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Title: Orientation control of high-χ triblock copolymer for sub-10 nm patterning using fluorine-containing polymeric additives

Journal Article · · Journal of Micro/Nanolithography, MEMS, and MOEMS
 [1];  [1];  [1];  [2];  [3]
  1. Univ. of Chicago, IL (United States)
  2. Interuniversity Microelectronics Centre (IMEC), Leuven (Belgium)
  3. Univ. of Chicago, IL (United States); Argonne National Lab. (ANL), Argonne, IL (United States)
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Directed self-assembly (DSA) of block copolymers (BCPs) Is one of the most promising techniques to tackle the ever-increasing demand for subllthographic features In semiconductor industries. BCPs with high Flory-Huggins parameter (chi) are of particular Interest due to their ability to self-assemble at the length scale of sub-10 nm. However, such high-chi BCPs typically have imbalanced surface energies between respective blocks, making it a challenge to achieve desired perpendicular orientation. To address this challenge, we mixed a fluorine-containing polymeric additive with poly(2-vlnylpyrldine)-block-polystyrene-block-poly(2-vlnylpyrldine) (P2VP-b-PS-b-P2VP) and successfully controlled the orientation of the high-chi triblock copolymer. The additive selectively mixes with P2VP block through hydrogen bonding and can reduce the dissimilarity of surface energies between PS and P2VP blocks. After optimizing additive dose and annealing conditions, desired perpendicular orientation formed upon simple thermal annealing. We further demonstrated DSA of this material system with five times density multiplication and a half-pitch as small as 8.5 nm. This material system Is also amenable to sequential Infiltration synthesis treatment to selectively grow metal oxide In P2VP domains, which can facilitate the subsequent pattern transfer. We believe that this integration-friendly DSA platform using simple thermal annealing holds the great potential for sub-10 nm nanopatterning applications.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division; National Science Foundation (NSF)
Grant/Contract Number:
AC02-06CH11357; 1344891
OSTI ID:
1880537
Journal Information:
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 03; ISSN 1932-5150
Publisher:
SPIECopyright Statement
Country of Publication:
United States
Language:
English

References (17)

Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats journal April 2011
Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment journal July 2012
The Limits of Lamellae-Forming PS- b -PMMA Block Copolymers for Lithography journal June 2015
Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films journal December 2008
Pattern transfer using block copolymers
  • Gu, Xiaodan; Gunkel, Ilja; Russell, Thomas P.
  • Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences, Vol. 371, Issue 2000 https://doi.org/10.1098/rsta.2012.0306
journal October 2013
Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via Solvent Annealing journal July 2016
Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis journal July 2011
Directed self-assembly of triblock copolymers for sub-10 nm nanofabrication using polymeric additives conference March 2018
Orientation Control of Block Copolymers Using Surface Active, Phase-Preferential Additives journal October 2016
Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow conference March 2014
Molecular weight dependence of lamellar domain spacing of diblock copolymers in bulk journal September 1990
Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates journal July 2003
Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat journal March 2017
Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features journal February 2013
Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly journal August 2008
Surface Tension and Melt Cohesive Energy Density of Polymer Melts Including High Melting and High Glass Transition Polymers journal August 2002
Orientation Control in Thin Films of a High-χ Block Copolymer with a Surface Active Embedded Neutral Layer journal December 2015

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37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
lithography
block copolymer
directed self-assembly
sequential infiltration synthesis
sub-10 nm