Enhancement of voltage-controlled magnetic anisotropy through precise control of Mg insertion thickness at CoFeB|MgO interface
Abstract
We studied the impact of different insertion layers (Ta, Pt, and Mg) at the CoFeB|MgO interface on voltage-controlled magnetic anisotropy (VCMA) effect and other magnetic properties. Inserting a very thin Mg layer of 0.1–0.3 nm yielded a VCMA coefficient of 100 fJ/V-m, more than 3 times higher than the average values of around 30 fJ/V-m reported in Ta|CoFeB|MgO-based structures. Ta and Pt insertion layers also showed a small improvement, yielding VCMA coefficients around 40 fJ/V-m. Electrical, magnetic, and X-ray diffraction results reveal that a Mg insertion layer of around 1.2 nm gives rise to the highest perpendicular magnetic anisotropy, saturation magnetization, as well as the best CoFe and MgO crystallinity. Other Mg insertion thicknesses give rise to either under- or over-oxidation of the CoFe|MgO interface; a strong over-oxidation of the CoFe layer leads to the maximum VCMA effect. These results show that precise control over the Mg insertion thickness and CoFe oxidation level at the CoFeB|MgO interface is crucial for the development of electric-field-controlled perpendicular magnetic tunnel junctions with low write voltage.
- Authors:
-
- Univ. of California, Los Angeles, CA (United States). Dept. of Electrical Engineering
- Univ. of California, Los Angeles, CA (United States). Dept. of Chemical and Biomolecular Engineering
- Univ. of California, Los Angeles, CA (United States). Dept. of Electrical Engineering; Fudan Univ., Shanghai (China). Dept. of Optical Science and Engineering, Key Lab. of Micro and Nano Photonic Structures (Ministry of Education)
- Univ. of California, Los Angeles, CA (United States). Dept. of Chemistry and Biochemistry
- California State Univ. (CalState), Northridge, CA (United States). Dept. of Physics and Astronomy
- Fudan Univ., Shanghai (China). Dept. of Optical Science and Engineering, Key Lab. of Micro and Nano Photonic Structures (Ministry of Education)
- Univ. of California, Los Angeles, CA (United States). Dept. of Electrical Engineering; Inston, Inc., Los Angeles, CA (United States)
- Publication Date:
- Research Org.:
- Energy Frontier Research Centers (EFRC) (United States). Spins and Heat in Nanoscale Electronic Systems (SHINES)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1470343
- Grant/Contract Number:
- SC0012670
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Applied Physics Letters
- Additional Journal Information:
- Journal Volume: 110; Journal Issue: 5; Related Information: SHINES partners with University of California, Riverside (lead); Arizona State University; Colorado State University; Johns Hopkins University; University of California Irvine; University of California Los Angeles; University of Texas at Austin; Journal ID: ISSN 0003-6951
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 36 MATERIALS SCIENCE; 42 ENGINEERING; phonons; thermal conductivity; thermoelectric; spin dynamics; spintronics
Citation Formats
Li, Xiang, Fitzell, Kevin, Wu, Di, Karaba, C. Ty, Buditama, Abraham, Yu, Guoqiang, Wong, Kin L., Altieri, Nicholas, Grezes, Cecile, Kioussis, Nicholas, Tolbert, Sarah, Zhang, Zongzhi, Chang, Jane P., Khalili Amiri, Pedram, and Wang, Kang L. Enhancement of voltage-controlled magnetic anisotropy through precise control of Mg insertion thickness at CoFeB|MgO interface. United States: N. p., 2017.
Web. doi:10.1063/1.4975160.
Li, Xiang, Fitzell, Kevin, Wu, Di, Karaba, C. Ty, Buditama, Abraham, Yu, Guoqiang, Wong, Kin L., Altieri, Nicholas, Grezes, Cecile, Kioussis, Nicholas, Tolbert, Sarah, Zhang, Zongzhi, Chang, Jane P., Khalili Amiri, Pedram, & Wang, Kang L. Enhancement of voltage-controlled magnetic anisotropy through precise control of Mg insertion thickness at CoFeB|MgO interface. United States. https://doi.org/10.1063/1.4975160
Li, Xiang, Fitzell, Kevin, Wu, Di, Karaba, C. Ty, Buditama, Abraham, Yu, Guoqiang, Wong, Kin L., Altieri, Nicholas, Grezes, Cecile, Kioussis, Nicholas, Tolbert, Sarah, Zhang, Zongzhi, Chang, Jane P., Khalili Amiri, Pedram, and Wang, Kang L. Mon .
"Enhancement of voltage-controlled magnetic anisotropy through precise control of Mg insertion thickness at CoFeB|MgO interface". United States. https://doi.org/10.1063/1.4975160. https://www.osti.gov/servlets/purl/1470343.
@article{osti_1470343,
title = {Enhancement of voltage-controlled magnetic anisotropy through precise control of Mg insertion thickness at CoFeB|MgO interface},
author = {Li, Xiang and Fitzell, Kevin and Wu, Di and Karaba, C. Ty and Buditama, Abraham and Yu, Guoqiang and Wong, Kin L. and Altieri, Nicholas and Grezes, Cecile and Kioussis, Nicholas and Tolbert, Sarah and Zhang, Zongzhi and Chang, Jane P. and Khalili Amiri, Pedram and Wang, Kang L.},
abstractNote = {We studied the impact of different insertion layers (Ta, Pt, and Mg) at the CoFeB|MgO interface on voltage-controlled magnetic anisotropy (VCMA) effect and other magnetic properties. Inserting a very thin Mg layer of 0.1–0.3 nm yielded a VCMA coefficient of 100 fJ/V-m, more than 3 times higher than the average values of around 30 fJ/V-m reported in Ta|CoFeB|MgO-based structures. Ta and Pt insertion layers also showed a small improvement, yielding VCMA coefficients around 40 fJ/V-m. Electrical, magnetic, and X-ray diffraction results reveal that a Mg insertion layer of around 1.2 nm gives rise to the highest perpendicular magnetic anisotropy, saturation magnetization, as well as the best CoFe and MgO crystallinity. Other Mg insertion thicknesses give rise to either under- or over-oxidation of the CoFe|MgO interface; a strong over-oxidation of the CoFe layer leads to the maximum VCMA effect. These results show that precise control over the Mg insertion thickness and CoFe oxidation level at the CoFeB|MgO interface is crucial for the development of electric-field-controlled perpendicular magnetic tunnel junctions with low write voltage.},
doi = {10.1063/1.4975160},
journal = {Applied Physics Letters},
number = 5,
volume = 110,
place = {United States},
year = {Mon Jan 30 00:00:00 EST 2017},
month = {Mon Jan 30 00:00:00 EST 2017}
}
Web of Science
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