Determining the oxidation stability of SnSe under atmospheric exposure

Chin, Jonathan R.; Gardner, Bonnie G.; Frye, Marshall B.; Liu, Derrick S-H.; Marini, Sebastian A.; Shallenberger, Jeffrey; McDowell, Matthew T.; Hilse, Maria; Law, Stephanie; Garten, Lauren M.

doi:10.1557/s43579-024-00630-8

Title: Determining the oxidation stability of SnSe under atmospheric exposure

Journal Article · 19 September 2024 · MRS communications

DOI: https://doi.org/10.1557/s43579-024-00630-8 · OSTI ID:2473500

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; Liu, Derrick S-H.; Marini, Sebastian A.;

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Abstract Understanding surface stability becomes critical as 2D materials like SnSe are developed for piezoelectric and optical applications. SnSe thin films deposited by molecular beam epitaxy showed no structural changes after a two-year exposure to atmosphere, as confirmed by X-ray diffraction and Raman spectroscopy. X-ray photoelectron spectroscopy and reflectivity show a stable 3.5 nm surface oxide layer, indicating a self-arresting oxidative process. Resistivity measurements show an electrical response dominated by SnSe post-exposure. This work shows that SnSe films can be used in ambient conditions with minimal risk of long-term degradation, which is critical for the development of piezoelectric or photovoltaic devices. Graphical Abstract

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Sponsoring Organization:: USDOE

OSTI ID:: 2473500

Journal Information:: MRS communications, Journal Name: MRS communications Journal Issue: 5 Vol. 14; ISSN 2159-6867

Publisher:: Cambridge University Press (CUP)Copyright Statement

Country of Publication:: United States

Language:: English

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