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Title: Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics

Abstract

Plasmonics enables deep-subwavelength concentration of light and has become important for fundamental studies as well as real-life applications. Two major existing platforms of plasmonics are metallic nanoparticles and metallic films. Metallic nanoparticles allow efficient coupling to far field radiation, yet their synthesis typically leads to poor material quality. Metallic films offer substantially higher quality materials, but their coupling to radiation is typically jeopardized due to the large momentum mismatch with free space. We propose and theoretically investigate optically thin metallic films as an ideal platform for high-radiative-efficiency plasmonics. For far-field scattering, adding a thin high-quality metallic substrate enables a higher quality factor while maintaining the localization and tunability that the nanoparticle provides. For near-field spontaneous emission, a thin metallic substrate, of high quality or not, greatly improves the field overlap between the emitter environment and propagating surface plasmons, enabling high-Purcell (total enhancement >104), high-quantum-yield (>50%) spontaneous emission, even as the gap size vanishes (3–5 nm). The enhancement has almost spatially independent efficiency and does not suffer from quenching effects that commonly exist in previous structures.

Authors:
 [1];  [2];  [3];  [4];  [1];  [1]
  1. Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States). Research Lab. of Electronics
  2. Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States). Research Lab. of Electronics; Technion-Israel Inst. of Tech., Haifa (Israel). Physics Dept. Solid State Inst.
  3. Yale Univ., New Haven, CT (United States). Dept. of Applied Physics
  4. Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States). Dept. of Mathematics
Publication Date:
Research Org.:
Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1388412
Grant/Contract Number:  
SC0001299
Resource Type:
Accepted Manuscript
Journal Name:
Nano Letters
Additional Journal Information:
Journal Volume: 16; Journal Issue: 7; Journal ID: ISSN 1530-6984
Publisher:
American Chemical Society
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; nanoparticles; optical nanoantennas; radiative efficiency; metallic thin film; light scattering; spontaneous emission

Citation Formats

Yang, Yi, Zhen, Bo, Hsu, Chia Wei, Miller, Owen D., Joannopoulos, John D., and Soljačić, Marin. Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics. United States: N. p., 2016. Web. doi:10.1021/acs.nanolett.6b00853.
Yang, Yi, Zhen, Bo, Hsu, Chia Wei, Miller, Owen D., Joannopoulos, John D., & Soljačić, Marin. Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics. United States. https://doi.org/10.1021/acs.nanolett.6b00853
Yang, Yi, Zhen, Bo, Hsu, Chia Wei, Miller, Owen D., Joannopoulos, John D., and Soljačić, Marin. Tue . "Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics". United States. https://doi.org/10.1021/acs.nanolett.6b00853. https://www.osti.gov/servlets/purl/1388412.
@article{osti_1388412,
title = {Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics},
author = {Yang, Yi and Zhen, Bo and Hsu, Chia Wei and Miller, Owen D. and Joannopoulos, John D. and Soljačić, Marin},
abstractNote = {Plasmonics enables deep-subwavelength concentration of light and has become important for fundamental studies as well as real-life applications. Two major existing platforms of plasmonics are metallic nanoparticles and metallic films. Metallic nanoparticles allow efficient coupling to far field radiation, yet their synthesis typically leads to poor material quality. Metallic films offer substantially higher quality materials, but their coupling to radiation is typically jeopardized due to the large momentum mismatch with free space. We propose and theoretically investigate optically thin metallic films as an ideal platform for high-radiative-efficiency plasmonics. For far-field scattering, adding a thin high-quality metallic substrate enables a higher quality factor while maintaining the localization and tunability that the nanoparticle provides. For near-field spontaneous emission, a thin metallic substrate, of high quality or not, greatly improves the field overlap between the emitter environment and propagating surface plasmons, enabling high-Purcell (total enhancement >104), high-quantum-yield (>50%) spontaneous emission, even as the gap size vanishes (3–5 nm). The enhancement has almost spatially independent efficiency and does not suffer from quenching effects that commonly exist in previous structures.},
doi = {10.1021/acs.nanolett.6b00853},
journal = {Nano Letters},
number = 7,
volume = 16,
place = {United States},
year = {Tue May 31 00:00:00 EDT 2016},
month = {Tue May 31 00:00:00 EDT 2016}
}

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Cited by: 14 works
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Works referencing / citing this record:

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