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Title: Nozzle-Free Printing of CNT Electronics Using Laser-Generated Focused Ultrasound

Journal Article · · Small Methods
ORCiD logo [1]; ORCiD logo [2];  [1];  [3];  [4];  [5]
  1. Boise State Univ., ID (United States)
  2. Applied Physics University of Michigan Ann Arbor MI 48109 USA
  3. Boise State Univ., ID (United States); Idaho National Laboratory (INL), Idaho Falls, ID (United States)
  4. Univ. of Michigan, Ann Arbor, MI (United States)
  5. Oregon State Univ., Corvallis, OR (United States)

Printed electronics have made remarkable progress in recent years and inkjet printing (IJP) has emerged as one of the leading methods for fabricating printed electronic devices. However, challenges such as nozzle clogging, and strict ink formulation constraints have limited their widespread use. To address this issue, a novel nozzle-free printing technology is explored, which is enabled by laser-generated focused ultrasound, as a potential alternative printing modality called Shock-wave Jet Printing (SJP). Specifically, the performance of SJP-printed and IJP-printed bottom-gated carbon nanotube (CNT) thin film transistors (TFTs) is compared. While IJP required ten print passes to achieve fully functional devices with channel dimensions ranging from tens to hundreds of micrometers, SJP achieved comparable performance with just a single pass. For optimized devices, SJP demonstrated six times higher maximum mobility than IJP-printed devices. Furthermore, the advantages of nozzle-free printing are evident, as SJP successfully printed stored and unsonicated inks, delivering moderate electrical performance, whereas IJP suffered from nozzle clogging due to CNT agglomeration. Moreover, SJP can print significantly longer CNTs, spanning the entire range of tube lengths of commercially available CNT ink. The findings from this study contribute to the advancement of nanomaterial printing, ink formulation, and the development of cost-effective printable electronics.

Research Organization:
Idaho National Laboratory (INL), Idaho Falls, ID (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA); USDOE Office of Nuclear Energy (NE); US Air Force Office of Scientific Research (AFOSR); National Science Foundation (NSF)
Grant/Contract Number:
AC07-05ID14517; NE0008677; NE0008496
OSTI ID:
2396298
Journal Information:
Small Methods, Journal Name: Small Methods Journal Issue: 10 Vol. 8; ISSN 2366-9608
Publisher:
WileyCopyright Statement
Country of Publication:
United States
Language:
English

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