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Electron Microscopy Observation of TiO 2 Nanocrystal Evolution in High-Temperature Atomic Layer Deposition
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Area selective atomic layer deposition of titanium dioxide: Effect of precursor chemistry
- Sinha, Ashwini; Hess, Dennis W.; Henderson, Clifford L.
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 24, Issue 6
https://doi.org/10.1116/1.2359728
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Amorphous TiO2 coatings stabilize Si, GaAs, and GaP photoanodes for efficient water oxidation
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Research opportunities to advance solar energy utilization
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Impact of Deposition and Annealing Temperature on Material and Electrical Characteristics of ALD HfO[sub 2]
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Surface Morphology of p-Type (100) Silicon Etched in Aqueous Alkaline Solution
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Structural Properties of Thin ZnO Films Deposited by ALD under O-Rich and Zn-Rich Growth Conditions and Their Relationship with Electrical Parameters
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