Title: Substantial lifetime enhancement for Si-based photoanodes enabled by amorphous TiO2 coating with improved stoichiometry

Journal Article · · Nature Communications

Abstract Amorphous titanium dioxide (TiO 2 ) film coating by atomic layer deposition (ALD) is a promising strategy to extend the photoelectrode lifetime to meet the industrial standard for solar fuel generation. To realize this promise, the essential structure-property relationship that dictates the protection lifetime needs to be uncovered. In this work, we reveal that in addition to the imbedded crystalline phase, the presence of residual chlorine (Cl) ligands is detrimental to the silicon (Si) photoanode lifetime. We further demonstrate that post-ALD in-situ water treatment can effectively decouple the ALD reaction completeness from crystallization. The as-processed TiO 2 film has a much lower residual Cl concentration and thus an improved film stoichiometry, while its uniform amorphous phase is well preserved. As a result, the protected Si photoanode exhibits a substantially improved lifetime to ~600 h at a photocurrent density of more than 30 mA/cm 2 . This study demonstrates a significant advancement toward sustainable hydrogen generation.

Research Organization:
Univ. of Wisconsin, Madison, WI (United States); University of Wisconsin-Madison, WI (United States)
Sponsoring Organization:
USDOE; USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
SC0020283
OSTI ID:
1968385
Journal Information:
Nature Communications, Journal Name: Nature Communications Journal Issue: 1 Vol. 14; ISSN 2041-1723
Publisher:
Nature Publishing GroupCopyright Statement
Country of Publication:
United Kingdom
Language:
English

References (55)

