Title: Unveiling the mechanism of remote epitaxy of crystalline semiconductors on 2D materials-coated substrates

Journal Article · · Nano Convergence

Abstract Remote epitaxy has opened novel opportunities for advanced manufacturing and heterogeneous integration of two-dimensional (2D) materials and conventional (3D) materials. The lattice transparency as the fundamental principle of remote epitaxy has been studied and challenged by recent observations defying the concept. Understanding remote epitaxy requires an integrated approach of theoretical modeling and experimental validation at multi-scales because the phenomenon includes remote interactions of atoms across an atomically thin material and a few van der Waals gaps. The roles of atomically thin 2D material for the nucleation and growth of a 3D material have not been integrated into a framework of remote epitaxy research. Here, we summarize studies of remote epitaxy mechanisms with a comparison to other epitaxy techniques. In the end, we suggest the crucial topics of remote epitaxy research for basic science and applications. Graphical Abstract

Research Organization:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
Sponsoring Organization:
USDOE Laboratory Directed Research and Development (LDRD) Program; USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC), Basic Energy Sciences (BES); USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities (SUF)
Grant/Contract Number:
89233218CNA000001; NA0003525
OSTI ID:
1997438
Report Number(s):
LA-UR-23-23454; 40; PII: 387
Journal Information:
Nano Convergence, Journal Name: Nano Convergence Journal Issue: 1 Vol. 10; ISSN 2196-5404
Publisher:
Springer Science + Business MediaCopyright Statement
Country of Publication:
Germany
Language:
English

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