Application of helium line intensity ratio spectroscopy to xenon plasma in E × B Penning discharge

Sekine, Hokuto; Diallo, Ahmed; Abe, Shota; Raitses, Yevgeny; Koizumi, Hiroyuki

doi:10.1088/1361-6595/ad3847

Title: Application of helium line intensity ratio spectroscopy to xenon plasma in E × B Penning discharge

Journal Article · 04 April 2024 · Plasma Sources Science and Technology

DOI: https://doi.org/10.1088/1361-6595/ad3847 · OSTI ID:2352446

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Univ. of Tokyo (Japan)
Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)

Here, we propose the application of helium line intensity ratio spectroscopy in a low-pressure (0.3 mTorr) xenon E × B discharge with an electron temperature of ~2 eV and a density of 10¹⁰–10¹¹ cm^–3. We successfully identified the helium atom line emissions at 388.9, 447.1, 501.6, 504.8, and 706.5 nm with helium pressures of up to ~20 mTorr. The measured electron temperature, density, and I–V characteristics of the discharge remained almost constant in all helium pressures in the present experiment, indicating the suitability of the helium gas as a diagnostic gas. The results of helium line intensity ratio spectroscopy using the line emissions at 388.9, 447.1, and 504.8 nm showed fair agreement with the Langmuir probe measurement. Considering the trade-off relationship between the disturbance introduced by the helium gas and the signal-to-noise ratio, we conclude that a helium pressure of approximately 4 mTorr (approximately 13 times the partial pressure of xenon) represents the optimal pressure range for the application of the helium line emission intensity ratio method to this xenon plasma. It is found that the use of the line emissions at 501.6 and 706.5 nm result in a significant disturbance in the helium line intensity ratio method due to the radiation trapping effect.

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Research Organization:: Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)

Sponsoring Organization:: USDOE

Grant/Contract Number:: AC02-09CH11466

OSTI ID:: 2352446

Journal Information:: Plasma Sources Science and Technology, Journal Name: Plasma Sources Science and Technology Journal Issue: 4 Vol. 33; ISSN 0963-0252

Publisher:: IOP PublishingCopyright Statement

Country of Publication:: United States

Language:: English

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70 PLASMA PHYSICS AND FUSION TECHNOLOGY
low temperature plasmas
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Title: Application of helium line intensity ratio spectroscopy to xenon plasma in E × B Penning discharge

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