffraction; II-VI semiconductors; multilayer thin films

Citation Formats

Rice, Anthony D., Park, Kwangwook, Hughes, Eamonn T., Mukherjee, Kunal, and Alberi, Kirstin M. Defects in Cd3As2 epilayers via molecular beam epitaxy and strategies for reducing them. United States: N. p., 2019. Web. doi:10.1103/PhysRevMaterials.3.121201.
Rice, Anthony D., Park, Kwangwook, Hughes, Eamonn T., Mukherjee, Kunal, & Alberi, Kirstin M. Defects in Cd3As2 epilayers via molecular beam epitaxy and strategies for reducing them. United States. https://doi.org/10.1103/PhysRevMaterials.3.121201
Rice, Anthony D., Park, Kwangwook, Hughes, Eamonn T., Mukherjee, Kunal, and Alberi, Kirstin M. Mon . "Defects in Cd3As2 epilayers via molecular beam epitaxy and strategies for reducing them". United States. https://doi.org/10.1103/PhysRevMaterials.3.121201. https://www.osti.gov/servlets/purl/1580029.
@article{osti_1580029,
title = {Defects in Cd3As2 epilayers via molecular beam epitaxy and strategies for reducing them},
author = {Rice, Anthony D. and Park, Kwangwook and Hughes, Eamonn T. and Mukherjee, Kunal and Alberi, Kirstin M.},
abstractNote = {Molecular beam epitaxy offers an exciting avenue for investigating the behavior of the topological semimetal Cd3As2, by providing routes for doping, alloying, strain engineering, and heterostructure formation. To date, however, minimal exploration has been devoted to the impact of defects that are incorporated into epilayers due to constraints imposed by the substrate and narrow growth window. Here, we use a combination of lattice-matched ZnxCd1-xTe buffer layers, miscut substrates, and broadband illumination to study how dislocations, twins, and point defects influence the electron mobility of Cd3As2. In conclusion, a combination of defect suppression approaches produces Cd3As2 epilayers with electron mobilities upwards of 15000 cm2/Vs at room temperature.},
doi = {10.1103/PhysRevMaterials.3.121201},
journal = {Physical Review Materials},
number = 12,
volume = 3,
place = {United States},
year = {Mon Dec 09 00:00:00 EST 2019},
month = {Mon Dec 09 00:00:00 EST 2019}
}

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