Thermal annealing of laser damage precursors on fused silica surfaces

Shen, Nan; Miller, Philip E.; Bude, Jeff D.; Laurence, Ted A.; Suratwala, Tayyab I.; Steele, William A.; Feit, Michael D.; Wong, Lana L.

doi:10.1117/1.OE.51.12.121817

Title: Thermal annealing of laser damage precursors on fused silica surfaces

Abstract

Previous studies have identified two significant precursors of laser damage on fused silica surfaces at fluences <35 J/cm2: photoactive impurities from polishing and surface fractures. We evaluate isothermal heating as a means of remediating the defect structure associated with surface fractures. Vickers indentations are applied to silica surfaces at loads between 0.5 and 10 N, creating fracture networks. The indentations are characterized before and following thermal annealing under various time and temperature conditions using confocal time-resolved photo-luminescence (CTP) imaging, and R/1 damage testing with 3-ns, 355-nm laser pulses. Improvements in the damage thresholds with reductions in CTP intensity are observed at temperatures well below the glass transition temperature (Tg). The damage threshold on 0.5-N indentations improves from <8 to >35 J/cm2 after annealing at approximately 750°C. Larger fracture networks require longer or higher temperature treatment to achieve similar results. At an annealing temperature >1100°C, optical microscopy indicates morphological changes in some of the fractures surrounding the indentations, although remnants of the original fractures are still observed. In conclusion, we demonstrate the potential of using isothermal annealing to improve the laser damage resistance of silica optics, and provide a means of further understanding the physics of optical damage and mitigation.

Authors:

Shen, Nan ^[1]; Miller, Philip E. ^[1]; Bude, Jeff D. ^[1]; Laurence, Ted A. ^[1]; Suratwala, Tayyab I. ^[1]; Steele, William A. ^[1]; Feit, Michael D. ^[1]; Wong, Lana L. ^[1]

Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

Publication Date:: Wed Oct 10 00:00:00 EDT 2012

Research Org.:: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

Sponsoring Org.:: USDOE National Nuclear Security Administration (NNSA)

OSTI Identifier:: 1474366

Report Number(s):: LLNL-JRNL-446111
Journal ID: ISSN 0091-3286; 421701

Grant/Contract Number:: AC52-07NA27344

Resource Type:: Accepted Manuscript

Journal Name:: Optical Engineering

Additional Journal Information:: Journal Volume: 51; Journal Issue: 12; Journal ID: ISSN 0091-3286

Publisher:: SPIE

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; annealing; silica; laser damaged threshold; laser induced damage; surface finishing; glasses; optical damage

Citation Formats


                    Shen, Nan, Miller, Philip E., Bude, Jeff D., Laurence, Ted A., Suratwala, Tayyab I., Steele, William A., Feit, Michael D., and Wong, Lana L. Thermal annealing of laser damage precursors on fused silica surfaces.  United States: N. p., 2012. 
Web.  doi:10.1117/1.OE.51.12.121817.

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                    Shen, Nan, Miller, Philip E., Bude, Jeff D., Laurence, Ted A., Suratwala, Tayyab I., Steele, William A., Feit, Michael D., & Wong, Lana L. Thermal annealing of laser damage precursors on fused silica surfaces.  United States.  https://doi.org/10.1117/1.OE.51.12.121817

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                    Shen, Nan, Miller, Philip E., Bude, Jeff D., Laurence, Ted A., Suratwala, Tayyab I., Steele, William A., Feit, Michael D., and Wong, Lana L. Wed .  
"Thermal annealing of laser damage precursors on fused silica surfaces".  United States.  https://doi.org/10.1117/1.OE.51.12.121817.  https://www.osti.gov/servlets/purl/1474366.

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@article{osti_1474366,

  title        = {Thermal annealing of laser damage precursors on fused silica surfaces},

  author       = {Shen, Nan and Miller, Philip E. and Bude, Jeff D. and Laurence, Ted A. and Suratwala, Tayyab I. and Steele, William A. and Feit, Michael D. and Wong, Lana L.},

  abstractNote = {Previous studies have identified two significant precursors of laser damage on fused silica surfaces at fluences <35 J/cm2: photoactive impurities from polishing and surface fractures. We evaluate isothermal heating as a means of remediating the defect structure associated with surface fractures. Vickers indentations are applied to silica surfaces at loads between 0.5 and 10 N, creating fracture networks. The indentations are characterized before and following thermal annealing under various time and temperature conditions using confocal time-resolved photo-luminescence (CTP) imaging, and R/1 damage testing with 3-ns, 355-nm laser pulses. Improvements in the damage thresholds with reductions in CTP intensity are observed at temperatures well below the glass transition temperature (Tg). The damage threshold on 0.5-N indentations improves from <8 to >35 J/cm2 after annealing at approximately 750°C. Larger fracture networks require longer or higher temperature treatment to achieve similar results. At an annealing temperature >1100°C, optical microscopy indicates morphological changes in some of the fractures surrounding the indentations, although remnants of the original fractures are still observed. In conclusion, we demonstrate the potential of using isothermal annealing to improve the laser damage resistance of silica optics, and provide a means of further understanding the physics of optical damage and mitigation.},

  doi          = {10.1117/1.OE.51.12.121817},

  journal      = {Optical Engineering},

  number       = 12,

  volume       = 51,

  place        = {United States},

  year         = {Wed Oct 10 00:00:00 EDT 2012},

  month        = {Wed Oct 10 00:00:00 EDT 2012}

}

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Works referencing / citing this record:

Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics
journal, November 2017

Huang, Jin; Wang, Fengrui; Liu, Hongjie
Scientific Reports, Vol. 7, Issue 1
DOI: 10.1038/s41598-017-16467-2

Post-processing of fused silica and its effects on damage resistance to nanosecond pulsed UV lasers
journal, January 2016

Ye, Hui; Li, Yaguo; Zhang, Qinghua
Applied Optics, Vol. 55, Issue 11
DOI: 10.1364/ao.55.003017

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Title: Thermal annealing of laser damage precursors on fused silica surfaces

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