Optical and electrical properties of proton-implanted p-GaSb for electrical isolation
Journal Article
·
· Applied Physics Express
- The Ohio State Univ., Columbus, OH (United States)
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States). Center for Integrated Nanotechnologies
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
The effect of proton implantation as isolation implant and subsequent annealing on the optical absorption and electrical resistivity of low-bandgap p-GaSb is reported. The measured transmittance spectra indicates that implantation creates a distribution of energy levels extending into the bandgap. Electrical measurements show that the average sheet resistance of the implanted layer increases only by an order of magnitude from its pre-implantation value at a proton dose of ~1013 cm-2 followed by 200 °C annealing. It is also shown that annealing reduces the implantation-induced optical absorption while still retaining a high electrical resistivity.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States). Center for Integrated Nanotechnologies
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES); National Science Foundation (NSF); USDOE National Nuclear Security Administration (NNSA)
- Grant/Contract Number:
- NA0003525
- OSTI ID:
- 2498422
- Report Number(s):
- SAND--2025-00039J
- Journal Information:
- Applied Physics Express, Journal Name: Applied Physics Express Journal Issue: 12 Vol. 17; ISSN 1882-0778
- Publisher:
- Japan Society of Applied PhysicsCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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