The low temperature oxidation of lithium thin films on HOPG by O2 and H2O

Wulfsberg, Steven M.; Koel, Bruce E.; Bernasek, Steven L.

doi:10.1016/j.susc.2016.04.003

Title: The low temperature oxidation of lithium thin films on HOPG by O₂ and H₂O

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Abstract

Lithiated graphite and lithium thin films have been used in fusion devices. In this environment, lithiated graphite will undergo oxidation by background gases. In order to gain insight into this oxidation process, thin (< 15 monolayer (ML)) lithium films on highly ordered pyrolytic graphite (HOPG) were exposed in this paper to O_2(g) and H₂O_(g) in an ultra-high vacuum chamber. High resolution electron energy loss spectroscopy (HREELS) was used to identify the surface species formed during O_2(g) and H₂O_(g) exposure. Auger electron spectroscopy (AES) was used to obtain the relative oxidation rates during O_2(g) and H₂O_(g) exposure. AES showed that as the lithium film thickness decreased from 15 to 5 to 1 ML, the oxidation rate decreased for both O_2(g) and H₂O_(g). HREELS showed that a 15 ML lithium film was fully oxidized after 9.7 L (L) of O_2(g) exposure and Li₂O was formed. HREELS also showed that during initial exposure (< 0.5 L) H₂O_(g), lithium hydride and lithium hydroxide were formed on the surface of a 15 ML lithium film. Finally, after 0.5 L of H₂O_(g) exposure, the H₂O_(g) began to physisorb, and after 15 L of H₂O_(g) exposure, the 15 ML lithium film was not fully oxidized.

Authors:

Wulfsberg, Steven M. ^[1]; Koel, Bruce E. ^[1]; Bernasek, Steven L. ^[1]

Princeton Univ., Princeton, NJ (United States)

Publication Date:: Sat Apr 16 00:00:00 EDT 2016

Research Org.:: Princeton Univ., NJ (United States)

Sponsoring Org.:: USDOE Office of Science (SC), Fusion Energy Sciences (FES)

OSTI Identifier:: 1392280

Alternate Identifier(s):: OSTI ID: 1324349

Grant/Contract Number:: SC0008598

Resource Type:: Accepted Manuscript

Journal Name:: Surface Science

Additional Journal Information:: Journal Volume: 651; Journal ID: ISSN 0039-6028

Publisher:: Elsevier

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; lithium thin films; oxidation; adsorption; lithiated graphite

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                    Wulfsberg, Steven M., Koel, Bruce E., and Bernasek, Steven L. The low temperature oxidation of lithium thin films on HOPG by O2 and H2O.  United States: N. p., 2016. 
Web.  doi:10.1016/j.susc.2016.04.003.

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                    Wulfsberg, Steven M., Koel, Bruce E., & Bernasek, Steven L. The low temperature oxidation of lithium thin films on HOPG by O2 and H2O.  United States.  https://doi.org/10.1016/j.susc.2016.04.003

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                    Wulfsberg, Steven M., Koel, Bruce E., and Bernasek, Steven L. Sat .  
"The low temperature oxidation of lithium thin films on HOPG by O2 and H2O".  United States.  https://doi.org/10.1016/j.susc.2016.04.003.  https://www.osti.gov/servlets/purl/1392280.

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@article{osti_1392280,

  title        = {The low temperature oxidation of lithium thin films on HOPG by O2 and H2O},

  author       = {Wulfsberg, Steven M. and Koel, Bruce E. and Bernasek, Steven L.},

  abstractNote = {Lithiated graphite and lithium thin films have been used in fusion devices. In this environment, lithiated graphite will undergo oxidation by background gases. In order to gain insight into this oxidation process, thin (< 15 monolayer (ML)) lithium films on highly ordered pyrolytic graphite (HOPG) were exposed in this paper to O2(g) and H2O(g) in an ultra-high vacuum chamber. High resolution electron energy loss spectroscopy (HREELS) was used to identify the surface species formed during O2(g) and H2O(g) exposure. Auger electron spectroscopy (AES) was used to obtain the relative oxidation rates during O2(g) and H2O(g) exposure. AES showed that as the lithium film thickness decreased from 15 to 5 to 1 ML, the oxidation rate decreased for both O2(g) and H2O(g). HREELS showed that a 15 ML lithium film was fully oxidized after 9.7 L (L) of O2(g) exposure and Li2O was formed. HREELS also showed that during initial exposure (< 0.5 L) H2O(g), lithium hydride and lithium hydroxide were formed on the surface of a 15 ML lithium film. Finally, after 0.5 L of H2O(g) exposure, the H2O(g) began to physisorb, and after 15 L of H2O(g) exposure, the 15 ML lithium film was not fully oxidized.},

  doi          = {10.1016/j.susc.2016.04.003},

  journal      = {Surface Science},

  number       = ,

  volume       = 651,

  place        = {United States},

  year         = {Sat Apr 16 00:00:00 EDT 2016},

  month        = {Sat Apr 16 00:00:00 EDT 2016}

}

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Title: The low temperature oxidation of lithium thin films on HOPG by O2 and H2O

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Title: The low temperature oxidation of lithium thin films on HOPG by O₂ and H₂O