Etching of Silicon Dioxide with Gas Phase HF and Water: Initiation, Bulk Etching, and Termination.
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Reactivity of selectively terminated single crystal silicon surfaces
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Increased selectivity in area-selective ALD by combining nucleation enhancement and SAM-based inhibition
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N-Bromosuccinimide-based bromination and subsequent functionalization of hydrogen-terminated silicon quantum dots
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Morphology of hydrogen-terminated Si(111) and Si(100) surfaces upon etching in HF and buffered-HF solutions
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May 1992 |
Thin-film electronics by atomic layer deposition
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December 2011 |
Formation and Structure of Self-Assembled Monolayers
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January 1996 |
Controlled Grafting of Well-Defined Polymers on Hydrogen-Terminated Silicon Substrates by Surface-Initiated Atom Transfer Radical Polymerization
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August 2003 |
Methods for Brominations at Benzylic Positions
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January 2019 |
Solution reduction synthesis of surface stabilized silicon nanoparticles
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July 2002 |
Atomic processes during Cl supersaturation etching of Si ( 100 ) − ( 2 × 1 )
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March 2009 |
Covalent bonding of thiophenes to Si(111) by a halogenation/thienylation route1Issued as NRCC Publ. No. 40854.1
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April 1998 |
Carboxyl functionalization of ultrasmall luminescent silicon nanoparticles through thermal hydrosilylation
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January 2006 |
Sequential Regeneration of Self-Assembled Monolayers for Highly Selective Atomic Layer Deposition
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September 2016 |
Area-Selective Atomic Layer Deposition Patterned by Electrohydrodynamic Jet Printing for Additive Manufacturing of Functional Materials and Devices
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November 2020 |
Efficient α-Halogenation of Carbonyl Compounds by N-Bromosuccinimide and N-Chlorosuccinimde
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Si–N linkage in ultrabright, ultrasmall Si nanoparticles
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June 2001 |
Solution Synthesis of Ultrastable Luminescent Siloxane-Coated Silicon Nanoparticles
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July 2004 |
Insight into the removal and reapplication of small inhibitor molecules during area-selective atomic layer deposition of SiO2
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January 2021 |
Investigation of thin oxide layer removal from Si substrates using an SiO2atomic layer etching approach: the importance of the reactivity of the substrate
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June 2017 |
The tris(trimethylsilyl)silyl group in organic, coordination and organometallic chemistry
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November 2004 |
Erratum: “Fully ALD-grown TiN/Hf0.5Zr0.5O2/TiN stacks: Ferroelectric and structural properties” [Appl. Phys. Lett. 109, 192903 (2016)]
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December 2016 |
Chlorination−Methylation of the Hydrogen-Terminated Silicon(111) Surface Can Induce a Stacking Fault in the Presence of Etch Pits
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March 2006 |
Area-Selective Atomic Layer Deposition of SiO 2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
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September 2017 |
Size independent blue luminescence in nitrogen passivated silicon nanocrystals: Size independent blue luminescence
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September 2012 |
Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition
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July 2015 |
Vapor-Phase Carbenylation of Hard and Soft Material Interfaces
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October 2016 |
Benzylic Brominations with N-Bromosuccinimide in (Trifluoromethyl)benzene
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April 2009 |
Reaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si–N Bonds
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October 2020 |
Direct etching at the nanoscale through nanoparticle-directed capillary condensation
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January 2020 |
Water reaction with chlorine-terminated silicon (111) and (100) surfaces
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October 2005 |
Optimization of Photogenerated Charge Carrier Lifetimes in ALD Grown TiO2 for Photonic Applications
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August 2020 |
Area-Selective Atomic Layer Deposition: Conformal Coating, Subnanometer Thickness Control, and Smart Positioning
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September 2015 |
ALD Resist Formed by Vapor-Deposited Self-Assembled Monolayers
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January 2007 |
Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 39, Issue 5
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July 2021 |
Enhanced atomic layer etching of native aluminum oxide for ultraviolet optical applications
- Hennessy, John; Moore, Christopher S.; Balasubramanian, Kunjithapatham
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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 35, Issue 4
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July 2017 |
Chlorination of hydrogen-terminated silicon (111) surfaces
- Rivillon, Sandrine; Chabal, Yves J.; Webb, Lauren J.
