Plasma sources for advanced semiconductor applications

Versolato, Oscar; Kaganovich, Igor; Bera, Kallol; Lill, Thorsten; Lee, Hyo-Chang; Hoekstra, Ronnie; Sheil, John; Nam, Sang Ki

doi:10.1063/5.0247819

Title: Plasma sources for advanced semiconductor applications

Journal Article · 04 December 2024 · Applied Physics Letters

DOI: https://doi.org/10.1063/5.0247819 · OSTI ID:2496686

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Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Vrije Univ., Amsterdam (Netherlands)
Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)
Applied Materials, Inc., Santa Clara, CA (United States)
Lam Research Corporation, Fremont, CA (United States)
Korea Aerospace University, Goyang (Korea, Republic of)
Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Univ. of Groningen (Netherlands)
Samsung Electronics Corp. (Korea, Republic of)

Semiconductors are the foundation of modern technology, used in our personal, industrial, and military-grade devices. Further, every aspect of U.S. society is closely tied to semiconductors, and our economy cannot progress at the current pace with existing chip manufacturing methods as chip features approach an atomistic scale.

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Research Organization:: Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)

Sponsoring Organization:: USDOE

Grant/Contract Number:: AC02-09CH11466

OSTI ID:: 2496686

Journal Information:: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 23 Vol. 125; ISSN 0003-6951

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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70 PLASMA PHYSICS AND FUSION TECHNOLOGY
Inductively coupled plasma
Laser induced fluorescence
Microelectronics
Plasma diagnostics
Plasma discharges
Plasma processing
Plasma production
Plasma properties and parameters
Plasma sources
Semiconductors

Title: Plasma sources for advanced semiconductor applications

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