Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?
Abstract
During layer-by-layer homoepitaxial growth, both the Reflection High-Energy Electron Diffraction (RHEED) intensity and the x-ray reflection intensity will oscillate, and each complete oscillation indicates the addition of one monolayer of material. However, it is well documented, but not well understood, that the phase of the RHEED oscillations varies from growth to growth and thus the maxima in the RHEED intensity oscillations do not necessarily occur at the completion of a layer. Here, we demonstrate this by using simultaneous in situ x-ray reflectivity and RHEED to characterize layer-by-layer growth of SrTiO3. We show that we can control the RHEED oscillation phase by changing the pre-growth substrate annealing conditions, changing the RHEED oscillation phase by as much as 137°. In addition, during growth via pulsed laser deposition, the relaxation times between each laser pulse can be used to determine when a layer is complete, independent of the phase of the RHEED oscillation.
- Authors:
-
[5];
- Ithaca College, Ithaca, NY (United States). Dept. of Physics and Astronomy; Cornell Univ., Ithaca, NY (United States). School of Applied and Engineering Physics
- Cornell Univ., Ithaca, NY (United States). Cornell High Energy Synchrotron Source
- Cornell Univ., Ithaca, NY (United States). School of Applied and Engineering Physics
- Ithaca College, Ithaca, NY (United States). Dept. of Physics and Astronomy; Cornell Univ., Ithaca, NY (United States). Cornell High Energy Synchrotron Source
- Cornell Univ., Ithaca, NY (United States). Cornell High Energy Synchrotron Source; Cornell Univ., Ithaca, NY (United States). Dept. of Materials Science and Engineering
- Cornell Univ., Ithaca, NY (United States). School of Applied and Engineering Physics, and Cornell High Energy Synchrotron Source
- Publication Date:
- Research Org.:
- Energy Frontier Research Centers (EFRC) (United States). Energy Materials Center at Cornell (EMC2)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1370412
- Alternate Identifier(s):
- OSTI ID: 1226700
- Grant/Contract Number:
- SC0001086
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Applied Physics Letters
- Additional Journal Information:
- Journal Volume: 106; Journal Issue: 3; Related Information: Emc2 partners with Cornell University (lead); Lawrence Berkeley National Laboratory; Journal ID: ISSN 0003-6951
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
Citation Formats
Sullivan, M. C., Ward, M. J., Gutiérrez-Llorente, Araceli, Adler, Eli R., Joress, H., Woll, A., and Brock, J. D. Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?. United States: N. p., 2015.
Web. doi:10.1063/1.4906419.
Sullivan, M. C., Ward, M. J., Gutiérrez-Llorente, Araceli, Adler, Eli R., Joress, H., Woll, A., & Brock, J. D. Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?. United States. https://doi.org/10.1063/1.4906419
Sullivan, M. C., Ward, M. J., Gutiérrez-Llorente, Araceli, Adler, Eli R., Joress, H., Woll, A., and Brock, J. D. Thu .
"Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?". United States. https://doi.org/10.1063/1.4906419. https://www.osti.gov/servlets/purl/1370412.
@article{osti_1370412,
title = {Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?},
author = {Sullivan, M. C. and Ward, M. J. and Gutiérrez-Llorente, Araceli and Adler, Eli R. and Joress, H. and Woll, A. and Brock, J. D.},
abstractNote = {During layer-by-layer homoepitaxial growth, both the Reflection High-Energy Electron Diffraction (RHEED) intensity and the x-ray reflection intensity will oscillate, and each complete oscillation indicates the addition of one monolayer of material. However, it is well documented, but not well understood, that the phase of the RHEED oscillations varies from growth to growth and thus the maxima in the RHEED intensity oscillations do not necessarily occur at the completion of a layer. Here, we demonstrate this by using simultaneous in situ x-ray reflectivity and RHEED to characterize layer-by-layer growth of SrTiO3. We show that we can control the RHEED oscillation phase by changing the pre-growth substrate annealing conditions, changing the RHEED oscillation phase by as much as 137°. In addition, during growth via pulsed laser deposition, the relaxation times between each laser pulse can be used to determine when a layer is complete, independent of the phase of the RHEED oscillation.},
doi = {10.1063/1.4906419},
journal = {Applied Physics Letters},
number = 3,
volume = 106,
place = {United States},
year = {Thu Jan 22 00:00:00 EST 2015},
month = {Thu Jan 22 00:00:00 EST 2015}
}
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