Development of New Magnetron Sputter Deposition Processes for Laser Target Fabrication

Kucheyev, S. O.; Shin, S. J.; Aji, L. Bayu; Bae, J. H.; Engwall, A. M.; Taylor, G. V.

doi:10.1080/15361055.2023.2184667

Title: Development of New Magnetron Sputter Deposition Processes for Laser Target Fabrication

Journal Article · 01 May 2023 · Fusion Science and Technology

DOI: https://doi.org/10.1080/15361055.2023.2184667 · OSTI ID:2202547

^[1]; Shin, S. J. ^[1]; Aji, L. Bayu ^[1]; Bae, J. H. ^[2]; Engwall, A. M. ^[1]; Taylor, G. V. ^[1]

Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
General Atomics, San Diego, CA (United States)

Magnetron sputter deposition is an enabling technology for laser target fabrication. Solutions are readily available for the deposition of most sub-micron-thick elemental films on planar substrates. However, major challenges still remain for the development of robust deposition processes in regimes of ultrathick (over ~10 μm) coatings and nonplanar substrates. These challenging deposition regimes are directly relevant to laser target applications, including both sphero-cylindrical hohlraums and spherical ablators for inertial confinement fusion (ICF) targets. Understanding underlying physical mechanisms for a specific material system is crucial for process development, given the overall complexity of the deposition process, its nonlinear dependence on deposition parameters, and a very large process space, often precluding conventional process optimization approaches. Here, we describe our approach to developing new deposition processes and give practical advice with examples of new results from our ongoing studies of glassy boron carbide ceramics for next-generation ICF ablators and nonequilibrium gold-tantalum alloys for hohlraums for magnetized ICF schemes. Emphasis is given to two major challenges of ultrathick coatings related to achieving process stability and reducing residual stress.

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Research Organization:: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States); General Atomics, San Diego, CA (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA); USDOE Laboratory Directed Research and Development (LDRD) Program

Grant/Contract Number:: AC52-07NA27344; 89233119CNA000063

OSTI ID:: 2202547

Report Number(s):: LLNL-JRNL-842654; 1065049

Journal Information:: Fusion Science and Technology, Vol. 79, Issue 7; ISSN 1536-1055

Publisher:: Taylor & FrancisCopyright Statement

Country of Publication:: United States

Language:: English

References (58)

