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Title: Influence of implantation temperature and He implantation-induced defects on morphological evolution of co-deposited Cu-Mo nanocomposites

Journal Article · · Journal of Nuclear Materials
 [1];  [2];  [3];  [2];  [4];  [3];  [1];  [1]
  1. Texas A & M Univ., College Station, TX (United States)
  2. Los Alamos National Laboratory (LANL), Los Alamos, NM (United States). Center for Integrated Nanotechnologies (CINT)
  3. Univ. of Michigan, Ann Arbor, MI (United States)
  4. Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)

Here, we investigate the effect of high-temperature helium (He) implantation on microstructural evolution in physical-vapor-co-deposited nanocomposite thin films of copper (Cu) and molybdenum (Mo). The microstructure morphologies of He-implanted and He-free domains are characterized using transmission electron microscopy and statistical analysis. High implantation temperatures (500°C and 750°C) lead to coarsening of Cu and Mo domains and their eventual reorientation. The microstructure evolution in He-implanted and He-free domains is comparable, indicating that implantation-induced defects do not accelerate the coarsening of the nanocomposite as compared to annealing alone. This observation contrasts with previously reported effects of implantation-induced defects on single-phase nanocrystalline metals, which include enhancement of grain growth by increasing self-diffusivity or its inhibition by pinning of grain boundaries.

Research Organization:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States); Texas A&M Engineering Experiment Station, Bryan, TX (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities (SUF)
Grant/Contract Number:
89233218CNA000001; SC0018892
OSTI ID:
2506998
Report Number(s):
LA-UR--24-29295
Journal Information:
Journal of Nuclear Materials, Journal Name: Journal of Nuclear Materials Vol. 607; ISSN 0022-3115
Publisher:
ElsevierCopyright Statement
Country of Publication:
United States
Language:
English

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