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Title: Using Surface Engineering to Modulate Superconducting Coplanar Microwave Resonator Performance $${{\tau}}$$

Abstract

Superconducting microwave resonators are important components of superconducting quantum information and astronomy detector systems. Here in this paper, we show how to modify the microwave resonator performance after fabrication through surface engineering. In particular, we focus on titanium nitride (TiN)/silicon (Si) resonators because they have shown potential for achieving high-quality factors (Qis). Depending on the type of surface treatment, chemicalor plasma-based, we found Qis that vary by approximately a factor of 18. We used inductively coupled plasma (ICP) combined with reactive ion etching (RIE) for the plasma surface treatment. We found that the microwave resonator performance depends on the type of plasma environment, such as single gas (oxygen) or gas mixtures [argon/hydrogen (Ar/H2), argon/octafluorocyclobutane (Ar/C4F8), and argon/sulfur hexafluoride (Ar/SF6)], and the plasma processing conditions, such as treatment time, ICP power, and RIE power. Of the plasma surface treatments, the Ar/SF6 environments with no or low ICP power showed the highest potential to improve Qi. The processing conditions determined the chemistry and roughness of the Si and TiN surfaces, TiN film thickness, and the overall TiN/Si resonator structure (edge and sidewall). Our results can be used as a guideline for optimizing the microwave resonator performance using surface treatments.

Authors:
ORCiD logo [1];  [2];  [2];  [3]; ORCiD logo [1];  [4]; ORCiD logo [4]
  1. Naval Research Lab. (NRL), Washington, DC (United States). Materials Science and Technology Division
  2. Univ. of Maryland, College Park, MD (United States). Lab. of Physical Sciences and Dept. of Physics
  3. Pontificial Catholic Univ. of Puerto Rico (Puerto Rico)
  4. Univ. of Maryland, College Park, MD (United States). Lab. of Physical Sciences
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1513127
Report Number(s):
LLNL-JRNL-753918
Journal ID: ISSN 1051-8223; 940465
Grant/Contract Number:  
AC52-07NA27344
Resource Type:
Accepted Manuscript
Journal Name:
IEEE Transactions on Applied Superconductivity
Additional Journal Information:
Journal Volume: 29; Journal Issue: 6; Journal ID: ISSN 1051-8223
Publisher:
Institute of Electrical and Electronics Engineers (IEEE)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY

Citation Formats

Lock, Evgeniya H., Xu, Peng, Kohler, Timothy, Camacho, Lizmarie, Prestigiacomo, Joseph, Rosen, Yaniv J., and Osborn, Kevin D. Using Surface Engineering to Modulate Superconducting Coplanar Microwave Resonator Performance ${{\tau}}$. United States: N. p., 2019. Web. doi:10.1109/TASC.2019.2891883.
Lock, Evgeniya H., Xu, Peng, Kohler, Timothy, Camacho, Lizmarie, Prestigiacomo, Joseph, Rosen, Yaniv J., & Osborn, Kevin D. Using Surface Engineering to Modulate Superconducting Coplanar Microwave Resonator Performance ${{\tau}}$. United States. https://doi.org/10.1109/TASC.2019.2891883
Lock, Evgeniya H., Xu, Peng, Kohler, Timothy, Camacho, Lizmarie, Prestigiacomo, Joseph, Rosen, Yaniv J., and Osborn, Kevin D. Wed . "Using Surface Engineering to Modulate Superconducting Coplanar Microwave Resonator Performance ${{\tau}}$". United States. https://doi.org/10.1109/TASC.2019.2891883. https://www.osti.gov/servlets/purl/1513127.
@article{osti_1513127,
title = {Using Surface Engineering to Modulate Superconducting Coplanar Microwave Resonator Performance ${{\tau}}$},
author = {Lock, Evgeniya H. and Xu, Peng and Kohler, Timothy and Camacho, Lizmarie and Prestigiacomo, Joseph and Rosen, Yaniv J. and Osborn, Kevin D.},
abstractNote = {Superconducting microwave resonators are important components of superconducting quantum information and astronomy detector systems. Here in this paper, we show how to modify the microwave resonator performance after fabrication through surface engineering. In particular, we focus on titanium nitride (TiN)/silicon (Si) resonators because they have shown potential for achieving high-quality factors (Qis). Depending on the type of surface treatment, chemicalor plasma-based, we found Qis that vary by approximately a factor of 18. We used inductively coupled plasma (ICP) combined with reactive ion etching (RIE) for the plasma surface treatment. We found that the microwave resonator performance depends on the type of plasma environment, such as single gas (oxygen) or gas mixtures [argon/hydrogen (Ar/H2), argon/octafluorocyclobutane (Ar/C4F8), and argon/sulfur hexafluoride (Ar/SF6)], and the plasma processing conditions, such as treatment time, ICP power, and RIE power. Of the plasma surface treatments, the Ar/SF6 environments with no or low ICP power showed the highest potential to improve Qi. The processing conditions determined the chemistry and roughness of the Si and TiN surfaces, TiN film thickness, and the overall TiN/Si resonator structure (edge and sidewall). Our results can be used as a guideline for optimizing the microwave resonator performance using surface treatments.},
doi = {10.1109/TASC.2019.2891883},
journal = {IEEE Transactions on Applied Superconductivity},
number = 6,
volume = 29,
place = {United States},
year = {Wed Jan 09 00:00:00 EST 2019},
month = {Wed Jan 09 00:00:00 EST 2019}
}

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