Enhanced laser-induced damage performance of all-glass metasurfaces for energetic pulsed laser applications

Journal Article · 22 October 2023 · Applied Optics

DOI: https://doi.org/10.1364/ao.502242 · OSTI ID:2282838

Ray, Nathan J.  ^[1]; Yoo, Jae-Hyuck  ^[1]; Nguyen, Hoang T. ^[1]; Norton, Mary ^[1]; Cross, David ^[1]; Carr, Christopher W. ^[1]; Feigenbaum, Eyal  ^[1]

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1. Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

To fabricate optical components with surface layers compatible with high power laser applications that may operate as antireflective coatings, polarization rotators, or harness physical anisotropy for other uses, metasurfaces are becoming an appealing candidate. In this study, a large-beam (1.05 cm diameter) 351-nm laser-induced damage testing was done on an all-glass metasurface structure composed of cone-like features with a subwavelength spacing of adjacent features. These structures were fabricated on untreated fused silica glass and damage tested, as were structures that were fabricated on fused silica glass that experienced a preliminary etching process to remove the surface Beilby layer that is characteristic of polished fused silica. The laser-induced damage onset for structures on untreated fused silica glass was 19.3 J∙cm^-2, while the sample that saw an initial pretreatment etch exhibited an improved damage onset of 20.4 J∙cm^-2, only 6% short of the reference pretreated glass damage onset of 21.7 J∙cm^-2. For perspective, the National Ignition Facility (NIF) operational average fluence at this wavelength and pulse length is about 10 J/cm2. At a fluence of 25.5 J∙cm^-2, the reference (pretreated) fused silica initiated 5.2 damage sites per mm², while the antireflective metasurface sample with a preliminary etching process treatment initiated 9.8 damage sites per mm². In conclusion, these findings demonstrate that substrate-engraved metasurfaces are compatible with high energy and power laser applications, further broadening their application space.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE National Nuclear Security Administration (NNSA); USDOE Laboratory Directed Research and Development (LDRD) Program
• Grant/Contract Number: AC52-07NA27344
• OSTI ID: 2282838
• Alternate ID(s): OSTI ID: 2203174
• Report Number(s): LLNL--JRNL-851798; 1077898
• Journal Information: Applied Optics, Journal Name: Applied Optics Journal Issue: 31 Vol. 62; ISSN 1559-128X
• Publisher: Optical Society of AmericaCopyright Statement
• Country of Publication: United States
• Language: English