Anode effects in magnetron sputtering Belkind, A.; Jansen, F. Surface and Coatings Technology, Vol. 99, Issue 1-2 https://doi.org/10.1016/S0257-8972(97)00409-X	journal	February 1998
Issues in magnetron sputtering of hard coatings Window, B. Surface and Coatings Technology, Vol. 81, Issue 1 https://doi.org/10.1016/0257-8972(95)02620-7	journal	May 1996
Tantalum Suboxide Films with Tunable Composition and Electrical Resistivity Deposited by Reactive Magnetron Sputtering Baker, Alexander A.; Engwall, Alison M.; Bayu-Aji, Leonardus Bimo Coatings, Vol. 12, Issue 7 https://doi.org/10.3390/coatings12070917	journal	June 2022
Target Erosion Pattern in Planar Magnetron Sputtering Fukami, Tatsuo; Sakuma, Toshiyuki Japanese Journal of Applied Physics, Vol. 21, Issue Part 1, No. 12 https://doi.org/10.1143/JJAP.21.1680	journal	December 1982
Review of Growth Defects in Thin Films Prepared by PVD Techniques Panjan, Peter; Drnovšek, Aljaž; Gselman, Peter Coatings, Vol. 10, Issue 5 https://doi.org/10.3390/coatings10050447	journal	May 2020
Columnar microstructure in vapor-deposited thin films Dirks, A. G.; Leamy, H. J. Thin Solid Films, Vol. 47, Issue 3 https://doi.org/10.1016/0040-6090(77)90037-2	journal	December 1977
Sputtering Process Model of Deposition Rate Keller, J. H.; Simmons, R. G. IBM Journal of Research and Development, Vol. 23, Issue 1 https://doi.org/10.1147/rd.231.0024	journal	January 1979
Radio-frequency magnetron sputter deposition of ultrathick boron carbide films Bayu Aji, L. B.; Shin, S. J.; Bae, J. H. Journal of Vacuum Science & Technology A, Vol. 41, Issue 2 https://doi.org/10.1116/6.0002211	journal	February 2023
A novel pulsed magnetron sputter technique utilizing very high target power densities Kouznetsov, Vladimir; Macák, Karol; Schneider, Jochen M. Surface and Coatings Technology, Vol. 122, Issue 2-3 https://doi.org/10.1016/S0257-8972(99)00292-3	journal	December 1999
Transient evolution of the target erosion profile during magnetron sputtering: Dependence on gas pressure and magnetic configuration Nakano, Takeo; Saitou, Yudai; Oya, Kei Surface and Coatings Technology, Vol. 326 https://doi.org/10.1016/j.surfcoat.2016.12.053	journal	October 2017
Balanced magnetic field in magnetron sputtering systems Golosov, Dmitriy A. Vacuum, Vol. 139 https://doi.org/10.1016/j.vacuum.2017.02.018	journal	May 2017
Reactive co-sputtering of ternary Au–Ta–O films with tunable electrical resistivity Shin, S. J.; Bayu Aji, L. B.; Engwall, A. M. Applied Physics Letters, Vol. 121, Issue 14 https://doi.org/10.1063/5.0106774	journal	October 2022
Effect of substrate tilt on sputter-deposited AuTa films Engwall, A. M.; Bayu Aji, L. B.; Baker, A. A. Applied Surface Science, Vol. 547 https://doi.org/10.1016/j.apsusc.2021.149010	journal	May 2021
Alternative anode geometry for magnetron sputtering Petroski, Kleber Alexandre; Sagás, Julio César Vacuum, Vol. 182 https://doi.org/10.1016/j.vacuum.2020.109703	journal	December 2020
Condensed hydrogen for thermonuclear fusion Kucheyev, S. O.; Hamza, A. V. Journal of Applied Physics, Vol. 108, Issue 9 https://doi.org/10.1063/1.3489943	journal	November 2010
Effect of substrate temperature on sputter-deposited boron carbide films Bayu Aji, L. B.; Shin, S. J.; Bae, J. H. Journal of Applied Physics, Vol. 131, Issue 7 https://doi.org/10.1063/5.0074470	journal	February 2022
Perspectives on oblique angle deposition of thin films: From fundamentals to devices Barranco, Angel; Borras, Ana; Gonzalez-Elipe, Agustin R. Progress in Materials Science, Vol. 76 https://doi.org/10.1016/j.pmatsci.2015.06.003	journal	March 2016
The influence of the target age on laterally resolved ion distributions in reactive planar magnetron sputtering Welzel, Thomas; Ellmer, Klaus Surface and Coatings Technology, Vol. 205 https://doi.org/10.1016/j.surfcoat.2011.01.050	journal	July 2011
Sputter deposition of high electrical resistivity Au-Ta alloy coatings on rotating substrates Engwall, A. M.; Bayu Aji, L. B.; Shin, S. J. Thin Solid Films, Vol. 758 https://doi.org/10.1016/j.tsf.2022.139411	journal	September 2022
