Atomic Layer-Deposited Titanium-Doped Vanadium Oxide Thin Films and Their Thermistor Applications

Wang, Shuyu; Yu, Shifeng; Lu, Ming; Liu, Mingzhao; Zuo, Lei

doi:10.1007/s11664-016-5150-9

Title: Atomic Layer-Deposited Titanium-Doped Vanadium Oxide Thin Films and Their Thermistor Applications

Abstract

In this paper, we report the enhancement in the temperature coefficient of resistance (TCR) of atomic layer-deposited vanadium oxide thin films through the doping of titanium oxide. The Hall effect measurement provides a potential explanation for the phenomenon. The composition and morphology of the thin films are investigated by x-ray diffraction and scanning electron microscopy techniques. The high TCR, good uniformity, and low processing temperature of the material make it a good candidate for thermistor application.

Authors:

^[1]; Yu, Shifeng ^[2];

^[3]; Liu, Mingzhao ^[3]; Zuo, Lei ^[2]

Stony Brook Univ., Stony Brook, NY (United States)
Virginia Polytechnic Inst. and State Univ. (Virginia Tech), Blacksburg, VA (United States)
Brookhaven National Lab. (BNL), Upton, NY (United States)

Publication Date:: Wed Nov 30 00:00:00 EST 2016

Research Org.:: Brookhaven National Lab. (BNL), Upton, NY (United States)

Sponsoring Org.:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

OSTI Identifier:: 1437945

Report Number(s):: BNL-205653-2018-JAAM
Journal ID: ISSN 0361-5235

Grant/Contract Number:: SC0012704

Resource Type:: Accepted Manuscript

Journal Name:: Journal of Electronic Materials

Additional Journal Information:: Journal Volume: 46; Journal Issue: 4; Journal ID: ISSN 0361-5235

Publisher:: Springer

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; Temperature coefficient of resistance (TCR); Vanadium oxide (VOx); Titanium oxide (TiOx); Atomic layer deposition

Citation Formats


                    Wang, Shuyu, Yu, Shifeng, Lu, Ming, Liu, Mingzhao, and Zuo, Lei. Atomic Layer-Deposited Titanium-Doped Vanadium Oxide Thin Films and Their Thermistor Applications.  United States: N. p., 2016. 
Web.  doi:10.1007/s11664-016-5150-9.

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                    Wang, Shuyu, Yu, Shifeng, Lu, Ming, Liu, Mingzhao, & Zuo, Lei. Atomic Layer-Deposited Titanium-Doped Vanadium Oxide Thin Films and Their Thermistor Applications.  United States.  https://doi.org/10.1007/s11664-016-5150-9

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                    Wang, Shuyu, Yu, Shifeng, Lu, Ming, Liu, Mingzhao, and Zuo, Lei. Wed .  
"Atomic Layer-Deposited Titanium-Doped Vanadium Oxide Thin Films and Their Thermistor Applications".  United States.  https://doi.org/10.1007/s11664-016-5150-9.  https://www.osti.gov/servlets/purl/1437945.

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@article{osti_1437945,

  title        = {Atomic Layer-Deposited Titanium-Doped Vanadium Oxide Thin Films and Their Thermistor Applications},

  author       = {Wang, Shuyu and Yu, Shifeng and Lu, Ming and Liu, Mingzhao and Zuo, Lei},

  abstractNote = {In this paper, we report the enhancement in the temperature coefficient of resistance (TCR) of atomic layer-deposited vanadium oxide thin films through the doping of titanium oxide. The Hall effect measurement provides a potential explanation for the phenomenon. The composition and morphology of the thin films are investigated by x-ray diffraction and scanning electron microscopy techniques. The high TCR, good uniformity, and low processing temperature of the material make it a good candidate for thermistor application.},

  doi          = {10.1007/s11664-016-5150-9},

  journal      = {Journal of Electronic Materials},

  number       = 4,

  volume       = 46,

  place        = {United States},

  year         = {Wed Nov 30 00:00:00 EST 2016},

  month        = {Wed Nov 30 00:00:00 EST 2016}

}

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Works referencing / citing this record:

Nanocalorimeters for biomolecular analysis and cell metabolism monitoring
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Wang, Shuyu; Sha, Xiaopeng; Yu, Shifeng
Biomicrofluidics, Vol. 14, Issue 1
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Materials Research Express, Vol. 6, Issue 1
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Similar Records

Title: Atomic Layer-Deposited Titanium-Doped Vanadium Oxide Thin Films and Their Thermistor Applications

Abstract

Citation Formats

Effects of Ti–W codoping on the optical and electrical switching of vanadium dioxide thin films grown by a reactive pulsed laser deposition journal, September 2004

Enthalpy array analysis of enzymatic and binding reactions journal, June 2008

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Efros-Shklovskii variable range hopping transport in nanocluster metallic films journal, May 2012

Effect of substrate temperature on the microstructure, optical, and electrical properties of reactive DC magnetron sputtering vanadium oxide films journal, August 2012

Preparation of vanadium oxide thin films with high temperature coefficient of resistance by facing targets d.c. reactive sputtering and annealing process journal, February 2007

Annealing characteristics of the vanadium oxide films prepared by modified ion beam enhanced deposition journal, April 2005

Structural transformation and functional properties of vanadium oxide films after low-temperature annealing journal, August 2014

Developments in the Understanding of ALD Processes and Applications of ALD in Critical Technologies conference, January 2007

Ion implantation studies on VOx films prepared by pulsed dc reactive sputtering journal, May 2009

Vanadium Oxide Thin Films Alloyed with Ti, Zr, Nb, and Mo for Uncooled Infrared Imaging Applications journal, October 2012

Low temperature fabrication of VOx thin films for uncooled IR detectors by direct current reactive magnetron sputtering method journal, March 2008

Electrical properties of V2O5 thin films obtained by atomic layer deposition (ALD) journal, January 2004

Process Study and Characterization of VO 2 Thin Films Synthesized by ALD Using TEMAV and O 3 Precursors journal, January 2012

Oxide Electronics Utilizing Ultrafast Metal-Insulator Transitions journal, August 2011

Gas Sensor Based on Metal−Insulator Transition in VO 2 Nanowire Thermistor journal, June 2009

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Investigated performance of uncooled tantalum-doped VOx floating-type microbolometers journal, November 2015

Electrical properties of vanadium oxide thin films for bolometer applications: processed by pulse dc sputtering journal, February 2009

Improvement of temperature coefficient of resistance of a VO 2 film on an SiN/polyimide/Si substrate by excimer laser irradiation for IR sensors journal, April 2014

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Nanocalorimeters for biomolecular analysis and cell metabolism monitoring journal, January 2020

Influence of Al doping on structural, luminescence and electrochemical properties of V 2 O 5 nanostructures synthesized via non-hydrolytic sol-gel technique journal, October 2018

Effects of Ti–W codoping on the optical and electrical switching of vanadium dioxide thin films grown by a reactive pulsed laser deposition
journal, September 2004

Enthalpy array analysis of enzymatic and binding reactions
journal, June 2008

ALD of Vanadium Oxide
conference, January 2009

Efros-Shklovskii variable range hopping transport in nanocluster metallic films
journal, May 2012

Effect of substrate temperature on the microstructure, optical, and electrical properties of reactive DC magnetron sputtering vanadium oxide films
journal, August 2012

Preparation of vanadium oxide thin films with high temperature coefficient of resistance by facing targets d.c. reactive sputtering and annealing process
journal, February 2007

Annealing characteristics of the vanadium oxide films prepared by modified ion beam enhanced deposition
journal, April 2005

Structural transformation and functional properties of vanadium oxide films after low-temperature annealing
journal, August 2014

Developments in the Understanding of ALD Processes and Applications of ALD in Critical Technologies
conference, January 2007

Ion implantation studies on VOx films prepared by pulsed dc reactive sputtering
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Vanadium Oxide Thin Films Alloyed with Ti, Zr, Nb, and Mo for Uncooled Infrared Imaging Applications
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Low temperature fabrication of VOx thin films for uncooled IR detectors by direct current reactive magnetron sputtering method
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Electrical properties of V2O5 thin films obtained by atomic layer deposition (ALD)
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Process Study and Characterization of VO ₂ Thin Films Synthesized by ALD Using TEMAV and O ₃ Precursors
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