In situ observation of atomic movement in a ferroelectric film under an external electric field and stress

Lee, Hyeon Jun; Guo, Er-Jia; Min, Taewon; Hwang, Seung Hyun; Lee, Su Yong; Dorr, Kathrin; Lee, Jaekwang; Jo, Ji Young

doi:10.1007/s12274-017-1956-x

Title: In situ observation of atomic movement in a ferroelectric film under an external electric field and stress

Abstract

Atomic movement under application of external stimuli (i.e., electric field or mechanical stress) in oxide materials has not been observed due to a lack of experimental methods but has been well known to determine the electric polarization. Here, we investigated atomic movement arising from the ferroelectric response of BiFeO₃ thin films under the effect of an electric field and stress in real time using a combination of switching spectroscopy, time-resolved X-ray microdiffraction, and in situ stress engineering. Under an electric field applied to a BiFeO₃ film, the hysteresis loop of the reflected X-ray intensity was found to result from the opposing directions of displaced atoms between the up and down polarization states. An additional shift of atoms arising from the linearly increased dielectric component of the polarization in BiFeO₃ was confirmed through gradual reduction of the diffracted X-ray intensity. The electric-fieldinduced displacement of oxygen atoms was found to be larger than that of Fe atom for both ferroelectric switching and increase of the polarization. In conclusion, the effect of external stress on the BiFeO₃ thin film, which was controlled by applying an electric field to the highly piezoelectric substrate, showed smaller atomic shifts than for the case of applying anmore »« less

Authors:

Lee, Hyeon Jun ^[1];

^[2]; Min, Taewon ^[3]; Hwang, Seung Hyun ^[1]; Lee, Su Yong ^[4]; Dorr, Kathrin ^[5]; Lee, Jaekwang ^[3]; Jo, Ji Young ^[1]

Gwangju Institute of Science and Technology, Gwangju (Republic of Korea)
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Martin-Luther-Univ., Halle (Germany)
Pusan National Univ., Busan (Republic of Korea)
Pohang Accelerator Lab., Pohang (Republic of Korea)
Martin-Luther-Univ., Halle (Germany)

Publication Date:: Thu Aug 02 00:00:00 EDT 2018

Research Org.:: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1436924

Grant/Contract Number:: AC05-00OR22725

Resource Type:: Accepted Manuscript

Journal Name:: Nano Research

Additional Journal Information:: Journal Volume: 11; Journal Issue: 7; Journal ID: ISSN 1998-0124

Publisher:: Springer

Country of Publication:: United States

Language:: English

Subject:: 74 ATOMIC AND MOLECULAR PHYSICS; in situ measurement; atomic displacement under electric field; time-resolved X-ray microdiffraction; ferroelectrics; in situ strain engineering

Citation Formats


                    Lee, Hyeon Jun, Guo, Er-Jia, Min, Taewon, Hwang, Seung Hyun, Lee, Su Yong, Dorr, Kathrin, Lee, Jaekwang, and Jo, Ji Young. In situ observation of atomic movement in a ferroelectric film under an external electric field and stress.  United States: N. p., 2018. 
Web.  doi:10.1007/s12274-017-1956-x.

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                    Lee, Hyeon Jun, Guo, Er-Jia, Min, Taewon, Hwang, Seung Hyun, Lee, Su Yong, Dorr, Kathrin, Lee, Jaekwang, & Jo, Ji Young. In situ observation of atomic movement in a ferroelectric film under an external electric field and stress.  United States.  https://doi.org/10.1007/s12274-017-1956-x

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                    Lee, Hyeon Jun, Guo, Er-Jia, Min, Taewon, Hwang, Seung Hyun, Lee, Su Yong, Dorr, Kathrin, Lee, Jaekwang, and Jo, Ji Young. Thu .  
"In situ observation of atomic movement in a ferroelectric film under an external electric field and stress".  United States.  https://doi.org/10.1007/s12274-017-1956-x.  https://www.osti.gov/servlets/purl/1436924.