Thin-Film Growth and the Shadow Instability Karunasiri, R. P. U.; Bruinsma, R.; Rudnick, Joseph Physical Review Letters, Vol. 62, Issue 7 https://doi.org/10.1103/PhysRevLett.62.788	journal	February 1989
High Rate Thick Film Growth Thornton, J. A. Annual Review of Materials Science, Vol. 7, Issue 1 https://doi.org/10.1146/annurev.ms.07.080177.001323	journal	August 1977
Transient magnetic field diffusion considerations relevant to magnetically assisted indirect drive inertial confinement fusion Moody, J. D.; Johnson, A.; Javedani, J. Physics of Plasmas, Vol. 27, Issue 11 https://doi.org/10.1063/5.0022722	journal	November 2020
Solid-phase reactive inter-diffusion of Mg/B multilayers Bayu Aji, L. B.; Baker, A. A.; Jacob, R. E. Journal of Applied Physics, Vol. 125, Issue 7 https://doi.org/10.1063/1.5082563	journal	February 2019
Combinatorial sputter deposition of ultrathick Au-Bi alloy films Bayu Aji, L. B.; Engwall, A. M.; Shin, S. J. Journal of Physics D: Applied Physics, Vol. 55, Issue 48 https://doi.org/10.1088/1361-6463/ac9534	journal	October 2022
The energy balance at substrate surfaces during plasma processing Kersten, H.; Deutsch, H.; Steffen, H. Vacuum, Vol. 63, Issue 3 https://doi.org/10.1016/S0042-207X(01)00350-5	journal	August 2001
The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering Boydens, F.; Leroy, W. P.; Persoons, R. Thin Solid Films, Vol. 531 https://doi.org/10.1016/j.tsf.2012.11.097	journal	March 2013
Microstructure of thin tantalum films sputtered onto inclined substrates: Experiments and atomistic simulations Dalla Torre, J.; Gilmer, G. H.; Windt, D. L. Journal of Applied Physics, Vol. 94, Issue 1 https://doi.org/10.1063/1.1579112	journal	July 2003
Model for Columnar Microstructure of Thin Solid Films Lichter, Seth; Chen, Jyhmin Physical Review Letters, Vol. 56, Issue 13 https://doi.org/10.1103/PhysRevLett.56.1396	journal	March 1986
Intrinsic stress in sputter-deposited thin films Windischmann, Henry Critical Reviews in Solid State and Materials Sciences, Vol. 17, Issue 6 https://doi.org/10.1080/10408439208244586	journal	January 1992
Reliability of a popular simulation code for predicting sputtering yields of solids and ranges of low-energy ions Wittmaack, Klaus Journal of Applied Physics, Vol. 96, Issue 5 https://doi.org/10.1063/1.1776318	journal	September 2004
The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulation Van Aeken, K.; Mahieu, S.; Depla, D. Journal of Physics D: Applied Physics, Vol. 41, Issue 20 https://doi.org/10.1088/0022-3727/41/20/205307	journal	October 2008
Mixed Mode Cracking in Layered Materials Hutchinson, J. W.; Suo, Z. Advances in Applied Mechanics, Vol. 29, p. 63-191 https://doi.org/10.1016/S0065-2156(08)70164-9	book	January 1991
Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering Bartzsch, H.; Frach, P.; Goedicke, K. Surface and Coatings Technology, Vol. 132, Issue 2-3 https://doi.org/10.1016/S0257-8972(00)00861-6	journal	October 2000
Nodular growth in thick-sputtered metallic coatings Spalvins, T.; Brainard, W. A. Journal of Vacuum Science and Technology, Vol. 11, Issue 6 https://doi.org/10.1116/1.1318706	journal	November 1974
Energetic condensation: Processes, properties, and products Colligon, John S. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 13, Issue 3 https://doi.org/10.1116/1.579746	journal	May 1995
Ion Implantation Range and Energy Deposition Distributions Winterbon, K. Bruce https://doi.org/10.1007/978-1-4757-5612-8	book	January 1975
Ultrasmooth plasma polymerized coatings for laser fusion targets Letts, S. A.; Myers, D. W.; Witt, L. A. Journal of Vacuum Science and Technology, Vol. 19, Issue 3 https://doi.org/10.1116/1.571142	journal	September 1981
Characteristics of triode magnetron sputtering: the morphology of deposited titanium films Fontana, L. C.; Muzart, J. L. R. Surface and Coatings Technology, Vol. 107, Issue 1 https://doi.org/10.1016/S0257-8972(98)00576-3	journal	August 1998
Superior attachment of high-quality hydrogen-free amorphous diamond films to solid materials Anttila, Asko; Lappalainen, Reijo; Tiainen, Veli-Matti Advanced Materials, Vol. 9, Issue 15 https://doi.org/10.1002/adma.19970091507	journal	January 1997
