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Title: Nonpolar vertical GaN-on-GaN p–n diodes grown on free-standing $$(10\bar{1}0)$$ m -plane GaN substrates

Abstract

We report nonpolar vertical GaN-on-GaN p–n diodes grown on m-plane free-standing substrates. Cathodoluminescence measurements showed that the nonpolar p-GaN had a high quality with very few deep-level states. The device exhibited good rectifying behaviors with a turn-on voltage of 4.0 V, on-resistance of 2.3 mΩ∙cm2, and high on/off ratio of 1010. The reverse current leakage was described by a trap-assisted space-charge- limited current conduction mechanism. The critical electrical field was calculated to be 2.0 MV/cm without field plates or edge termination. Finally, these results pave the way for development of novel nonpolar power electronics and polarization-engineering-related advanced power devices.

Authors:
 [1];  [2];  [1];  [3];  [3];  [1];  [1];  [1];  [1];  [4];  [3];  [2];  [1]
  1. Arizona State Univ., Tempe, AZ (United States). School of Electrical, Computer, and Energy Engineering
  2. Chinese Academy of Sciences (CAS), CAS, Suzhou (China). Key Lab. of Nanodevices and Applications, Suzhou Inst. of Nanotech and Nanobionics
  3. Arizona State Univ., Tempe, AZ (United States). Dept. of Physics
  4. Chinese Academy of Sciences (CAS), CAS, Suzhou (China). Key Lab. of Nanodevices and Applications, Suzhou Inst. of Nanotech and Nanobionics; Suzhou Nanowin Science and Technology Co., Suzhou (China)
Publication Date:
Research Org.:
Arizona State Univ., Tempe, AZ (United States)
Sponsoring Org.:
USDOE Advanced Research Projects Agency - Energy (ARPA-E)
OSTI Identifier:
1505567
Grant/Contract Number:  
AR0000868
Resource Type:
Accepted Manuscript
Journal Name:
Applied Physics Express
Additional Journal Information:
Journal Volume: 11; Journal Issue: 11; Journal ID: ISSN 1882-0778
Publisher:
Japan Society of Applied Physics
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; 36 MATERIALS SCIENCE

Citation Formats

Fu, Houqiang, Zhang, Xiaodong, Fu, Kai, Liu, Hanxiao, Alugubelli, Shanthan R., Huang, Xuanqi, Chen, Hong, Baranowski, Izak, Yang, Tsung-Han, Xu, Ke, Ponce, Fernando A., Zhang, Baoshun, and Zhao, Yuji. Nonpolar vertical GaN-on-GaN p–n diodes grown on free-standing $(10\bar{1}0)$ m -plane GaN substrates. United States: N. p., 2018. Web. doi:10.7567/APEX.11.111003.
Fu, Houqiang, Zhang, Xiaodong, Fu, Kai, Liu, Hanxiao, Alugubelli, Shanthan R., Huang, Xuanqi, Chen, Hong, Baranowski, Izak, Yang, Tsung-Han, Xu, Ke, Ponce, Fernando A., Zhang, Baoshun, & Zhao, Yuji. Nonpolar vertical GaN-on-GaN p–n diodes grown on free-standing $(10\bar{1}0)$ m -plane GaN substrates. United States. https://doi.org/10.7567/APEX.11.111003
Fu, Houqiang, Zhang, Xiaodong, Fu, Kai, Liu, Hanxiao, Alugubelli, Shanthan R., Huang, Xuanqi, Chen, Hong, Baranowski, Izak, Yang, Tsung-Han, Xu, Ke, Ponce, Fernando A., Zhang, Baoshun, and Zhao, Yuji. Tue . "Nonpolar vertical GaN-on-GaN p–n diodes grown on free-standing $(10\bar{1}0)$ m -plane GaN substrates". United States. https://doi.org/10.7567/APEX.11.111003. https://www.osti.gov/servlets/purl/1505567.
@article{osti_1505567,
title = {Nonpolar vertical GaN-on-GaN p–n diodes grown on free-standing $(10\bar{1}0)$ m -plane GaN substrates},
author = {Fu, Houqiang and Zhang, Xiaodong and Fu, Kai and Liu, Hanxiao and Alugubelli, Shanthan R. and Huang, Xuanqi and Chen, Hong and Baranowski, Izak and Yang, Tsung-Han and Xu, Ke and Ponce, Fernando A. and Zhang, Baoshun and Zhao, Yuji},
abstractNote = {We report nonpolar vertical GaN-on-GaN p–n diodes grown on m-plane free-standing substrates. Cathodoluminescence measurements showed that the nonpolar p-GaN had a high quality with very few deep-level states. The device exhibited good rectifying behaviors with a turn-on voltage of 4.0 V, on-resistance of 2.3 mΩ∙cm2, and high on/off ratio of 1010. The reverse current leakage was described by a trap-assisted space-charge- limited current conduction mechanism. The critical electrical field was calculated to be 2.0 MV/cm without field plates or edge termination. Finally, these results pave the way for development of novel nonpolar power electronics and polarization-engineering-related advanced power devices.},
doi = {10.7567/APEX.11.111003},
journal = {Applied Physics Express},
number = 11,
volume = 11,
place = {United States},
year = {Tue Oct 16 00:00:00 EDT 2018},
month = {Tue Oct 16 00:00:00 EDT 2018}
}

Journal Article:
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Cited by: 15 works
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Figures / Tables:

Figure 1 Figure 1: (a) Polar $\mathcal{c}$-plane and (b) nonpolar $\mathcal{m}$-plane in the GaN wurtzite crystal unit cell. (d) Atomic arrangements of $\mathcal{c}$-plane and $\mathcal{m}$-plane. (c) Schematics of selectively doped p-n junctions. During the fabrication of vertical $\mathrm{JFETs}$ $\mathrm{JBS}$ and $\mathrm{SJs}$, the nonpolar surface will be exposed, and a nonpolar p-n junctionmore » will be formed.« less

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Works referencing / citing this record:

Interfacial Impurities and Their Electronic Signatures in High‐Voltage Regrown Nonpolar m‐ Plane GaN Vertical p–n Diodes
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