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@article{osti_1436924,

  title        = {In situ observation of atomic movement in a ferroelectric film under an external electric field and stress},

  author       = {Lee, Hyeon Jun and Guo, Er-Jia and Min, Taewon and Hwang, Seung Hyun and Lee, Su Yong and Dorr, Kathrin and Lee, Jaekwang and Jo, Ji Young},

  abstractNote = {Atomic movement under application of external stimuli (i.e., electric field or mechanical stress) in oxide materials has not been observed due to a lack of experimental methods but has been well known to determine the electric polarization. Here, we investigated atomic movement arising from the ferroelectric response of BiFeO3 thin films under the effect of an electric field and stress in real time using a combination of switching spectroscopy, time-resolved X-ray microdiffraction, and in situ stress engineering. Under an electric field applied to a BiFeO3 film, the hysteresis loop of the reflected X-ray intensity was found to result from the opposing directions of displaced atoms between the up and down polarization states. An additional shift of atoms arising from the linearly increased dielectric component of the polarization in BiFeO3 was confirmed through gradual reduction of the diffracted X-ray intensity. The electric-fieldinduced displacement of oxygen atoms was found to be larger than that of Fe atom for both ferroelectric switching and increase of the polarization. In conclusion, the effect of external stress on the BiFeO3 thin film, which was controlled by applying an electric field to the highly piezoelectric substrate, showed smaller atomic shifts than for the case of applying an electric field to the film, despite the similar tetragonality.},

  doi          = {10.1007/s12274-017-1956-x},

  journal      = {Nano Research},

  number       = 7,

  volume       = 11,

  place        = {United States},

  year         = {Thu Aug 02 00:00:00 EDT 2018},

  month        = {Thu Aug 02 00:00:00 EDT 2018}

}

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Title: In situ observation of atomic movement in a ferroelectric film under an external electric field and stress

Abstract

Citation Formats

Strong strain dependence of ferroelectric coercivity in a BiFeO3 film journal, April 2011

Atomic Displacement Relationship to Curie Temperature and Spontaneous Polarization in Displacive Ferroelectrics journal, August 1968

Piezoelectricity in the Dielectric Component of Nanoscale Dielectric-Ferroelectric Superlattices journal, May 2010

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Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set journal, October 1996

Strain controlled ferroelectric switching time of BiFeO 3 capacitors journal, December 2012

Effect of Epitaxial Strain on the Spontaneous Polarization of Thin Film Ferroelectrics journal, December 2005

Electronic structure and lattice dynamical properties of different tetragonal phases of BiFeO 3 journal, December 2008

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Polarized Raman scattering of multiferroic BiFeO 3 thin films with pseudo-tetragonal symmetry journal, October 2005

Structural Consequences of Ferroelectric Nanolithography journal, August 2011

Phase Transitions, Phase Coexistence, and Piezoelectric Switching Behavior in Highly Strained BiFeO 3 Films journal, July 2013

Origin of ferroelectricity in perovskite oxides journal, July 1992

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Atomic-scale study of electric dipoles near charged and uncharged domain walls in ferroelectric films journal, December 2007

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journal, May 2010

Depth resolved lattice-charge coupling in epitaxial BiFeO3 thin film
journal, December 2016

Polar metals by geometric design
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Controllable piezoelectricity of Pb(Zr _0.2 Ti _0.8 )O ₃ film via in situ misfit strain
journal, January 2017

Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set
journal, October 1996

Strain controlled ferroelectric switching time of BiFeO ₃ capacitors
journal, December 2012

Effect of Epitaxial Strain on the Spontaneous Polarization of Thin Film Ferroelectrics
journal, December 2005

Electronic structure and lattice dynamical properties of different tetragonal phases of ${BiFeO}_{3}$
journal, December 2008

Structural visualization of polarization fatigue in epitaxial ferroelectric oxide devices
journal, May 2004

Polarized Raman scattering of multiferroic ${BiFeO}_{3}$ thin films with pseudo-tetragonal symmetry
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Structural Consequences of Ferroelectric Nanolithography
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Phase Transitions, Phase Coexistence, and Piezoelectric Switching Behavior in Highly Strained BiFeO ₃ Films
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Origin of ferroelectricity in perovskite oxides
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Ferroelectric 180° Domain Wall Motion Controlled by Biaxial Strain
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Ab initiomolecular dynamics for liquid metals
journal, January 1993

Atomic-scale study of electric dipoles near charged and uncharged domain walls in ferroelectric films
journal, December 2007

Unit-cell scale mapping of ferroelectricity and tetragonality in epitaxial ultrathin ferroelectric films
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Domain Switching Kinetics in Disordered Ferroelectric Thin Films
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Nanosecond Dynamics of Ferroelectric/Dielectric Superlattices
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