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Title: Autoregressive distributed lag-based dynamic uniformity modeling and monitoring approaches for superconductor manufacturing

Journal Article · · International Journal of Computer Integrated Manufacturing
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  1. Univ. of Houston, TX (United States)
  2. Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)
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High-temperature superconductors (HTS), known for their high efficiency and low energy loss, have found profound applications across various fields, driving the demand for long, uniformly performing tapes. However, ensuring uniform performance over extended lengths of HTS tapes, often characterized by the consistency of critical current, remains challenging due to fluctuations in growth conditions during manufacturing. Here, to elucidate the mechanisms underlying variations in tape uniformity and enable real-time monitoring of associated parameters, we propose an Autoregressive Distributed Lag (ADL)-based Dynamic Uniformity Modeling and Monitoring (ADUM2) approach. This method integrates uniformity measurement, the identification of critical process parameters and real-time monitoring within the manufacturing process. The ADUM2 approach is applied to the advanced metal organic chemical vapor deposition (A-MOCVD) process, a pilot-scale method for superconductor manufacturing. Our model demonstrates superior performance compared to benchmark methods, accounting for over 80% of the total variance in the data and identifying 13 key process parameters influencing the uniformity of HTS tapes. This study offers significant insights into the high-temperature superconductor manufacturing process and holds the potential to facilitate the production of cost-effective, uniformly performing long superconducting tapes in the future.

Research Organization:
Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)
Sponsoring Organization:
USDOE
Grant/Contract Number:
AC02-09CH11466
OSTI ID:
2475831
Journal Information:
International Journal of Computer Integrated Manufacturing, Journal Name: International Journal of Computer Integrated Manufacturing; ISSN 0951-192X
Country of Publication:
United States
Language:
English

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Related Subjects

autoregressive distributed lag analysis
dynamic uniformity modeling and monitoring
nonparametric control chart
superconductor manufacturing