Imaging Strain-Localized Single-Photon Emitters in Layered GaSe below the Diffraction Limit

Luo, Weijun; Lawrie, Benjamin J.; Puretzky, Alexander A.; Tan, Qishuo; Gao, Hongze; Lingerfelt, David B.; Eichman, Gage; Mcgee, Edward; Swan, Anna K.; Liang, Liangbo; Ling, Xi

doi:10.1021/acsnano.3c05250

Title: Imaging Strain-Localized Single-Photon Emitters in Layered GaSe below the Diffraction Limit

Journal Article · 02 December 2023 · ACS Nano

DOI: https://doi.org/10.1021/acsnano.3c05250 · OSTI ID:2251640

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^[1]; Gao, Hongze ^[1];

^[2]; Eichman, Gage ^[2]; Mcgee, Edward ^[1];

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Boston Univ., MA (United States)
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Nanoscale strain control of exciton funneling is an increasingly critical tool for the scalable production of single photon emitters (SPEs) in two-dimensional materials. However, conventional far-field optical microscopies remain constrained in spatial resolution by the diffraction limit and thus can provide only a limited description of nanoscale strain localization of SPEs. Here, we quantify the effects of nanoscale heterogeneous strain on the energy and brightness of GaSe SPEs on nanopillars with correlative cathodoluminescence, photoluminescence, and atomic force microscopy, supported by density functional theory simulations. We report the strain-localized SPEs have a broad range of emission wavelengths from 620 to 900 nm. We reveal substantial strain-controlled SPE wavelength tunability over a ~100 nm spectral range and 2 orders of magnitude enhancement in the SPE brightness at the pillar center due to Type-I exciton funneling. In addition, we show that radiative biexciton cascade processes contribute to observed CL photon superbunching. Also, the GaSe SPEs show excellent stability, where their properties remain unchanged after electron beam exposure. Importantly, we anticipate that this comprehensive study on the nanoscale strain control of two-dimensional SPEs will provide key insights to guide the development of truly deterministic quantum photonics.

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Research Organization:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities (SUF); National Science Foundation (NSF)

Grant/Contract Number:: AC05-00OR22725; SC0021064

OSTI ID:: 2251640

Journal Information:: ACS Nano, Journal Name: ACS Nano Journal Issue: 23 Vol. 17; ISSN 1936-0851

Publisher:: American Chemical Society (ACS)Copyright Statement

Country of Publication:: United States

Language:: English

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