Zeolite (In)Stability under Aqueous or Steaming Conditions journal August 2020
Tin Oxide as a Protective Heterojunction with Silicon for Efficient Photoelectrochemical Water Oxidation in Strongly Acidic or Alkaline Electrolytes journal July 2018
Engineering of Sub-Nanometer SiOxThickness in Si Photocathodes for Optimized Open Circuit Potential journal August 2016
AlxTayOzMixture Coatings Prepared Using Atomic Layer Deposition for Corrosion Protection of Steel journal May 2013
Multifunctional Nickel Film Protected n‐Type Silicon Photoanode with High Photovoltage for Efficient and Stable Oxygen Evolution Reaction journal May 2019
Theoretical reaction pathways for the formation of [Si(OH)5]1− and the deprotonation of orthosilicic acid in basic solution journal August 1993
Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set journal July 1996
Anomalous effect of temperature on atomic layer deposition of titanium dioxide journal December 2000
Interface control of atomic layer deposited oxide coatings by filtered cathodic arc deposited sublayers for improved corrosion protection journal October 2014
Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing journal September 2018
Residual chlorine in TiO 2 films grown at low temperatures by plasma enhanced atomic layer deposition journal April 2017
Direct determination of structural heterogeneity in metallic glasses using four-dimensional scanning transmission electron microscopy journal December 2018
Chlorine Doping of Amorphous TiO 2 for Increased Capacity and Faster Li + -Ion Storage journal November 2017
Quantifying the Extent of Ligand Incorporation and the Effect on Properties of TiO 2 Thin Films Grown by Atomic Layer Deposition Using an Alkoxide or an Alkylamide journal January 2020
Characterization of Electronic Transport through Amorphous TiO 2 Produced by Atomic Layer Deposition journal June 2019
Metastable Intermediates in Amorphous Titanium Oxide: A Hidden Role Leading to Ultra-Stable Photoanode Protection journal July 2018
Metal Sputtering Buffer Layer for High Performance Si-Based Water Oxidation Photoanode journal August 2020
Stable Water Oxidation in Acid Using Manganese-Modified TiO 2 Protective Coatings journal April 2018
Enhanced Electrochemical Stability of TiO 2 -Protected, Al-doped ZnO Transparent Conducting Oxide Synthesized by Atomic Layer Deposition journal November 2018
Insight into the Degradation Mechanisms of Atomic Layer Deposited TiO 2 as Photoanode Protective Layer journal July 2019
Insulator Layer Engineering toward Stable Si Photoanode for Efficient Water Oxidation journal August 2018
Maximizing Solar Water Splitting Performance by Nanoscopic Control of the Charge Carrier Fluxes across Semiconductor–Electrocatalyst Junctions journal August 2018
Defect-Tolerant TiO 2 -Coated and Discretized Photoanodes for >600 h of Stable Photoelectrochemical Water Oxidation journal December 2020
Nanopixelated Cuprous Oxide Photocathodes for Durable Photoelectrochemical Water Splitting journal September 2022
Thermodynamic Oxidation and Reduction Potentials of Photocatalytic Semiconductors in Aqueous Solution journal September 2012
Influence of Oxygen Exposure on the Nucleation of Platinum Atomic Layer Deposition: Consequences for Film Growth, Nanopatterning, and Nanoparticle Synthesis journal April 2013
Atomic Layer Deposition: An Overview journal January 2010
Electrochemical Characterization of TiO 2 Blocking Layers for Dye-Sensitized Solar Cells journal January 2014
Plasma-Enhanced Atomic Layer Deposition of Anatase TiO 2 Using TiCl 4 journal August 2009
Electron Microscopy Observation of TiO 2 Nanocrystal Evolution in High-Temperature Atomic Layer Deposition journal October 2013
Interfacial engineering of metal-insulator-semiconductor junctions for efficient and stable photoelectrochemical water oxidation journal June 2017
Enhanced photoelectrochemical efficiency and stability using a conformal TiO2 film on a black silicon photoanode journal March 2017
Atomic layer-deposited tunnel oxide stabilizes silicon photoanodes for water oxidation journal June 2011
Enhanced photoelectrochemical water-splitting performance of semiconductors by surface passivation layers journal January 2014
570 mV photovoltage, stabilized n-Si/CoO x heterojunction photoanodes fabricated using atomic layer deposition journal January 2016
Failure modes of protection layers produced by atomic layer deposition of amorphous TiO 2 on GaAs anodes journal January 2020
Enhanced stability of silicon for photoelectrochemical water oxidation through self-healing enabled by an alkaline protective electrolyte journal January 2020
Catalytic open-circuit passivation by thin metal oxide films of p-Si anodes in aqueous alkaline electrolytes journal January 2022
Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films journal March 2015
Molecular Dynamics Simulation of the Structural and Physical Properties of the Four Polymorphs of TiO 2 journal May 1991
Relationships among growth mechanism, structure and morphology of PEALD TiO 2 films: the influence of O 2 plasma power, precursor chemistry and plasma exposure mode journal June 2016
Degradation in photoelectrochemical devices: review with an illustrative case study journal February 2017
Thermal properties of TiO2films fabricated by atomic layer deposition journal June 2014
Band theory and Mott insulators: Hubbard U instead of Stoner I journal July 1991
Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set journal October 1996
From ultrasoft pseudopotentials to the projector augmented-wave method journal January 1999
Nanoscale Structure and Structural Relaxation in Zr 50 Cu 45 Al 5 Bulk Metallic Glass journal May 2012
Generalized Gradient Approximation Made Simple journal October 1996
Medium-range ordering, structural heterogeneity, and their influence on properties of Zr-Cu-Co-Al metallic glasses journal November 2021
Area selective atomic layer deposition of titanium dioxide: Effect of precursor chemistry
  • Sinha, Ashwini; Hess, Dennis W.; Henderson, Clifford L.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 24, Issue 6 https://doi.org/10.1116/1.2359728
journal January 2006
Amorphous TiO2 coatings stabilize Si, GaAs, and GaP photoanodes for efficient water oxidation journal May 2014
Research opportunities to advance solar energy utilization journal January 2016
Impact of Deposition and Annealing Temperature on Material and Electrical Characteristics of ALD HfO[sub 2] journal January 2004
Surface Morphology of p-Type (100) Silicon Etched in Aqueous Alkaline Solution journal January 1996
Structural Properties of Thin ZnO Films Deposited by ALD under O-Rich and Zn-Rich Growth Conditions and Their Relationship with Electrical Parameters journal July 2021