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Title: In situ spectroscopic study of the plastic deformation of amorphous silicon under nonhydrostatic conditions induced by indentation

Abstract

Indentation-induced plastic deformation of amorphous silicon (a-Si) thin films was studied by in situ Raman imaging of the deformed contact region of an indented sample, employing a Raman spectroscopy-enhanced instrumented indentation technique (IIT). The occurrence and evolving spatial distribution of changes in the a-Si structure caused by processes, such as polyamorphization and crystallization, induced by indentation loading were observed. Furthermore, the obtained experimental results are linked with previously published work on the plastic deformation of a-Si under hydrostatic compression and shear deformation to establish a model for the deformation behavior of a-Si under indentation loading.

Authors:
 [1];  [2];  [3];  [4];  [2]
  1. National Institute of Standards and Technology (NIST), Gaithersburg, MD (United States); Univ. of Maryland, College Park, MD (United States)
  2. National Institute of Standards and Technology (NIST), Gaithersburg, MD (United States)
  3. Australian National Univ., Canberra (Australia)
  4. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Publication Date:
Research Org.:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1237635
Alternate Identifier(s):
OSTI ID: 1234065
Grant/Contract Number:  
AC05-00OR22725; 7620
Resource Type:
Accepted Manuscript
Journal Name:
Physical Review. B, Condensed Matter and Materials Physics
Additional Journal Information:
Journal Volume: 92; Journal Issue: 21; Journal ID: ISSN 1098-0121
Publisher:
American Physical Society (APS)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Gerbig, Yvonne B., Michaels, C. A., Bradby, Jodie E., Haberl, Bianca, and Cook, Robert F. In situ spectroscopic study of the plastic deformation of amorphous silicon under nonhydrostatic conditions induced by indentation. United States: N. p., 2015. Web. doi:10.1103/PhysRevB.92.214110.
Gerbig, Yvonne B., Michaels, C. A., Bradby, Jodie E., Haberl, Bianca, & Cook, Robert F. In situ spectroscopic study of the plastic deformation of amorphous silicon under nonhydrostatic conditions induced by indentation. United States. https://doi.org/10.1103/PhysRevB.92.214110
Gerbig, Yvonne B., Michaels, C. A., Bradby, Jodie E., Haberl, Bianca, and Cook, Robert F. Thu . "In situ spectroscopic study of the plastic deformation of amorphous silicon under nonhydrostatic conditions induced by indentation". United States. https://doi.org/10.1103/PhysRevB.92.214110. https://www.osti.gov/servlets/purl/1237635.
@article{osti_1237635,
title = {In situ spectroscopic study of the plastic deformation of amorphous silicon under nonhydrostatic conditions induced by indentation},
author = {Gerbig, Yvonne B. and Michaels, C. A. and Bradby, Jodie E. and Haberl, Bianca and Cook, Robert F.},
abstractNote = {Indentation-induced plastic deformation of amorphous silicon (a-Si) thin films was studied by in situ Raman imaging of the deformed contact region of an indented sample, employing a Raman spectroscopy-enhanced instrumented indentation technique (IIT). The occurrence and evolving spatial distribution of changes in the a-Si structure caused by processes, such as polyamorphization and crystallization, induced by indentation loading were observed. Furthermore, the obtained experimental results are linked with previously published work on the plastic deformation of a-Si under hydrostatic compression and shear deformation to establish a model for the deformation behavior of a-Si under indentation loading.},
doi = {10.1103/PhysRevB.92.214110},
journal = {Physical Review. B, Condensed Matter and Materials Physics},
number = 21,
volume = 92,
place = {United States},
year = {Thu Dec 17 00:00:00 EST 2015},
month = {Thu Dec 17 00:00:00 EST 2015}
}

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Cited by: 24 works
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