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Title: Reliability of double probe measurements in nanodusty plasmas

Journal Article · · Plasma Sources Science and Technology

Abstract Nonthermal plasmas are attractive sources for nanoparticles synthesis, however, their plasma properties are notoriously difficult to assess due to the chemically reactive environment and high nanoparticle concentrations. Here, we are using a floating double probe to measure the plasma properties of a nanoparticle-forming argon:silane plasma. We demonstrate good stability of current–voltage characteristics over several minutes of operation. However, unexpectedly larger electron temperatures are measured with increasing the silane mole fraction. To test the validity of these results, we developed a zero-dimensional global model to investigate the effect of the presence of nanoparticles on the plasma properties. Using this model, we show that increasing particle concentration leads to an increasing electronegativity of the plasma, causing an increase of the reduced electric field. However, this causes only a moderate increase in mean electron energy, in contrast to the much larger increase measured by the double probe. We argue that these large electron temperatures are based on the fact that a double probe measures an ‘apparent’ electron temperature, which is defined by the negative inverse slope of the logarithm of the electron energy probability function (EEPF) at an energy corresponding to the probe’s floating potential. As the silane mole fraction is increased, the plasma becomes more electronegative and the probe’s floating potential moves closer to the plasma potential. Combined with the strong non-Maxwellian EEPF, this leads to the large apparent electron temperatures obtained by the probe. Thus, the apparent electron temperatures measured with the double probe do not follow the trends in mean electron energy.

Research Organization:
Univ. of Minnesota, Minneapolis, MN (United States)
Sponsoring Organization:
US Army Research Office (ARO); USDOE; USDOE Office of Science (SC)
Grant/Contract Number:
SC0022242
OSTI ID:
1960463
Journal Information:
Plasma Sources Science and Technology, Journal Name: Plasma Sources Science and Technology Journal Issue: 3 Vol. 32; ISSN 0963-0252
Publisher:
IOP PublishingCopyright Statement
Country of Publication:
United Kingdom
Language:
English

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