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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 23, Issue 4
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July 2005 |
Inherently Area‐Selective Atomic Layer Deposition of SiO 2 Thin Films to Confer Oxide Versus Nitride Selectivity
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June 2021 |
Area-Selective Atomic Layer Deposition on Chemically Similar Materials: Achieving Selectivity on Oxide/Oxide Patterns
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January 2021 |
Angle-resolved X-ray photoelectron spectroscopy of the surface of imidazolium ionic liquids
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January 2008 |
Removal of native silicon oxide with low-energy argon ions
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October 1991 |
Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride
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July 2021 |
Perspective: New process technologies required for future devices and scaling
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May 2018 |
Dopamine-Mediated Polymer Coating Facilitates Area-Selective Atomic Layer Deposition
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September 2021 |
Nanopatterning by Area-Selective Atomic Layer Deposition
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November 2011 |
Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition
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September 2021 |
Cyclic Plasma Halogenation of Amorphous Carbon for Defect-Free Area-Selective Atomic Layer Deposition of Titanium Oxide
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June 2021 |
Cl2 plasma etching of Si(100): Nature of the chlorinated surface layer studied by angle-resolved x-ray photoelectron spectroscopy
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May 1997 |
Infrared and X-ray Photoelectron Spectroscopic Studies of the Reactions of Hydrogen-Terminated Crystalline Si(111) and Si(100) Surfaces with Br 2 , I 2 , and Ferrocenium in Alcohol Solvents
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March 2002 |
Bromine as a Preferred Etchant for Si Surfaces in the Supersaturation Regime: Insights from Calculations of Atomic Scale Reaction Pathways
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July 2016 |
Selective Gas-Phase Functionalization of SiO2 and SiNx Surfaces with Hydrocarbons
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March 2021 |
(Invited) Current and Future Applications of ALD in Micro-Electronics
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October 2011 |
Detecting and Removing Defects in Organosilane Self-Assembled Monolayers
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February 2020 |
Adsorbate-mediated step transformations and terrace rearrangement of Si ( 100 ) − ( 2 × 1 )
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November 2009 |
N -Iodosuccinimide (NIS) in Direct Aromatic Iodination: N -Iodosuccinimide (NIS) in Direct Aromatic Iodination
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May 2017 |
Selectivity of metal oxide atomic layer deposition on hydrogen terminated and oxidized Si(001)-(2×1) surface
- Longo, Roberto C.; McDonnell, Stephen; Dick, D.
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Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 32, Issue 3
https://doi.org/10.1116/1.4864619
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May 2014 |
Chemical Modification of the Photoluminescence Quenching of Porous Silicon
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September 1993 |
Attenuation of photoelectrons in monolayers of n-alkanethiols adsorbed on copper, silver, and gold
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September 1991 |
Atomic Layer Deposition of Al2O3 Using Aluminum Triisopropoxide (ATIP): A Combined Experimental and Theoretical Study
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December 2018 |
The stability of Cl-, Br-, and I-passivated Si(100)-(2 × 1) in ambient environments for atomically-precise pattern preservation
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August 2021 |
Impact of doping and silicon substrate resistivity on the blistering of atomic-layer-deposited aluminium oxide
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August 2020 |
Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru Precursor and H 2 O as a Reactant
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June 2021 |
Mechanochemical-Cascaded C–N Cross-Coupling and Halogenation Using N-Bromo- and N-Chlorosuccinimide as Bifunctional Reagents
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August 2021 |
Heck Coupling of Olefins to Mixed Methyl/Thienyl Monolayers on Si(111) Surfaces
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June 2013 |
Spin cast self-assembled monolayer field effect transistors
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March 2012 |
Chlorine insertion and manipulation on the Si(100)- 2 × 1 -Cl surface in the regime of local supersaturation
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June 2020 |
Mediation of chain reactions by propagating radicals during halogenation of H-masked Si(100): Implications for atomic-scale lithography and processing
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April 2009 |
Analysis of polymer surfaces by SIMS 1. An investigation of practical problems
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June 1982 |
Vapor-phase grafting of a model aminosilane compound to Al2O3, ZnO, and TiO2 surfaces prepared by atomic layer deposition
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October 2021 |
Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors
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January 2021 |
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
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November 2018 |
The Effect of Surface Terminations on the Initial Stages of TiO2 Deposition on Functionalized Silicon
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January 2023 |
Area-Selective Deposition: Fundamentals, Applications, and Future Outlook
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May 2020 |
Dense Organosilane Monolayer Resist That Directs Highly Selective Atomic Layer Deposition
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January 2020 |
Selective dry etching of UV-nanoimprinted resin passivation masks for area selective atomic layer deposition of aluminum oxide
- Miyajima, Chiaki; Ito, Shunya; Nakagawa, Masaru
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Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 39, Issue 5
https://doi.org/10.1116/6.0001250
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September 2021 |
Atomic Layer Deposition: An Overview
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January 2010 |
Substrate-Dependent Study of Chain Orientation and Order in Alkylphosphonic Acid Self-Assembled Monolayers for ALD Blocking
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October 2020 |
Angle-Resolved XPS Analysis and Characterization of Monolayer and Multilayer Silane Films for DNA Coupling to Silica
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March 2013 |
Effect of surface roughness and chemical composition on the wetting properties of silicon-based substrates
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January 2013 |
Inherently Area-Selective Atomic Layer Deposition of Manganese Oxide through Electronegativity-Induced Adsorption
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May 2021 |
Atomic layer deposition of Al2O3 on H-passivated Si. I. Initial surface reaction pathways with H/Si(100)-2×1
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May 2003 |
Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design
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May 2021 |