Tuning the transition temperature of WSi$_{x}$ alloys for use in cryogenic microcalorimeters

Cecil, T.; Gades, L.; Madden, T.; Yan, D.; Miceli, A.

doi:10.1007/s10909-016-1588-7

Title: Tuning the transition temperature of WSi$$_{x}$$ alloys for use in cryogenic microcalorimeters

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Abstract

Here, microwave kinetic inductance detectors (MKID) provide a pathway to highly multiplexed, high-resolution, detectors. Over the past several years we have introduced the concept of the Thermal Kinetic Inductance Detector (TKID), which operates as a microcalorimeter. As with other microcalorimeters, the thermal noise of a TKID is reduced when the operating temperature is decreased. However, because the sensitivity of a TKID decreases as the operating temperature drops below 20% of T_C, the T_C of the resonator material must be tuned to match the desired operating temperature. We have investigated the WSi$$_{x}$$ alloy system as a material for these detectors. By co-sputtering from a Si andW2Si target, we have deposited WSi$$_{x}$$ films with a tunable T_C that ranges from 5 K down to 500 mK. These films provide a large kinetic inductance fraction and relatively low noise levels. We provide results of these studies showing the T_C, resistivity, quality factors, and noise as a function of deposition conditions. These results show that WSi$$_{x}$$ is a good candidate for TKIDs.

Authors:

Cecil, T. ^[1]; Gades, L. ^[1]; Madden, T. ^[1]; Yan, D. ^[2]; Miceli, A. ^[1]

Argonne National Lab. (ANL), Argonne, IL (United States)
Argonne National Lab. (ANL), Argonne, IL (United States); Northwestern Univ., Evanston, IL (United States)

Publication Date:: Thu Mar 10 00:00:00 EST 2016

Research Org.:: Argonne National Lab. (ANL), Argonne, IL (United States)

Sponsoring Org.:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

OSTI Identifier:: 1339420

Grant/Contract Number:: AC02-06CH11357

Resource Type:: Accepted Manuscript

Journal Name:: Journal of Low Temperature Physics

Additional Journal Information:: Journal Volume: 184; Journal Issue: 1-2; Journal ID: ISSN 0022-2291

Publisher:: Plenum Press

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; low temperature detector; kinetic inductance detector; materials; tungsten silicide

Citation Formats


                    Cecil, T., Gades, L., Madden, T., Yan, D., and Miceli, A. Tuning the transition temperature of WSi$_{x}$ alloys for use in cryogenic microcalorimeters.  United States: N. p., 2016. 
Web.  doi:10.1007/s10909-016-1588-7.

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                    Cecil, T., Gades, L., Madden, T., Yan, D., & Miceli, A. Tuning the transition temperature of WSi$_{x}$ alloys for use in cryogenic microcalorimeters.  United States.  https://doi.org/10.1007/s10909-016-1588-7

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                    Cecil, T., Gades, L., Madden, T., Yan, D., and Miceli, A. Thu .  
"Tuning the transition temperature of WSi$_{x}$ alloys for use in cryogenic microcalorimeters".  United States.  https://doi.org/10.1007/s10909-016-1588-7.  https://www.osti.gov/servlets/purl/1339420.

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@article{osti_1339420,

  title        = {Tuning the transition temperature of WSi$_{x}$ alloys for use in cryogenic microcalorimeters},

  author       = {Cecil, T. and Gades, L. and Madden, T. and Yan, D. and Miceli, A.},

  abstractNote = {Here, microwave kinetic inductance detectors (MKID) provide a pathway to highly multiplexed, high-resolution, detectors. Over the past several years we have introduced the concept of the Thermal Kinetic Inductance Detector (TKID), which operates as a microcalorimeter. As with other microcalorimeters, the thermal noise of a TKID is reduced when the operating temperature is decreased. However, because the sensitivity of a TKID decreases as the operating temperature drops below 20% of TC, the TC of the resonator material must be tuned to match the desired operating temperature. We have investigated the WSi$_{x}$ alloy system as a material for these detectors. By co-sputtering from a Si andW2Si target, we have deposited WSi$_{x}$ films with a tunable TC that ranges from 5 K down to 500 mK. These films provide a large kinetic inductance fraction and relatively low noise levels. We provide results of these studies showing the TC, resistivity, quality factors, and noise as a function of deposition conditions. These results show that WSi$_{x}$ is a good candidate for TKIDs.},

  doi          = {10.1007/s10909-016-1588-7},

  journal      = {Journal of Low Temperature Physics},

  number       = 1-2,

  volume       = 184,

  place        = {United States},

  year         = {Thu Mar 10 00:00:00 EST 2016},

  month        = {Thu Mar 10 00:00:00 EST 2016}

}

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