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Title: Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens

Abstract

We report on the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using a sputtering deposition technique, in which a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization shows an efficiency of 27% and a focus size of 26 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging is achieved in the fabricated structure. We anticipate that continuous development on wedged MLLs will advance x-ray nanofocusing optics to new frontiers and enrich capabilities and opportunities for hard X-ray microscopy.

Authors:
 [1];  [2];  [1];  [1];  [3];  [3];  [1];  [1];  [1];  [3];  [4];  [1];  [1]
  1. Brookhaven National Lab. (BNL), Upton, NY (United States)
  2. Brookhaven National Lab. (BNL), Upton, NY (United States); Argonne National Lab. (ANL), Argonne, IL (United States)
  3. Argonne National Lab. (ANL), Argonne, IL (United States)
  4. Univ. College London, London (United Kingdom); Research Complex at Hartwell, Oxfordshire (United Kingdom)
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States); Brookhaven National Lab. (BNL), Upton, NY (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1215667
Grant/Contract Number:  
AC02-06CH11357; SC00112704; 227711; DMR-9724294
Resource Type:
Accepted Manuscript
Journal Name:
Optics Express
Additional Journal Information:
Journal Volume: 23; Journal Issue: 10; Journal ID: ISSN 1094-4087
Publisher:
Optical Society of America (OSA)
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; X-ray optics; deposition and fabrication; phase retrieval; image reconstruction techniques

Citation Formats

Huang, Xiaojing, Conley, Raymond, Bouet, Nathalie, Zhou, Juan, Macrander, Albert, Maser, Jorg, Yan, Hanfei, Nazaretski, Evgeny, Lauer, Kenneth, Harder, Ross, Robinson, Ian K., Kalbfleisch, Sebastian, and Chu, Yong S.. Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens. United States: N. p., 2015. Web. doi:10.1364/OE.23.012496.
Huang, Xiaojing, Conley, Raymond, Bouet, Nathalie, Zhou, Juan, Macrander, Albert, Maser, Jorg, Yan, Hanfei, Nazaretski, Evgeny, Lauer, Kenneth, Harder, Ross, Robinson, Ian K., Kalbfleisch, Sebastian, & Chu, Yong S.. Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens. United States. https://doi.org/10.1364/OE.23.012496
Huang, Xiaojing, Conley, Raymond, Bouet, Nathalie, Zhou, Juan, Macrander, Albert, Maser, Jorg, Yan, Hanfei, Nazaretski, Evgeny, Lauer, Kenneth, Harder, Ross, Robinson, Ian K., Kalbfleisch, Sebastian, and Chu, Yong S.. Mon . "Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens". United States. https://doi.org/10.1364/OE.23.012496. https://www.osti.gov/servlets/purl/1215667.
@article{osti_1215667,
title = {Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens},
author = {Huang, Xiaojing and Conley, Raymond and Bouet, Nathalie and Zhou, Juan and Macrander, Albert and Maser, Jorg and Yan, Hanfei and Nazaretski, Evgeny and Lauer, Kenneth and Harder, Ross and Robinson, Ian K. and Kalbfleisch, Sebastian and Chu, Yong S.},
abstractNote = {We report on the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using a sputtering deposition technique, in which a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization shows an efficiency of 27% and a focus size of 26 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging is achieved in the fabricated structure. We anticipate that continuous development on wedged MLLs will advance x-ray nanofocusing optics to new frontiers and enrich capabilities and opportunities for hard X-ray microscopy.},
doi = {10.1364/OE.23.012496},
journal = {Optics Express},
number = 10,
volume = 23,
place = {United States},
year = {Mon May 04 00:00:00 EDT 2015},
month = {Mon May 04 00:00:00 EDT 2015}
}

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Cited by: 25 works
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