Oblique evaporation and surface diffusion Abelmann, Leon; Lodder, Cock Thin Solid Films, Vol. 305, Issue 1-2, p. 1-21 https://doi.org/10.1016/S0040-6090(97)00095-3	journal	August 1997
Laser Compression of Matter to Super-High Densities: Thermonuclear (CTR) Applications Nuckolls, John; Wood, Lowell; Thiessen, Albert Nature, Vol. 239, Issue 5368, p. 139-142 https://doi.org/10.1038/239139a0	journal	September 1972
Sputter-deposited low-stress boron carbide films Engwall, A. M.; Bayu Aji, L. B.; Shin, S. J. Journal of Applied Physics, Vol. 128, Issue 17 https://doi.org/10.1063/5.0022191	journal	November 2020
Factors determining the efficiency of magnetron sputtering. Optimization criteria Rogov, A. V.; Kapustin, Yu. V.; Martynenko, Yu. V. Technical Physics, Vol. 60, Issue 2 https://doi.org/10.1134/S1063784215020206	journal	February 2015
Development of the indirect‐drive approach to inertial confinement fusion and the target physics basis for ignition and gain Lindl, John Physics of Plasmas, Vol. 2, Issue 11 https://doi.org/10.1063/1.871025	journal	November 1995
Sputtered Au-Ta films with tunable electrical resistivity Bayu Aji, Leonardus Bimo; Engwall, Alison M.; Bae, John Journal of Physics D: Applied Physics https://doi.org/10.1088/1361-6463/abc501	journal	October 2020
Practical measurement of the residual stress in coatings Perry, Anthony J.; Sue, J. Albert; Martin, Philip J. Surface and Coatings Technology, Vol. 81, Issue 1 https://doi.org/10.1016/0257-8972(95)02531-6	journal	May 1996
Degradation of ultra-thin boron films in air Bayu Aji, L. B.; Baker, A. A.; Bae, J. H. Applied Surface Science, Vol. 448 https://doi.org/10.1016/j.apsusc.2018.04.126	journal	August 2018
A highest rate self-sputtering magnetron source Kukla, R.; Krug, T.; Ludwig, R. Vacuum, Vol. 41, Issue 7-9 https://doi.org/10.1016/0042-207X(90)94147-I	journal	January 1990
Gold-tantalum alloy films deposited by high-density-plasma magnetron sputtering Bae, J. H.; Bayu Aji, L. B.; Shin, S. J. Journal of Applied Physics, Vol. 130, Issue 16 https://doi.org/10.1063/5.0050901	journal	October 2021
Particle contamination formation in magnetron sputtering processes Selwyn, Gary S.; Weiss, Corey A.; Sequeda, Federico Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 15, Issue 4 https://doi.org/10.1116/1.580674	journal	July 1997
Macroscopic model for columnar growth of amorphous films by sputter deposition Bales, G. S.; Zangwill, A. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 9, Issue 1 https://doi.org/10.1116/1.577116	journal	January 1991
Stress-related effects in thin films Thornton, John A.; Hoffman, D. W. Thin Solid Films, Vol. 171, Issue 1 https://doi.org/10.1016/0040-6090(89)90030-8	journal	April 1989
Magnetron sputtering: a review of recent developments and applications Kelly, P. J.; Arnell, R. D. Vacuum, Vol. 56, Issue 3 https://doi.org/10.1016/S0042-207X(99)00189-X	journal	March 2000
Dusty Plasmas in the Laboratory, Industry, and Space Merlino, Robert L.; Goree, John A. Physics Today, Vol. 57, Issue 7 https://doi.org/10.1063/1.1784300	journal	July 2004
Oblique angle deposition of boron carbide films by magnetron sputtering Shin, S. J.; Bayu Aji, L. B.; Bae, J. H. Journal of Applied Physics, Vol. 130, Issue 12 https://doi.org/10.1063/5.0056849	journal	September 2021
Modelling and characterization of columnar growth in evaporated films Tait, R. N.; Smy, T.; Brett, M. J. Thin Solid Films, Vol. 226, Issue 2 https://doi.org/10.1016/0040-6090(93)90378-3	journal	April 1993
Review Article: Stress in thin films and coatings: Current status, challenges, and prospects Abadias, Grégory; Chason, Eric; Keckes, Jozef Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 36, Issue 2 https://doi.org/10.1116/1.5011790	journal	March 2018
Charged particle fluxes from planar magnetron sputtering sources Window, B.; Savvides, N. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 4, Issue 2 https://doi.org/10.1116/1.573470	journal	March 1986

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