Graphene milling dynamics during helium ion beam irradiation
Abstract
We explore the potential of the Helium Ion Microscope (HIM) as a tool for direct-write patterning of graphene and describe the underlying processes of graphene milling with image data processing. Controlled helium ion irradiation of suspended graphene conducted while monitoring the mill in-situ revealed the localized formation of nanopores, their growth, and coalescence. We also explore the effects of defects on the milling dynamics, and show that pre-exposed membranes rupture by cracking and rapid crack propagation at the edges of the growing defects. The mechanism for the rupturing process is described by local defect formation by excessive irradiation of helium ions, dictated by the scanning direction of the beam. As a result, these findings enrich fundamental understanding of the graphene milling process with a helium ion beam that, is necessary for high-resolution and high throughput patterning of graphene with nanoscale precision.
- Authors:
-
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Pusan National Univ., Busan (South Korea)
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Publication Date:
- Research Org.:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1509549
- Alternate Identifier(s):
- OSTI ID: 1548134
- Grant/Contract Number:
- AC05-00OR22725
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Carbon
- Additional Journal Information:
- Journal Volume: 138; Journal Issue: C; Journal ID: ISSN 0008-6223
- Publisher:
- Elsevier
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Kim, Songkil, Dyck, Ondrej, Ievlev, Anton V., Vlassiouk, Ivan V., Kalinin, Sergei V., Belianinov, Alex, Jesse, Stephen, and Ovchinnikova, Olga S. Graphene milling dynamics during helium ion beam irradiation. United States: N. p., 2018.
Web. doi:10.1016/j.carbon.2018.06.017.
Kim, Songkil, Dyck, Ondrej, Ievlev, Anton V., Vlassiouk, Ivan V., Kalinin, Sergei V., Belianinov, Alex, Jesse, Stephen, & Ovchinnikova, Olga S. Graphene milling dynamics during helium ion beam irradiation. United States. https://doi.org/10.1016/j.carbon.2018.06.017
Kim, Songkil, Dyck, Ondrej, Ievlev, Anton V., Vlassiouk, Ivan V., Kalinin, Sergei V., Belianinov, Alex, Jesse, Stephen, and Ovchinnikova, Olga S. Thu .
"Graphene milling dynamics during helium ion beam irradiation". United States. https://doi.org/10.1016/j.carbon.2018.06.017. https://www.osti.gov/servlets/purl/1509549.
@article{osti_1509549,
title = {Graphene milling dynamics during helium ion beam irradiation},
author = {Kim, Songkil and Dyck, Ondrej and Ievlev, Anton V. and Vlassiouk, Ivan V. and Kalinin, Sergei V. and Belianinov, Alex and Jesse, Stephen and Ovchinnikova, Olga S.},
abstractNote = {We explore the potential of the Helium Ion Microscope (HIM) as a tool for direct-write patterning of graphene and describe the underlying processes of graphene milling with image data processing. Controlled helium ion irradiation of suspended graphene conducted while monitoring the mill in-situ revealed the localized formation of nanopores, their growth, and coalescence. We also explore the effects of defects on the milling dynamics, and show that pre-exposed membranes rupture by cracking and rapid crack propagation at the edges of the growing defects. The mechanism for the rupturing process is described by local defect formation by excessive irradiation of helium ions, dictated by the scanning direction of the beam. As a result, these findings enrich fundamental understanding of the graphene milling process with a helium ion beam that, is necessary for high-resolution and high throughput patterning of graphene with nanoscale precision.},
doi = {10.1016/j.carbon.2018.06.017},
journal = {Carbon},
number = C,
volume = 138,
place = {United States},
year = {Thu Jun 14 00:00:00 EDT 2018},
month = {Thu Jun 14 00:00:00 EDT 2018}
}
Web of Science
Figures / Tables:
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