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Title: Electrochemical polishing of chemical vapor deposited niobium thin films

Journal Article · · Thin Solid Films

Not Available

Sponsoring Organization:
USDOE
Grant/Contract Number:
SC0015727
OSTI ID:
1989391
Journal Information:
Thin Solid Films, Journal Name: Thin Solid Films Journal Issue: C Vol. 780; ISSN 0040-6090
Publisher:
ElsevierCopyright Statement
Country of Publication:
Netherlands
Language:
English

References (34)

Buffered electrochemical polishing of niobium journal March 2011
Fundamental aspects of electropolishing journal January 1987
Chemical vapor deposition of niobium on graphite journal November 1979
Intrinsic stress of magnetron-sputtered niobium films journal November 1979
Electrochemical micromachining, polishing and surface structuring of metals: fundamental aspects and new developments journal September 2003
The growth and structure of epitaxial niobium on sapphire journal December 2001
Concept of microsmoothing in the electropolishing process journal May 1994
Surface studies of niobium chemically polished under conditions for superconducting radio frequency (SRF) cavity production journal November 2006
Low pressure chemical vapor deposition of niobium coating on silicon carbide journal July 2009
Extreme diffusion limited electropolishing of niobium radiofrequency cavities journal March 2017
Niobium oxides and niobates physical properties: Review and prospects journal July 2016
Surface morphology of homoepitaxial β-Ga2O3 thin films grown by molecular beam epitaxy journal July 2008
Low pressure chemical vapor deposition of niobium coatings on graphite journal August 2010
Study of anodic layers and their effects on electropolishing of bulk and electroplated films of copper journal March 2004
A compact and cost-effective hard X-ray free-electron laser driven by a high-brightness and low-energy electron beam journal November 2020
A MHz-repetition-rate hard X-ray free-electron laser driven by a superconducting linear accelerator journal May 2020
From precision physics to the energy frontier with the Compact Linear Collider journal April 2020
TEM and SIMS Analysis of (100), (110), and (111) Single Crystal Niobium
  • Batchelor, A. D.; Leonard, D. N.; Russell, P. E.
  • SINGLE CRYSTAL - LARGE GRAIN NIOBIUM TECHNOLOGY: International Niobium Workshop, AIP Conference Proceedings https://doi.org/10.1063/1.2770680
conference January 2007
Evolution of terrace size distributions during thin-film growth by step-mediated epitaxy journal January 1990
Niobium films for superconducting accelerating cavities journal September 1984
The distribution function of surface charge density with respect to surface curvature journal January 1986
Mirror-smooth surfaces and repair of defects in superconducting RF cavities by mechanical polishing journal November 2012
50 years of success for SRF accelerators—a review journal April 2017
Development of sputtered Nb 3 Sn films on copper substrates for superconducting radiofrequency applications journal January 2019
Simulation of nonlinear superconducting rf losses derived from characteristic topography of etched and electropolished niobium surfaces journal March 2016
Field emission from laser-processed niobium (110) single crystals journal February 2019
Evaluation of the diffusion coefficient of fluorine during the electropolishing of niobium journal August 2010
Topographic power spectral density study of the effect of surface treatment processes on niobium for superconducting radio frequency accelerator cavities journal April 2012
Niobium thin film deposition studies on copper surfaces for superconducting radio frequency cavity applications journal June 2012
Circuit quantum electrodynamics journal May 2021
Recent developments in deep x-ray lithography journal November 1998
Atomistic Processes in the Early Stages of Thin-Film Growth journal April 1997
The Mechanism of Electropolishing of Niobium in Hydrofluoric–Sulfuric Acid Electrolyte journal January 2008
On the Mechanism of Niobium Electropolishing journal January 2012

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