|
Low energy photodesorption from Si(100) exposed to CO, CO2, O2, NO and SO2
|
journal
|
January 1987 |
|
Low temperature photo-assisted oxidation of silicon
|
journal
|
January 1992 |
|
Overview on Surface Microstructuring by Photodesorption Etching of Chlorinated Silicon
|
journal
|
March 1997 |
|
Experimental Investigation of Photoemission from Satellite Surface Materials
|
journal
|
April 1972 |
|
Electron Impact Cross Sections for Argon
|
journal
|
June 1972 |
|
Plasma damage mechanisms for low-k porous SiOCH films due to radiation, radicals, and ions in the plasma etching process
|
journal
|
April 2008 |
|
Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193nm photoresist roughening and degradation
|
journal
|
April 2008 |
|
Absolute vacuum ultraviolet flux in inductively coupled plasmas and chemical modifications of 193 nm photoresist
|
journal
|
April 2009 |
|
Prediction of UV spectra and UV-radiation damage in actual plasma etching processes using on-wafer monitoring technique
|
journal
|
February 2010 |
|
Photo-assisted etching of silicon in chlorine- and bromine-containing plasmas
|
journal
|
May 2014 |
|
Vacuum ultraviolet radiation emitted by microwave driven argon plasmas
|
journal
|
April 2017 |
|
Plasma electron temperatures and electron energy distributions measured by trace rare gases optical emission spectroscopy
|
journal
|
September 2004 |
|
Atmospheric-pressure plasma sources for biomedical applications
|
journal
|
June 2012 |
|
Controlling VUV photon fluxes in low-pressure inductively coupled plasmas
|
journal
|
May 2015 |
|
In situmeasurement of VUV/UV radiation from low-pressure microwave-produced plasma in Ar/O2gas mixtures
|
journal
|
July 2017 |
|
Optical Properties of Noble Metals. II.
|
journal
|
April 1965 |
|
Photoemission Studies of the Noble Metals. II. Gold
|
journal
|
January 1970 |
|
Photochemical etching of silicon: The influence of photogenerated charge carriers
|
journal
|
May 1989 |
Absolute intensities of the vacuum ultraviolet spectra in oxide etch plasma processing discharges
- Woodworth, J. R.; Riley, M. E.; Amatucci, V. A.
-
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 19, Issue 1
https://doi.org/10.1116/1.1335685
|
journal
|
January 2001 |
Damage mechanism in low-dielectric (low-k) films during plasma processes
- Jinnai, Butsurin; Nozawa, Toshihisa; Samukawa, Seiji
-
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 26, Issue 6
https://doi.org/10.1116/1.3010721
|
journal
|
November 2008 |
Surprising importance of photo-assisted etching of silicon in chlorine-containing plasmas
- Shin, Hyungjoo; Zhu, Weiye; Donnelly, Vincent M.
-
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 30, Issue 2
https://doi.org/10.1116/1.3681285
|
journal
|
March 2012 |
Ion energy distributions, electron temperatures, and electron densities in Ar, Kr, and Xe pulsed discharges
- Shin, Hyungjoo; Zhu, Weiye; Economou, Demetre J.
-
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 30, Issue 3
https://doi.org/10.1116/1.4705515
|
journal
|
May 2012 |
|
Plasma etching: Yesterday, today, and tomorrow
|
journal
|
September 2013 |
Comparison of surface vacuum ultraviolet emissions with resonance level number densities. I. Argon plasmas
- Boffard, John B.; Lin, Chun C.; Culver, Cody
-
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 32, Issue 2
https://doi.org/10.1116/1.4859376
|
journal
|
March 2014 |
Transfer of nanopantography-defined patterns using highly selective plasma etching
- Tian, Siyuan; Donnelly, Vincent M.; Economou, Demetre J.
-
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 33, Issue 3
https://doi.org/10.1116/1.4918716
|
journal
|
May 2015 |
Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy
- Sridhar, Shyam; Liu, Lei; Hirsch, Emilia W.
-
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 34, Issue 6
https://doi.org/10.1116/1.4964641
|
journal
|
November 2016 |
|
Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma
|
journal
|
March 2020 |
|
Photodesorption studies of CO2 from an oxygenâsaturated silicon(100) surface
|
journal
|
January 1983 |
|
Reaction of silicon with chlorine and ultraviolet laser induced chemical etching mechanisms
|
journal
|
September 1989 |
|
Effects of O2 addition on in-plasma photo-assisted etching of Si with chlorine
|
journal
|
September 2020 |
|
In-plasma photo-assisted etching of Si with chlorine aided by an external vacuum ultraviolet source
|
journal
|
March 2022 |
|
Radiation Damage in SiO2/Si Induced by VUV Photons
|
journal
|
October 1989 |
|
Vacuum-Ultra-Violet and Ozone Induced Oxidation of Silicon and Silicon-Germanium
|
journal
|
December 1993 |
|
Radiation Damage of SiO2 Surface Induced by Vacuum Ultraviolet Photons of High-Density Plasma
|
journal
|
April 1994 |
|
On-Wafer Monitoring of Vacuum-Ultraviolet Radiation Damage in High-Density Plasma Processes
|
journal
|
December 2001 |
|
Metal Photocathodes as Secondary Standards for Absolute Intensity Measurements in the Vacuum Ultraviolet*
|
journal
|
January 1966 |